Picosun R200 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Picosun R200 hardware returned 41 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
2Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
3Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
4Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
5Atomic Layer Deposition of Gold Metal
6Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
7Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
8Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
9Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
10Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
11Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
12Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
13Comparative study of ALD SiO2 thin films for optical applications
14Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
15Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
16Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
17Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
18High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
19High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
20Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
21In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
22In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
23Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
24Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
25Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
26PEALD AlN: controlling growth and film crystallinity
27Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
28Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
29Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
30Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
31Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
32Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
33Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
34Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
35Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
36Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
37Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
38Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
39Systematic efficiency study of line-doubled zone plates
40Tribological properties of thin films made by atomic layer deposition sliding against silicon
41Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor


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