Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
Info:
Journal of Vacuum Science & Technology A 35, 031510 (2017)
Author Information
Films
Film/Plasma Properties
Analysis: XPS, X-ray Photoelectron Spectroscopy
Analysis: RBS, Rutherford Backscattering Spectrometry
Analysis: TEM, Transmission Electron Microscope
Analysis: C-V, Capacitance-Voltage Measurements
Analysis: C-V, Capacitance-Voltage Measurements
Analysis: C-V, Capacitance-Voltage Measurements
Analysis: C-V, Capacitance-Voltage Measurements
Analysis: I-V, Current-Voltage Measurements
Analysis: I-V, Current-Voltage Measurements
Analysis: Transistor Characterization
Substrates
Notes