1 | Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory |
2 | Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation |
3 | Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing |
4 | Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers |
5 | Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control |
6 | Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition |
7 | Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement |
8 | Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System |
9 | The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology |
10 | Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2 |
11 | Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion |
12 | Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement |
13 | Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition |
14 | Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma |
15 | Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates |
16 | Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy |
17 | In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications |
18 | Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor |
19 | Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition |
20 | AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition |
21 | HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition |
22 | High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds |
23 | Direct epitaxial nanometer-thin InN of high structural quality on 4H-SiC by atomic layer deposition |
24 | In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition |
25 | Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode |
26 | PEALD AlN: controlling growth and film crystallinity |
27 | Atomic layer deposition of InN using trimethylindium and ammonia plasma |
28 | Systematic efficiency study of line-doubled zone plates |
29 | Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices |
30 | Comparative study of ALD SiO2 thin films for optical applications |
31 | Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia |
32 | Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors |
33 | Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films |
34 | Atomic Layer Deposition of Gold Metal |
35 | Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation |
36 | Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition |
37 | Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals |
38 | Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma |
39 | Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition |
40 | New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell |
41 | Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications |
42 | Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition |
43 | Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films |
44 | Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films |
45 | High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3 |
46 | Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition |
47 | Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition |
48 | Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells |
49 | Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD |
50 | Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment |
51 | Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity |
52 | Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films |
53 | Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure |
54 | Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors |
55 | Tribological properties of thin films made by atomic layer deposition sliding against silicon |
56 | Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition |
57 | Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design |
58 | Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration |
59 | Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition |
60 | Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy |
61 | Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment |
62 | Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma |
63 | Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses |
64 | Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting |
65 | Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor |
66 | Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range |
67 | The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films |
68 | Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition |
69 | Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor |
70 | In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors |
71 | Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support |