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In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition

Type:
Journal
Info:
Adv. Mater. Interfaces 2018, 1800957
Date:
2018-09-18
DOI:
http://dx.doi.org/10.1002/admi.201800957

Author Information

Name Institution
Pouyan MotamediNational Institute for Nanotechnology, Alberta, Canada
Ken BosnickNational Institute for Nanotechnology, Alberta, Canada
Kenneth C. CadienUniversity of Alberta
James David HoganUniversity of Alberta

Films

Plasma Ni

Hardware used: Kurt J Lesker ALD-150L
Bis(ethylcyclopentadienyl)nickel, (EtCp)2Ni
CAS#: 31886-51-8
N2, Nitrogen
CAS#: 7727-37-9
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature = 385C

Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Synchrotron

Characteristic: Morphology, Roughness, Topography
Analysis: Optical Scattering
Diagnostic: Custom

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Bruker D8 Discover

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Bruker Dimension Edge

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: Hitachi S-4800 Field Emission Scanning Electron Microscope

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Diagnostic: Hitachi H9500

Substrates

Sapphire

Notes

1288