Publication Information

Title:
Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
Type:
Journal
Info:
Journal of Applied Physics 107, 114505 (2010)
Date:
2010-04-21

Author Information

Name Institution
P. S. WaggonerCornell University
C. P. TanCornell University
H. G. CraigheadCornell University

Films

Plasma SiO2


Plasma AlN


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Substrates

Si3N4

Keywords

Notes

1469