SiO2 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing SiO2 films returned 137 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
2Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
3Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
4Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
5Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
6Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
7Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
8Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
9On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
10Radical Enhanced Atomic Layer Deposition of Metals and Oxides
11Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
12Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
13Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
14Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
15Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
16Influence of Pre and Post-treatments on Plasma Enhanced ALD SiO2 and Al2O3 layers on GaN
17Plasma enhanced atomic layer deposition of SiNx:H and SiO2
18Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
19Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
20Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
21Boosting n-Type Doping Levels of Ge With Co-Doping by Integrating Plasma-Assisted Atomic Layer Deposition and Flash Annealing Process
22Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
23Impact of oxygen plasma on nitrided and annealed atomic layer deposited SiO2/high-k/metal gate for high-voltage input and output fin-shaped field effect transistor devices
24Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
25Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
26Atomic layer deposition of silicon-based dielectrics for semiconductor manufacturing: Current status and future outlook
27Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
28Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
29Via sidewall insulation for through cell via contacts
30GaN Nanowire MOSFET With Near-Ideal Subthreshold Slope
31Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
32Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
33Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
34Trapped charge densities in Al2O3-based silicon surface passivation layers
35Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
36PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
37Atomic layer deposition of metal-oxide thin films on cellulose fibers
38Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
39An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
40Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
41Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
42Non-destructive acoustic metrology and void detection in 3x50μm TSV
43Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
44A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
45Propagating gene expression fronts in a one-dimensional coupled system of artificial cells
46Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
47Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
48Ga2O3 MOSFETs Using Spin-On-Glass Source/Drain Doping Technology
49Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
50High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
51Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
52Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
53High-Reflective Coatings For Ground and Space Based Applications
54Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
55Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
56Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
57Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
58Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
59Programmable on-chip DNA compartments as artificial cells
60Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
61Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
62Effect of Plasma Power of Plasma Enhanced Atomic Layer Deposition Process for Gate Insulator Deposition in Top-Gate Thin-Film Transistors
63Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
64Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
65Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
66Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
67Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
68Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
69Impact of degradable nanowires on long-term brain tissue responses
70Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
71Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
72Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
73Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
74Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
75Design and development of nanoimprint-enabled structures for molecular motor devices
76Optical properties and bandgap evolution of ALD HfSiOx films
77Investigation of Bulk and DTMOS triple-gate devices under 60 MeV proton irradiation
78Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control
79Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
80Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
81Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
82Breakdown and Protection of ALD Moisture Barrier Thin Films
83Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
84Effect of Reaction Mechanism on Precursor Exposure Time in Atomic Layer Deposition of Silicon Oxide and Silicon Nitride
85Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)
86Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
87Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
88Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
89Order of Dry and Wet Mixed-Length Self-Assembled Monolayers
90Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
91Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
92A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
93Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
943D structure evolution using metastable atomic layer deposition based on planar silver templates
95Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
96Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
97A study on film thickness control of vertical flow showerhead reactor for RF plasma deposition
98Flexible insulator of hollow SiO2 spheres and polyimide hybrid for flexible OLED
99Electrical Characteristics of p-Type Bulk Si Fin Field-Effect Transistor Using Solid-Source Doping With 1-nm Phosphosilicate Glass
100Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
101Single-Cell Photonic Nanocavity Probes
102Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
103HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
104Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
105Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
106Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
107Comparative study of ALD SiO2 thin films for optical applications
108Symmetrical Al2O3-based passivation layers for p- and n-type silicon
109Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
110Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
111Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
112Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
113On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
114Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
115'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
116Gate Insulator for High Mobility Oxide TFT
117Surface oxidation model in plasma enhanced atomic layer deposition for silicon oxide films including various aminosilane precursors
118Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
119Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
120Modal properties of a strip-loaded horizontal slot waveguide
121Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
122Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
123Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
124Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
125Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
126Designing high performance precursors for atomic layer deposition of silicon oxide
127Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
128Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
129Energy-enhanced atomic layer deposition for more process and precursor versatility
130Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
131Graphene-based bimorphs for micron-sized, autonomous origami machines
132A fully integrated electronic platform for multiplexed intermolecular force spectroscopy
133Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
134Room temperature CO2 detection using interdigitated capacitors with heteropolysiloxane sensing films
135A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
136Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
137Chemical reactions during plasma-enhanced atomic layer deposition of SiO2 films employing aminosilane and O2/Ar plasma at 50°C