SiO2 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing SiO2 films returned 106 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
2A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
3A fully integrated electronic platform for multiplexed intermolecular force spectroscopy
4A study on film thickness control of vertical flow showerhead reactor for RF plasma deposition
5Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
6Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
7Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
8An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
9Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
10Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
11Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
12Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
13Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
14Atomic layer deposition of metal-oxide thin films on cellulose fibers
15Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
16Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
17Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
18Breakdown and Protection of ALD Moisture Barrier Thin Films
19Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
20Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
21Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
22Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
23Chemical reactions during plasma-enhanced atomic layer deposition of SiO2 films employing aminosilane and O2/Ar plasma at 50°C
24Comparative study of ALD SiO2 thin films for optical applications
25Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
26Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
27Designing high performance precursors for atomic layer deposition of silicon oxide
28Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
29Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
30Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
31Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
32Effect of Plasma Power of Plasma Enhanced Atomic Layer Deposition Process for Gate Insulator Deposition in Top-Gate Thin-Film Transistors
33Effect of Reaction Mechanism on Precursor Exposure Time in Atomic Layer Deposition of Silicon Oxide and Silicon Nitride
34Electrical Characteristics of p-Type Bulk Si Fin Field-Effect Transistor Using Solid-Source Doping With 1-nm Phosphosilicate Glass
35Energy-enhanced atomic layer deposition for more process and precursor versatility
36Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
37Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
38Flexible insulator of hollow SiO2 spheres and polyimide hybrid for flexible OLED
39Ga2O3 MOSFETs Using Spin-On-Glass Source/Drain Doping Technology
40GaN Nanowire MOSFET With Near-Ideal Subthreshold Slope
41Gate Insulator for High Mobility Oxide TFT
42Graphene-based bimorphs for micron-sized, autonomous origami machines
43Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
44High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
45High-Reflective Coatings For Ground and Space Based Applications
46Impact of degradable nanowires on long-term brain tissue responses
47Impact of oxygen plasma on nitrided and annealed atomic layer deposited SiO2/high-k/metal gate for high-voltage input and output fin-shaped field effect transistor devices
48Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
49Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
50Influence of Pre and Post-treatments on Plasma Enhanced ALD SiO2 and Al2O3 layers on GaN
51Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control
52Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
53Investigation of Bulk and DTMOS triple-gate devices under 60 MeV proton irradiation
54Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
55Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
56Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
57Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
58Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
59Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)
60Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
61Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
62Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
63Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
64Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
65Modal properties of a strip-loaded horizontal slot waveguide
66Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
67Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
68Non-destructive acoustic metrology and void detection in 3x50μm TSV
69Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
70On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
71On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
72Optical properties and bandgap evolution of ALD HfSiOx films
73Order of Dry and Wet Mixed-Length Self-Assembled Monolayers
74PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
75Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
76Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
77Plasma enhanced atomic layer deposition of SiNx:H and SiO2
78Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
79Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
80Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
81Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
82Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
83Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
84Programmable on-chip DNA compartments as artificial cells
85Propagating gene expression fronts in a one-dimensional coupled system of artificial cells
86Radical Enhanced Atomic Layer Deposition of Metals and Oxides
87Room temperature CO2 detection using interdigitated capacitors with heteropolysiloxane sensing films
88Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
89Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
90Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
91Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
92Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
93Single-Cell Photonic Nanocavity Probes
94Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
95Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
96Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
97Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
98Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
99Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
100Surface oxidation model in plasma enhanced atomic layer deposition for silicon oxide films including various aminosilane precursors
101Symmetrical Al2O3-based passivation layers for p- and n-type silicon
102Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
103Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
104Trapped charge densities in Al2O3-based silicon surface passivation layers
105Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
106Via sidewall insulation for through cell via contacts


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