SiO2 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing SiO2 films returned 143 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
2Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
3Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
4Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
5Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
6Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
7Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
8An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
9Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
10Optical properties and bandgap evolution of ALD HfSiOx films
11Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
12Modal properties of a strip-loaded horizontal slot waveguide
13Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
14Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
15Trapped charge densities in Al2O3-based silicon surface passivation layers
16Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
17Breakdown and Protection of ALD Moisture Barrier Thin Films
18GaN Nanowire MOSFET With Near-Ideal Subthreshold Slope
19Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
20Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)
21Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
22Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
23Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
24Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
25Boosting n-Type Doping Levels of Ge With Co-Doping by Integrating Plasma-Assisted Atomic Layer Deposition and Flash Annealing Process
26Symmetrical Al2O3-based passivation layers for p- and n-type silicon
27Programmable on-chip DNA compartments as artificial cells
28Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
29A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
30Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
31Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
32Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
33Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
34Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
35Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
36Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
37Single-Cell Photonic Nanocavity Probes
38Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
39Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
40Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
41Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
42On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
43Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
44PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
45Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
46A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
47High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
48Comparative study of ALD SiO2 thin films for optical applications
49Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
50On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
51Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
52Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
53Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
54Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
55Effect of Reaction Mechanism on Precursor Exposure Time in Atomic Layer Deposition of Silicon Oxide and Silicon Nitride
56Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
57Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
58Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
59Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
60Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
61Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
62Room temperature CO2 detection using interdigitated capacitors with heteropolysiloxane sensing films
63Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
64Surface oxidation model in plasma enhanced atomic layer deposition for silicon oxide films including various aminosilane precursors
65Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
66Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
67High-Reflective Coatings For Ground and Space Based Applications
68Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
69Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
70Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
71Residual stress study of thin films deposited by atomic layer deposition
72Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
73Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
74Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
75Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
76Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
77Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control
78Designing high performance precursors for atomic layer deposition of silicon oxide
79Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
80Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
81Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
82Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
83Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
84Impact of degradable nanowires on long-term brain tissue responses
85Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
86Effect of Plasma Power of Plasma Enhanced Atomic Layer Deposition Process for Gate Insulator Deposition in Top-Gate Thin-Film Transistors
87Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
88Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
89Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
90Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
91Order of Dry and Wet Mixed-Length Self-Assembled Monolayers
92Influence of Pre and Post-treatments on Plasma Enhanced ALD SiO2 and Al2O3 layers on GaN
93Gate Insulator for High Mobility Oxide TFT
94Impact of oxygen plasma on nitrided and annealed atomic layer deposited SiO2/high-k/metal gate for high-voltage input and output fin-shaped field effect transistor devices
953D structure evolution using metastable atomic layer deposition based on planar silver templates
96Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
97Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
98Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
99Energy-enhanced atomic layer deposition for more process and precursor versatility
100Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
101Atomic layer deposition of silicon-based dielectrics for semiconductor manufacturing: Current status and future outlook
102'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
103Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
104Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
105Radical Enhanced Atomic Layer Deposition of Metals and Oxides
106High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
107A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
108Graphene-based bimorphs for micron-sized, autonomous origami machines
109A fully integrated electronic platform for multiplexed intermolecular force spectroscopy
110Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
111Electrical Characteristics of p-Type Bulk Si Fin Field-Effect Transistor Using Solid-Source Doping With 1-nm Phosphosilicate Glass
112Atomic layer deposition of metal-oxide thin films on cellulose fibers
113Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
114Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
115Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
116Plasma enhanced atomic layer deposition of SiNx:H and SiO2
117Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
118Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
119Via sidewall insulation for through cell via contacts
120Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
121Design and development of nanoimprint-enabled structures for molecular motor devices
122Non-destructive acoustic metrology and void detection in 3x50μm TSV
123Investigation of Bulk and DTMOS triple-gate devices under 60 MeV proton irradiation
124Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
125Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
126Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
127Propagating gene expression fronts in a one-dimensional coupled system of artificial cells
128HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
129Ga2O3 MOSFETs Using Spin-On-Glass Source/Drain Doping Technology
130Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
131A study on film thickness control of vertical flow showerhead reactor for RF plasma deposition
132Chemical reactions during plasma-enhanced atomic layer deposition of SiO2 films employing aminosilane and O2/Ar plasma at 50°C
133Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
134Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
135Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
136Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
137Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
138Flexible insulator of hollow SiO2 spheres and polyimide hybrid for flexible OLED
139Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
140Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
141Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
142Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
143Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy