SiO2 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing SiO2 films returned 140 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1High-Reflective Coatings For Ground and Space Based Applications
2A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
3Breakdown and Protection of ALD Moisture Barrier Thin Films
4Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
5Effect of Reaction Mechanism on Precursor Exposure Time in Atomic Layer Deposition of Silicon Oxide and Silicon Nitride
6Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
7Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
8Plasma enhanced atomic layer deposition of SiNx:H and SiO2
9Non-destructive acoustic metrology and void detection in 3x50μm TSV
10Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
113D structure evolution using metastable atomic layer deposition based on planar silver templates
12Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
13Surface oxidation model in plasma enhanced atomic layer deposition for silicon oxide films including various aminosilane precursors
14Design and development of nanoimprint-enabled structures for molecular motor devices
15Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
16Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
17Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
18A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
19Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
20Radical Enhanced Atomic Layer Deposition of Metals and Oxides
21Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
22Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
23Investigation of Bulk and DTMOS triple-gate devices under 60 MeV proton irradiation
24Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
25Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
26Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
27HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
28Flexible insulator of hollow SiO2 spheres and polyimide hybrid for flexible OLED
29Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
30Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
31An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
32Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
33Ga2O3 MOSFETs Using Spin-On-Glass Source/Drain Doping Technology
34Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
35Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
36Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
37Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
38Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
39Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
40Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
41Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
42Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
43Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
44Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
45GaN Nanowire MOSFET With Near-Ideal Subthreshold Slope
46Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
47Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
48Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
49Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
50Chemical reactions during plasma-enhanced atomic layer deposition of SiO2 films employing aminosilane and O2/Ar plasma at 50°C
51Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
52Programmable on-chip DNA compartments as artificial cells
53Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
54Comparative study of ALD SiO2 thin films for optical applications
55Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
56Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
57A fully integrated electronic platform for multiplexed intermolecular force spectroscopy
58Atomic layer deposition of metal-oxide thin films on cellulose fibers
59Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
60Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
61Boosting n-Type Doping Levels of Ge With Co-Doping by Integrating Plasma-Assisted Atomic Layer Deposition and Flash Annealing Process
62Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
63Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
64Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
65Energy-enhanced atomic layer deposition for more process and precursor versatility
66Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
67Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
68Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
69Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
70Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
71Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
72Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
73Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
74Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
75High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
76Order of Dry and Wet Mixed-Length Self-Assembled Monolayers
77Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
78Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
79On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
80High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
81Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
82Modal properties of a strip-loaded horizontal slot waveguide
83Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
84A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
85Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
86Impact of oxygen plasma on nitrided and annealed atomic layer deposited SiO2/high-k/metal gate for high-voltage input and output fin-shaped field effect transistor devices
87Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
88Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
89Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
90A study on film thickness control of vertical flow showerhead reactor for RF plasma deposition
91Electrical Characteristics of p-Type Bulk Si Fin Field-Effect Transistor Using Solid-Source Doping With 1-nm Phosphosilicate Glass
92Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
93Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control
94Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
95On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
96Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
97Symmetrical Al2O3-based passivation layers for p- and n-type silicon
98Optical properties and bandgap evolution of ALD HfSiOx films
99Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
100Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
101Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
102Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
103Propagating gene expression fronts in a one-dimensional coupled system of artificial cells
104Via sidewall insulation for through cell via contacts
105Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
106Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
107Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
108Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
109'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
110Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)
111PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
112Influence of Pre and Post-treatments on Plasma Enhanced ALD SiO2 and Al2O3 layers on GaN
113Room temperature CO2 detection using interdigitated capacitors with heteropolysiloxane sensing films
114Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
115Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
116Gate Insulator for High Mobility Oxide TFT
117Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
118Graphene-based bimorphs for micron-sized, autonomous origami machines
119Atomic layer deposition of silicon-based dielectrics for semiconductor manufacturing: Current status and future outlook
120Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
121Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
122Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
123Designing high performance precursors for atomic layer deposition of silicon oxide
124Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
125Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
126Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
127Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
128Trapped charge densities in Al2O3-based silicon surface passivation layers
129Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
130Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
131Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
132Effect of Plasma Power of Plasma Enhanced Atomic Layer Deposition Process for Gate Insulator Deposition in Top-Gate Thin-Film Transistors
133Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
134Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
135Impact of degradable nanowires on long-term brain tissue responses
136Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
137Single-Cell Photonic Nanocavity Probes
138Residual stress study of thin films deposited by atomic layer deposition
139Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
140Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2