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Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films

Type:
Journal
Info:
Surface & Coatings Technology 344 (2018) 12-20
Date:
2018-02-21
DOI:
https://doi.org/10.1016/j.surfcoat.2018.02.082

Author Information

Name Institution
Taejin ChoiYonsei University
Seungmin YeoYonsei University
Jeong-Gyu SongYonsei University
Seunggi SeoYonsei University
Byeonghyeon JangYeungnam University
Soo-Hyun KimYeungnam University
Hyungjun KimYonsei University

Films

Plasma C

Hardware used: Custom Direct Capacitively Coupled Plasma
Carbon tetrabromide, CBr4
CAS#: 558-13-4
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature Range = 150-400C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: Ellipso Technology Elli-SE

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: JEOL JSM-6701F

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Diagnostic: FEI Technai F20

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Digital Instrument MultiMode SPM

Characteristic: Bonding States
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Diagnostic: -

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Diagnostic: -

Characteristic: Mobility
Analysis: Four-point Probe
Diagnostic: -

Characteristic: Raman Spectra
Analysis: Raman Spectroscopy
Diagnostic: Jobin Yvon Aramis

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: VG Scientific ESCALAB 220iXL

Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: VG Scientific ESCALAB 220iXL

Characteristic: Chemical Composition, Impurities
Analysis: SIMS, Secondary Ion Mass Spectrometry
Diagnostic: CAMECA IMS 7F

Characteristic: Transistor Characteristics
Analysis: Transistor Characterization
Diagnostic: -

Substrates

SiO2

Notes

1682