SiO2 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing SiO2 films returned 140 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
2Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
3Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
4Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
5Impact of degradable nanowires on long-term brain tissue responses
6Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
7Influence of Pre and Post-treatments on Plasma Enhanced ALD SiO2 and Al2O3 layers on GaN
8Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
9Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
10A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
11Single-Cell Photonic Nanocavity Probes
12Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
13Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
14Electrical Characteristics of p-Type Bulk Si Fin Field-Effect Transistor Using Solid-Source Doping With 1-nm Phosphosilicate Glass
15Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
16Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
17Propagating gene expression fronts in a one-dimensional coupled system of artificial cells
18Ga2O3 MOSFETs Using Spin-On-Glass Source/Drain Doping Technology
19Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
20A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
21Trapped charge densities in Al2O3-based silicon surface passivation layers
22Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
23Breakdown and Protection of ALD Moisture Barrier Thin Films
24Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control
25Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
26Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
27Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
28Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
29Via sidewall insulation for through cell via contacts
30Effect of Reaction Mechanism on Precursor Exposure Time in Atomic Layer Deposition of Silicon Oxide and Silicon Nitride
31Chemical reactions during plasma-enhanced atomic layer deposition of SiO2 films employing aminosilane and O2/Ar plasma at 50°C
32Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
33Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)
34Gate Insulator for High Mobility Oxide TFT
35Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
36Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
37Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
38Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
39Atomic layer deposition of silicon-based dielectrics for semiconductor manufacturing: Current status and future outlook
40Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
41Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
42On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
43Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
44Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
45High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
46Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
47Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
48Room temperature CO2 detection using interdigitated capacitors with heteropolysiloxane sensing films
49Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
50Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
51Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
52Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
53Design and development of nanoimprint-enabled structures for molecular motor devices
54Optical properties and bandgap evolution of ALD HfSiOx films
55Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
56Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
57Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
58Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
59A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
60GaN Nanowire MOSFET With Near-Ideal Subthreshold Slope
61Effect of Plasma Power of Plasma Enhanced Atomic Layer Deposition Process for Gate Insulator Deposition in Top-Gate Thin-Film Transistors
62High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
63Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
64Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
65Non-destructive acoustic metrology and void detection in 3x50μm TSV
66Designing high performance precursors for atomic layer deposition of silicon oxide
67Residual stress study of thin films deposited by atomic layer deposition
68Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
69Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
70Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
71Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
72Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
73Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
74Surface oxidation model in plasma enhanced atomic layer deposition for silicon oxide films including various aminosilane precursors
75Order of Dry and Wet Mixed-Length Self-Assembled Monolayers
76Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
77Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
78Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
79Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
80Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
81Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
82Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
83Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
84Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
85Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
86Graphene-based bimorphs for micron-sized, autonomous origami machines
87Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
88On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
89Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
90Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
91Plasma enhanced atomic layer deposition of SiNx:H and SiO2
92Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
93Impact of oxygen plasma on nitrided and annealed atomic layer deposited SiO2/high-k/metal gate for high-voltage input and output fin-shaped field effect transistor devices
94Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
95Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
96Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
97Symmetrical Al2O3-based passivation layers for p- and n-type silicon
98Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
99PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
100Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
101Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
102Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
103Programmable on-chip DNA compartments as artificial cells
104Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
105A study on film thickness control of vertical flow showerhead reactor for RF plasma deposition
106Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
107An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
108Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
109Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
110Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
111Modal properties of a strip-loaded horizontal slot waveguide
112A fully integrated electronic platform for multiplexed intermolecular force spectroscopy
113Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
114Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
115Boosting n-Type Doping Levels of Ge With Co-Doping by Integrating Plasma-Assisted Atomic Layer Deposition and Flash Annealing Process
116Energy-enhanced atomic layer deposition for more process and precursor versatility
117HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
118Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
119Comparative study of ALD SiO2 thin films for optical applications
120Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
121'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
122Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
123Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
1243D structure evolution using metastable atomic layer deposition based on planar silver templates
125Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
126Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
127Atomic layer deposition of metal-oxide thin films on cellulose fibers
128Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
129Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
130Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
131Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
132Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
133Flexible insulator of hollow SiO2 spheres and polyimide hybrid for flexible OLED
134Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
135High-Reflective Coatings For Ground and Space Based Applications
136Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
137Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
138Investigation of Bulk and DTMOS triple-gate devices under 60 MeV proton irradiation
139Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
140Radical Enhanced Atomic Layer Deposition of Metals and Oxides