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Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 30, 01A144 (2012)
Date:
2011-10-31
DOI:
http://dx.doi.org/10.1116/1.3666034

Author Information

Name Institution
Hideharu ShimizuTaiyo Nippon Sanso Corporation
Kaoru SakodaTaiyo Nippon Sanso Corporation
Takeshi MomoseUniversity of Tokyo
Mitsuo KoshiUniversity of Tokyo
Yukihiro ShimogakiUniversity of Tokyo

Films

Other Co

Hardware used: Custom Hot-wire
cobaltacene, bis(cyclopentadienyl)cobalt, Cp2Co
CAS#: 1277-43-6
NH3, Ammonia
CAS#: 7664-41-7
Deposition Temperature Range = 100-350C

Thermal Co

Hardware used: Custom Hot-wire
cobaltacene, bis(cyclopentadienyl)cobalt, Cp2Co
CAS#: 1277-43-6
NH3, Ammonia
CAS#: 7664-41-7
Deposition Temperature Range = 100-350C

Other Co

Hardware used: Custom Hot-wire
cobaltacene, bis(cyclopentadienyl)cobalt, Cp2Co
CAS#: 1277-43-6
N2, Nitrogen
CAS#: 7727-37-9
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature Range = 100-350C

Other Co

Hardware used: Custom Hot-wire
cobaltacene, bis(cyclopentadienyl)cobalt, Cp2Co
CAS#: 1277-43-6
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature Range = 100-350C

Film/Plasma Properties

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: JEOL JSM-6340F

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer
Diagnostic: -

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: JEOL JSM-6340F

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Substrates

Notes

Thermal NH3, hot-wire 25% N2/75% H2, and hot-wire 100% H2 resulted in no deposition.
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