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Hyungjun Kim Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Hyungjun Kim returned 54 record(s).

NumberTitle
1Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
2Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
3Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
4Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
5Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
6Very high frequency plasma reactant for atomic layer deposition
7Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
8Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
9Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
10Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
11The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
12Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
13Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
14Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
15Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
16Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
17Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
18High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
19Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
20Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
21Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
22Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
23The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
24The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
25Growth characteristics and properties of Ga-doped ZnO (GZO) thin films grown by thermal and plasma-enhanced atomic layer deposition
26Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
27Plasma-Enhanced Atomic Layer Deposition of Ni
28In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
29Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
30The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
31Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
32Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
33Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
34Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
35Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
36Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
37Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
38Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
39Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
40Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
41Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
42Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
43Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
44Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
45Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
46Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
47Formation of Ni silicide from atomic layer deposited Ni
48Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
49Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
50Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
51Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
52Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
53Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
54HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer