Hyungjun Kim Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Hyungjun Kim returned 54 record(s).

Number	Title
1	Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
2	Low-temperature direct synthesis of high quality WS₂ thin films by plasma-enhanced atomic layer deposition for energy related applications
3	Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
4	Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
5	Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
6	Plasma-Enhanced ALD of TiO₂ Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
7	Photocatalytic functional coatings of TiO₂ thin films on polymer substrate by plasma enhanced atomic layer deposition
8	Growth characteristics and electrical properties of SiO₂ thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
9	Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
10	HfO₂/HfO_xN_y/HfO₂ Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
11	Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH₃ as plasma reactant
12	Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
13	Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
14	Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
15	Characterization of HfO_xN_y thin film formation by in-situ plasma enhanced atomic layer deposition using NH₃ and N₂ plasmas
16	Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS₂ anodes in Na-ion battery
17	Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO₂
18	Formation of Ni silicide from atomic layer deposited Ni
19	Photocatalytic activities of TiO₂ thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
20	Nitride mediated epitaxy of CoSi₂ through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
21	Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
22	The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
23	In situ surface cleaning on a Ge substrate using TMA and MgCp₂ for HfO₂-based gate oxides
24	Plasma-Enhanced Atomic Layer Deposition of Ni
25	Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
26	Wafer-scale, conformal and direct growth of MoS₂ thin films by atomic layer deposition
27	Growth characteristics and electrical properties of La₂O₃ gate oxides grown by thermal and plasma-enhanced atomic layer deposition
28	Growth characteristics and properties of Ga-doped ZnO (GZO) thin films grown by thermal and plasma-enhanced atomic layer deposition
29	Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
30	Low-temperature atomic layer deposition of TiO₂, Al₂O₃,and ZnO thin films
31	Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
32	Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta₂O₅ and the Effects on Electrical Properties of In situ Nitridation
33	Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
34	Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
35	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO₂ layer
36	Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
37	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
38	Robust TaN_x diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
39	Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
40	Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
41	Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
42	Self-formation of dielectric layer containing CoSi₂ nanocrystals by plasma-enhanced atomic layer deposition
43	The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
44	Electrical Properties of Atomic Layer Deposition HfO₂ and HfO_xN_y on Si Substrates with Various Crystal Orientations
45	Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
46	High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
47	Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)₂ Precursor and Oxygen Gas
48	Comparative study on growth characteristics and electrical properties of ZrO₂ films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
49	Very high frequency plasma reactant for atomic layer deposition
50	Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
51	The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
52	Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO₂
53	The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfO_xN_y prepared by in situ nitridation
54	Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer

Inductively coupled plasma sources from Plasma ALD, LLC.

Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.

Contact us for more information.

Hyungjun Kim Plasma Enhanced Atomic Layer Deposition Film Publications