Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Systematic efficiency study of line-doubled zone plates

Type:
Journal
Info:
Microelectronic Engineering 177 (2017) 25 - 29
Date:
2017-01-17
DOI:
https://doi.org/10.1016/j.mee.2017.01.017

Author Information

Name Institution
F. MarschallPaul Scherrer Institut
J. Vila-ComamalaPaul Scherrer Institut
Vitaliy A. GuzenkoPaul Scherrer Institut
Christian DavidPaul Scherrer Institut

Films

Plasma Ir

Hardware used: Picosun R200
Ir(acac)3, Iridium acetylacetonate, Iridium pentanedione
CAS#: 15635-87-7
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 370C

Film/Plasma Properties

Substrates

HSQ, Hydrogen SilsesQuioxane
Si3N4

Notes

1035