Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Carbon tetrabromide, CBr4, CAS# 558-13-4

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s).

NumberTitle
1Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
2The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology