Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Bis(µ-dimethylamino) tetrakis(dimethylamino) digallium, CAS# 57731-40-5

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition