Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition

Type:
Journal
Info:
J. Mater. Chem. C, 2020, 8, 8457-8465
Date:
2020-05-22

Author Information

Name Institution
Polla RoufLinköping University
Nathan J. O'BrienLinköping University
Sydney C. ButteraCarleton University
Ivan MartinovicLinköping University
Babak BakhitLinköping University
Erik MartinssonLinköping University
Justinas PalisaitisLinköping University
Chih-Wei HsuLinköping University
Henrik PedersenLinköping University

Films

Plasma GaN


Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Stress
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Strain
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Optical Absorption
Analysis: Optical Absorption

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction

Characteristic: Precursor Characterization
Analysis: TGA, Thermo Gravimetric Analysis

Characteristic: Precursor Characterization
Analysis: DSC, Differential Scanning Calorimetry

Substrates

Si(100)
4H n-SiC(0001)

Notes

1667