Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition
Info:
J. Mater. Chem. C, 2020, 8, 8457-8465
Author Information
Films
Film/Plasma Properties
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Analysis: XRR, X-Ray Reflectivity
Analysis: XPS, X-ray Photoelectron Spectroscopy
Analysis: XPS, X-ray Photoelectron Spectroscopy
Analysis: Optical Absorption
Analysis: RBS, Rutherford Backscattering Spectrometry
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Analysis: TEM, Transmission Electron Microscope
Analysis: Electron Diffraction
Analysis: TGA, Thermo Gravimetric Analysis
Analysis: DSC, Differential Scanning Calorimetry
Substrates
Notes