BTBAS, bis(tert-butylamido) silane, (t-BuCNH)2SiH2, CAS# 186598-40-3

Where to buy

NumberVendorRegionLink
1Gelest🇺🇸Di(t-Butylamino)Silane
2Strem Chemicals, Inc.🇺🇸Bis(t-butylamino)silane, 97+% BTBAS
3Pegasus Chemicals🇬🇧Bis(tertbutylamino)silane
4Ereztech🇺🇸Bis(t-butylamino)silane
5Strem Chemicals, Inc.🇺🇸Bis(t-butylamino)silane, BTBAS (99.999%-Si) PURATREM
6DOCK/CHEMICALS🇩🇪Bis(tertiarybutylamino)silane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 17 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Designing high performance precursors for atomic layer deposition of silicon oxide
2Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
3Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
4Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
5Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
6Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
7Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
8Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
9Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
10Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
11Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
12Residual stress study of thin films deposited by atomic layer deposition
13Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
14Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
15Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
16Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
17Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator