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Plasma-enhanced atomic layer deposition of palladium on a polymer substrate

Type:
Journal
Info:
Chem. Vap. Deposition 2007, 13, 307–311
Date:
2007-07-10
DOI:
http://dx.doi.org/10.1002/cvde.200606508

Author Information

Name Institution
Gregory A. Ten EyckRensselaer Polytechnic Institute (RPI)
Samuk PimanpangRensselaer Polytechnic Institute (RPI)
Jasbir S. JunejaRensselaer Polytechnic Institute (RPI)
Hassaram BakhruState University of New York at Albany
Toh-Ming LuRensselaer Polytechnic Institute (RPI)
Gwo-Ching WangRensselaer Polytechnic Institute (RPI)

Films

Plasma Pd

Hardware used: Custom Remote Inductively Coupled Plasma
palladium(II) hexafluoroacetylacetonate, Pd(hfac)2
CAS#: 64916-48-9
H2, Hydrogen
CAS#: 1333-74-0
N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature = 80C

Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer
Diagnostic: Stanford Research Systems RGA-300

Characteristic: Thickness
Analysis: RBS, Rutherford Backscattering Spectrometry
Diagnostic: Custom

Substrates

poly(p-xylene)
Parylene-N
PPX
Si with native oxide

Notes

30