Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
Type:
Journal
Info:
Applied Physics Letters 116, 211601 (2020)
Date:
2020-05-08
Author Information
| Name | Institution |
|---|---|
| Sanjie Liu | University of Science and Technology |
| Gang Zhao | Hunan Normal University |
| Yingfeng He | University of Science and Technology |
| Yangfeng Li | Chinese Academy of Sciences |
| Huiyun Wei | University of Science and Technology |
| Peng Qiu | University of Science and Technology |
| Xinyi Wang | University of Science and Technology |
| Xixi Wang | University of Science and Technology |
| Jiadong Cheng | University of Science and Technology |
| Mingzeng Peng | University of Science and Technology |
| Francisco Zaera | University of California - Riverside |
| Xinhe Zheng | University of Science and Technology |
Films
Plasma GaN
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Characteristic: Compositional Depth Profiling
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Morphology, Roughness, Topography
Analysis: XRR, X-Ray Reflectivity
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Electron Mobility
Analysis: Hall Measurements
Characteristic: Resistivity, Sheet Resistance
Analysis: Hall Measurements
Characteristic: Electron Concentration
Analysis: Hall Measurements
Substrates
| Sapphire |
Notes
| 1498 |