Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates

Type:
Journal
Info:
J. Synchrotron Rad. (2020). 27
Date:
2020-02-07
DOI:
http://dx.doi.org/2020-02-07

Author Information

Name Institution
Viktoria YurgensPaul Scherrer Institut
Frieder KochPaul Scherrer Institut
Mario ScheelSynchrotron SOLEIL
Timm WeitkampSynchrotron SOLEIL
Christian DavidPaul Scherrer Institut

Films

Plasma Ir

Hardware used: Picosun R200
Ir(acac)3, Iridium acetylacetonate, Iridium pentanedione
CAS#: 15635-87-7
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 370C

Film/Plasma Properties

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Substrates

Si3N4
HSQ, Hydrogen SilsesQuioxane

Notes

Deposition details assumed from Marschall reference.
1465