Hyungjun Kim Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Hyungjun Kim returned 54 record(s).

Number	Title
1	Photocatalytic functional coatings of TiO₂ thin films on polymer substrate by plasma enhanced atomic layer deposition
2	Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
3	Comparative study on growth characteristics and electrical properties of ZrO₂ films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
4	Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
5	Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
6	Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
7	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
8	Self-formation of dielectric layer containing CoSi₂ nanocrystals by plasma-enhanced atomic layer deposition
9	Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
10	The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
11	Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO₂
12	Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
13	Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
14	Low-temperature atomic layer deposition of TiO₂, Al₂O₃,and ZnO thin films
15	Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
16	High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
17	Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)₂ Precursor and Oxygen Gas
18	Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
19	Formation of Ni silicide from atomic layer deposited Ni
20	Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
21	Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
22	Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
23	Electrical Properties of Atomic Layer Deposition HfO₂ and HfO_xN_y on Si Substrates with Various Crystal Orientations
24	Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta₂O₅ and the Effects on Electrical Properties of In situ Nitridation
25	Growth characteristics and properties of Ga-doped ZnO (GZO) thin films grown by thermal and plasma-enhanced atomic layer deposition
26	The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
27	In situ surface cleaning on a Ge substrate using TMA and MgCp₂ for HfO₂-based gate oxides
28	Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
29	Wafer-scale, conformal and direct growth of MoS₂ thin films by atomic layer deposition
30	The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfO_xN_y prepared by in situ nitridation
31	Robust TaN_x diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
32	Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
33	Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO₂
34	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO₂ layer
35	Nitride mediated epitaxy of CoSi₂ through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
36	Growth characteristics and electrical properties of La₂O₃ gate oxides grown by thermal and plasma-enhanced atomic layer deposition
37	Characterization of HfO_xN_y thin film formation by in-situ plasma enhanced atomic layer deposition using NH₃ and N₂ plasmas
38	Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
39	Low-temperature direct synthesis of high quality WS₂ thin films by plasma-enhanced atomic layer deposition for energy related applications
40	HfO₂/HfO_xN_y/HfO₂ Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
41	Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS₂ anodes in Na-ion battery
42	Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
43	Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH₃ as plasma reactant
44	Plasma-Enhanced Atomic Layer Deposition of Ni
45	Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
46	Photocatalytic activities of TiO₂ thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
47	The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
48	Very high frequency plasma reactant for atomic layer deposition
49	Growth characteristics and electrical properties of SiO₂ thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
50	Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
51	Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
52	Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
53	Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
54	Plasma-Enhanced ALD of TiO₂ Thin Films on SUS 304 Stainless Steel for Photocatalytic Application

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Hyungjun Kim Plasma Enhanced Atomic Layer Deposition Film Publications