Picosun R200 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Picosun R200 hardware returned 65 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
2Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
3Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
4Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
5Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
6Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
7Atomic Layer Deposition of Gold Metal
8Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
9Atomic layer deposition of InN using trimethylindium and ammonia plasma
10Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
11Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
12Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
13Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
14Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
15Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
16Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
17Comparative study of ALD SiO2 thin films for optical applications
18Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
19Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
20Direct epitaxial nanometer-thin InN of high structural quality on 4H-SiC by atomic layer deposition
21Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
22Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
23Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
24Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
25Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
26Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
27Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
28Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
29HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
30High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
31High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
32Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
33In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
34In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
35In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
36Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
37Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
38Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
39Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
40Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
41Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
42Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
43New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
44PEALD AlN: controlling growth and film crystallinity
45Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
46Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
47Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
48Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
49Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
50Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
51Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
52Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
53Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
54Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design
55Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
56Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
57Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
58Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
59Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
60Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
61Systematic efficiency study of line-doubled zone plates
62Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
63The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
64Tribological properties of thin films made by atomic layer deposition sliding against silicon
65Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor