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SiO2 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing SiO2 films returned 89 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
2A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
3Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
4An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
5Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
6Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
7Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
8Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
9Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
10Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
11Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
12Breakdown and Protection of ALD Moisture Barrier Thin Films
13Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
14Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
15Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
16Chemical reactions during plasma-enhanced atomic layer deposition of SiO2 films employing aminosilane and O2/Ar plasma at 50°C
17Comparative study of ALD SiO2 thin films for optical applications
18Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
19Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
20Designing high performance precursors for atomic layer deposition of silicon oxide
21Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
22Effect of Plasma Power of Plasma Enhanced Atomic Layer Deposition Process for Gate Insulator Deposition in Top-Gate Thin-Film Transistors
23Effect of Reaction Mechanism on Precursor Exposure Time in Atomic Layer Deposition of Silicon Oxide and Silicon Nitride
24Electrical Characteristics of p-Type Bulk Si Fin Field-Effect Transistor Using Solid-Source Doping With 1-nm Phosphosilicate Glass
25Energy-enhanced atomic layer deposition for more process and precursor versatility
26Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
27Flexible insulator of hollow SiO2 spheres and polyimide hybrid for flexible OLED
28Ga2O3 MOSFETs Using Spin-On-Glass Source/Drain Doping Technology
29GaN Nanowire MOSFET With Near-Ideal Subthreshold Slope
30Gate Insulator for High Mobility Oxide TFT
31Graphene-based bimorphs for micron-sized, autonomous origami machines
32Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
33High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
34High-Reflective Coatings For Ground and Space Based Applications
35Impact of oxygen plasma on nitrided and annealed atomic layer deposited SiO2/high-k/metal gate for high-voltage input and output fin-shaped field effect transistor devices
36Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
37Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
38Influence of Pre and Post-treatments on Plasma Enhanced ALD SiO2 and Al2O3 layers on GaN
39Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control
40Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
41Investigation of Bulk and DTMOS triple-gate devices under 60 MeV proton irradiation
42Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
43Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
44Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
45Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
46Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)
47Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
48Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
49Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
50Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
51Modal properties of a strip-loaded horizontal slot waveguide
52Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
53Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
54Non-destructive acoustic metrology and void detection in 3x50μm TSV
55Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
56On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
57On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
58Optical properties and bandgap evolution of ALD HfSiOx films
59Order of Dry and Wet Mixed-Length Self-Assembled Monolayers
60PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
61Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
62Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
63Plasma enhanced atomic layer deposition of SiNx:H and SiO2
64Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
65Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
66Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
67Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
68Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
69Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
70Programmable on-chip DNA compartments as artificial cells
71Propagating gene expression fronts in a one-dimensional coupled system of artificial cells
72Radical Enhanced Atomic Layer Deposition of Metals and Oxides
73Room temperature CO2 detection using interdigitated capacitors with heteropolysiloxane sensing films
74Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
75Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
76Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
77Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
78Single-Cell Photonic Nanocavity Probes
79Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
80Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
81Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
82Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
83Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
84Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
85Symmetrical Al2O3-based passivation layers for p- and n-type silicon
86Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
87Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
88Trapped charge densities in Al2O3-based silicon surface passivation layers
89Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies

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