Picosun R200 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Picosun R200 hardware returned 72 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
2Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
3Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
4Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
5Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design
6Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
7PEALD AlN: controlling growth and film crystallinity
8Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
9In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
10The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
11Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
12Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
13Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
14Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
15Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
16The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
17High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
18In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
19Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
20Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
21Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
22Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
23Atomic Layer Deposition of Gold Metal
24New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
25Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
26Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
27Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
28Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
29Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
30Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
31Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
32Systematic efficiency study of line-doubled zone plates
33Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
34Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
35Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
36Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
37Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
38Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
39Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
40Direct epitaxial nanometer-thin InN of high structural quality on 4H-SiC by atomic layer deposition
41Atomic layer deposition of InN using trimethylindium and ammonia plasma
42Tribological properties of thin films made by atomic layer deposition sliding against silicon
43Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
44Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
45HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
46Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
47Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
48Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
49Comparative study of ALD SiO2 thin films for optical applications
50Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
51Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
52High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
53Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
54Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
55Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
56Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
57Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
58Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
59Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
60Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition
61Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
62Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
63Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
64Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
65Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
66Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
67AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
68Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
69Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
70Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
71Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
72Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition