Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
Info:
Materials Science in Semiconductor Processing 71 (2017) 433-440
Author Information
Films
Film/Plasma Properties
Analysis: Four-point Probe
Analysis: XRR, X-Ray Reflectivity
Analysis: XRD, X-Ray Diffraction
Analysis: PPTOFMS, Plasma Profiling Time Of Flight Mass Spectrometry
Analysis: WDXRF, Wavelength Dispersive X-ray Fluorescence
Analysis: SEM, Scanning Electron Microscopy
Analysis: SEM, Scanning Electron Microscopy
Analysis: TEM, Transmission Electron Microscope
Analysis: Two-point Probe
Substrates
Notes