SiO2 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing SiO2 films returned 129 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
23D structure evolution using metastable atomic layer deposition based on planar silver templates
3A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
4A fully integrated electronic platform for multiplexed intermolecular force spectroscopy
5A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
6A study on film thickness control of vertical flow showerhead reactor for RF plasma deposition
7Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
8Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
9Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
10An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
11Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
12Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
13Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
14Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
15Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
16Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
17Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
18Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
19Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
20Atomic layer deposition of metal-oxide thin films on cellulose fibers
21Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
22Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
23Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
24Boosting n-Type Doping Levels of Ge With Co-Doping by Integrating Plasma-Assisted Atomic Layer Deposition and Flash Annealing Process
25Breakdown and Protection of ALD Moisture Barrier Thin Films
26Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
27Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
28Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
29Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
30Chemical reactions during plasma-enhanced atomic layer deposition of SiO2 films employing aminosilane and O2/Ar plasma at 50°C
31Comparative study of ALD SiO2 thin films for optical applications
32Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
33Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
34Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
35Design and development of nanoimprint-enabled structures for molecular motor devices
36Designing high performance precursors for atomic layer deposition of silicon oxide
37Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
38Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
39Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
40Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
41Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
42Effect of Plasma Power of Plasma Enhanced Atomic Layer Deposition Process for Gate Insulator Deposition in Top-Gate Thin-Film Transistors
43Effect of Reaction Mechanism on Precursor Exposure Time in Atomic Layer Deposition of Silicon Oxide and Silicon Nitride
44Electrical Characteristics of p-Type Bulk Si Fin Field-Effect Transistor Using Solid-Source Doping With 1-nm Phosphosilicate Glass
45Energy-enhanced atomic layer deposition for more process and precursor versatility
46Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
47Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
48Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
49Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
50Flexible insulator of hollow SiO2 spheres and polyimide hybrid for flexible OLED
51Ga2O3 MOSFETs Using Spin-On-Glass Source/Drain Doping Technology
52GaN Nanowire MOSFET With Near-Ideal Subthreshold Slope
53Gate Insulator for High Mobility Oxide TFT
54Graphene-based bimorphs for micron-sized, autonomous origami machines
55Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
56HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
57High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
58High-Reflective Coatings For Ground and Space Based Applications
59Impact of degradable nanowires on long-term brain tissue responses
60Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
61Impact of oxygen plasma on nitrided and annealed atomic layer deposited SiO2/high-k/metal gate for high-voltage input and output fin-shaped field effect transistor devices
62Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
63Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
64Influence of Pre and Post-treatments on Plasma Enhanced ALD SiO2 and Al2O3 layers on GaN
65Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control
66Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
67Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
68Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
69Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
70Investigation of Bulk and DTMOS triple-gate devices under 60 MeV proton irradiation
71Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
72Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
73Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
74Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
75Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
76Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)
77Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
78Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
79Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
80Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
81Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
82Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
83Modal properties of a strip-loaded horizontal slot waveguide
84Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
85Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
86Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
87Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
88Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
89Non-destructive acoustic metrology and void detection in 3x50μm TSV
90Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
91On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
92On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
93Optical properties and bandgap evolution of ALD HfSiOx films
94Order of Dry and Wet Mixed-Length Self-Assembled Monolayers
95PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
96Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
97Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
98Plasma enhanced atomic layer deposition of SiNx:H and SiO2
99Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
100Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
101Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
102Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
103Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
104Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
105Programmable on-chip DNA compartments as artificial cells
106Propagating gene expression fronts in a one-dimensional coupled system of artificial cells
107Radical Enhanced Atomic Layer Deposition of Metals and Oxides
108Room temperature CO2 detection using interdigitated capacitors with heteropolysiloxane sensing films
109Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
110Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
111Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
112Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
113Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
114Single-Cell Photonic Nanocavity Probes
115Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
116Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
117Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
118Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
119Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
120Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
121Surface oxidation model in plasma enhanced atomic layer deposition for silicon oxide films including various aminosilane precursors
122Symmetrical Al2O3-based passivation layers for p- and n-type silicon
123Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
124Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
125Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
126Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
127Trapped charge densities in Al2O3-based silicon surface passivation layers
128Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
129Via sidewall insulation for through cell via contacts