About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S

Type:
Journal
Info:
Chem. Mater. 2017, 29, 2927-2938
Date:
2017-03-07
DOI:
http://dx.doi.org/10.1021/acs.chemmater.6b05214

Author Information

Name Institution
Benjamin GrovenKU Leuven
Markus HeyneKU Leuven
Ankit Nalin MehtaIMEC
Hugo BenderIMEC
Thomas NuyttenIMEC
Johan MeersschautIMEC
Thierry ConardIMEC
Patrick VerdonckIMEC
Sven Van ElshochtIMEC
Wilfried VandervorstIMEC
Stefan De GendtKU Leuven
Marc HeynsIMEC
Iuliana RaduIMEC
Matty CaymaxIMEC
Annelies DelabieKU Leuven

Films

Other WS2

Hardware used: ASM Eagle 12
WF6, Tungsten Hexafluoride
CAS#: 7783-82-6
H2, Hydrogen
CAS#: 1333-74-0
H2S, Hydrogen Sulfide
CAS#: 7783-06-4
Deposition Temperature Range = 250-450C

Film/Plasma Properties

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Diagnostic: Ocean Optics USB 2000

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: KLA Tencor SCD100

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo VG-Scientific theta probe

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo VG-Scientific theta probe

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Jordan Valley Bede MetrixL

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Diagnostic: FEI Tecnai G2 F30

Characteristic: Morphology, Roughness, Topography
Analysis: TEM, Transmission Electron Microscope
Diagnostic: FEI Tecnai G2 F30

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Diagnostic: FEI Titan

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Raman Spectroscopy
Diagnostic: Horiba Jobin Yvon LabRAM HR800 Raman Spectroscope

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Diagnostic: -

Characteristic: Areal Density
Analysis: RBS, Rutherford Backscattering Spectrometry
Diagnostic: -

Substrates

Al2O3

Notes

1121