Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor

Type:
Journal
Info:
Electrochemical and Solid-State Letters, 13 (5) H151-H154 (2010)
Date:
2010-03-04

Author Information

Name Institution
S. J. LimPohang University of Science and Technology (POSTECH)
Jae-Min KimYonsei University
Doyoung KimYonsei University
Changsoo LeePohang University of Science and Technology (POSTECH)
Jin-Seong ParkDankook University
Hyungjun KimYonsei University

Films

Plasma ZnO

Hardware used: Custom


CAS#: 7782-44-7

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Resistivity, Sheet Resistance
Analysis: Hall Measurements

Characteristic: Transfer Curves
Analysis: I-V, Current-Voltage Measurements

Characteristic: Off Current
Analysis: I-V, Current-Voltage Measurements

Characteristic: On/Off Current Ratio
Analysis: I-V, Current-Voltage Measurements

Characteristic: Subthreshold Swing
Analysis: I-V, Current-Voltage Measurements

Characteristic: Mobility
Analysis: I-V, Current-Voltage Measurements

Characteristic: Threshold Voltage
Analysis: I-V, Current-Voltage Measurements

Substrates

Al2O3
Glass
Corning 1737

Notes

ZnO etched with dilute HCl
48