Picosun R200 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Picosun R200 hardware returned 71 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
2Atomic Layer Deposition of Gold Metal
3Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
4Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
5The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
6Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
7Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
8Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
9Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
10Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
11HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
12New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
13Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
14In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
15Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
16Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
17Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
18In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
19Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
20Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
21Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
22Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
23Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
24Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
25Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
26Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
27Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
28Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
29Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
30Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
31Direct epitaxial nanometer-thin InN of high structural quality on 4H-SiC by atomic layer deposition
32High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
33Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
34Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
35Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
36Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
37In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
38Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design
39Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
40Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
41Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
42Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
43Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
44Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
45Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
46Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
47Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
48Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
49Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
50Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
51Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
52Atomic layer deposition of InN using trimethylindium and ammonia plasma
53The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
54Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition
55Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
56Systematic efficiency study of line-doubled zone plates
57Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
58AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
59Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
60Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
61Comparative study of ALD SiO2 thin films for optical applications
62Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
63Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
64Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
65Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
66PEALD AlN: controlling growth and film crystallinity
67Tribological properties of thin films made by atomic layer deposition sliding against silicon
68Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
69Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
70Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
71Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films