BTBAS, bis(tert-butylamido) silane, (t-BuCNH)2SiH2, CAS# 186598-40-3

Where to buy

NumberVendorRegionLink
1DOCK/CHEMICALS🇩🇪Bis(tertiarybutylamino)silane
2Gelest🇺🇸Di(t-Butylamino)Silane
3Strem Chemicals, Inc.🇺🇸Bis(t-butylamino)silane, 97+% BTBAS
4Pegasus Chemicals🇬🇧Bis(tertbutylamino)silane
5EpiValence🇬🇧Bis(t-Butylamino) silane
6Ereztech🇺🇸Bis(t-butylamino)silane
7Strem Chemicals, Inc.🇺🇸Bis(t-butylamino)silane, BTBAS (99.999%-Si) PURATREM

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 17 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
2Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
3Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
4Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
5Designing high performance precursors for atomic layer deposition of silicon oxide
6Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
7Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
8Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
9Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
10Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
11Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
12Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
13Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
14Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
15Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
16Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
17Residual stress study of thin films deposited by atomic layer deposition