2022 Year in Review

February 2023 Stats

The publication database currently has 1673 entries.

204 Films

279 Precursors

78 Dep Hardware Sets

253 Characteristics

91 Theses

5136 Authors

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2021 Year in Review

ALD Links

Recent Database Additions

Characterization of thin Al₂O₃/SiO₂ dielectric stack for CMOS transistors Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution Hierarchical Atomic Layer Deposited V₂O₅ on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO₂) plasma enhanced atomic layer deposition (PEALD) processes

BTBAS, bis(tert-butylamido) silane, (t-BuCNH)₂SiH₂, CAS# 186598-40-3

Where to buy

Number	Vendor	Region	Link
1	Strem Chemicals, Inc.	🇺🇸	Bis(t-butylamino)silane, 97+% BTBAS
2	DOCK/CHEMICALS	🇩🇪	Bis(tertiarybutylamino)silane
3	Strem Chemicals, Inc.	🇺🇸	Bis(t-butylamino)silane, BTBAS (99.999%-Si) PURATREM
4	Ereztech	🇺🇸	Bis(t-butylamino)silane
5	EpiValence	🇬🇧	Bis(t-Butylamino) silane
6	Gelest	🇺🇸	Di(t-Butylamino)Silane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 16 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	Approaching the limits of dielectric breakdown for SiO₂ films deposited by plasma-enhanced atomic layer deposition
2	Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
3	Plasma-enhanced atomic layer deposition of SiO₂ for channel isolation of colloidal quantum dots phototransistors
4	Thermal and plasma enhanced atomic layer deposition of SiO₂ using commercial silicon precursors
5	Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
6	Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
7	Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
8	Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N₂ Plasma on Planar and 3D Substrate Topographies
9	Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
10	Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N₂ Plasma
11	Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N₂ Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
12	Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO₂ Using Carbon Dioxide
13	Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O₂ plasma
14	Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
15	Designing high performance precursors for atomic layer deposition of silicon oxide
16	Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD