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HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Journal of Alloys and Compounds, Volume 859, 2021, Pages 157875
Date:
2020-11-09
Author Information
| Name | Institution |
|---|---|
| Chaoyi Yin | Chinese Academy of Sciences |
| Meiping Zhu | Chinese Academy of Sciences |
| Tingting Zeng | Chinese Academy of Sciences |
| Chen Song | Chinese Academy of Sciences |
| Yingjie Chai | University of Central Florida |
| Yuchuan Shao | Chinese Academy of Sciences |
| Rongjun Zhang | Fudan University |
| Jiaoling Zhao | Chinese Academy of Sciences |
| Dawei Li | Chinese Academy of Sciences |
| Jianda Shao | Chinese Academy of Sciences |
Films
Plasma SiO2
Plasma HfO2
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Light Scattering
Analysis: Custom
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Optical Absorption
Analysis: Custom
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Reflectance Spectra
Analysis: UV-VIS Spectroscopy
Characteristic: Laser Induced Damage Threshold, LIDT
Analysis: SEM, Scanning Electron Microscopy
Substrates
| SiO2 |
| Glass, BK7 |
Notes
| 1574 |