Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Niobium Pentafluoride, Niobium(V) fluoride, NbF5, CAS# 7783-68-8

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 3 record(s).

NumberTitle
1Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
2Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
3Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition