About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes

Type:
Journal
Info:
Journal of The Electrochemical Society, 163 (2) F1-F10 (2016)
Date:
2015-10-06

Author Information

Name Institution
Yiran WangUniversity of Tennessee
Joel W. ClanceyUniversity of Colorado, Boulder
Guixia LuShandong University
Jiurong LiuShandong University
Lili LiuTexas Tech University
Jharna ChaudhuriTexas Tech University
Steven GeorgeUniversity of Colorado, Boulder
Ming XieWuhan ATMK Super EnerG Technologies Inc
Suying WeiLamar University
Zhanhu GuoUniversity of Tennessee

Films

Plasma Pt


Film/Plasma Properties

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Raman Spectra
Analysis: Raman Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Thermal Stability
Analysis: TGA, Thermo Gravimetric Analysis

Characteristic: Electrochemical Performance
Analysis: CV, Cyclic Voltammetry

Characteristic: Electrochemical Performance
Analysis: CA, Chronoamperometry

Characteristic: Electrochemical Performance
Analysis: EIS, Electrochemical Impedance Spectroscopy

Characteristic: Electrochemical Performance
Analysis: Linear Sweep Voltammetry

Substrates

CNTs, Carbon NanoTubes

Notes

404