BTBAS, bis(tert-butylamido) silane, (t-BuCNH)2SiH2, CAS# 186598-40-3

Where to buy

NumberVendorRegionLink
1EpiValenceπŸ‡¬πŸ‡§Bis(t-Butylamino) silane
2Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈBis(t-butylamino)silane, BTBAS (99.999%-Si) PURATREM
3DOCK/CHEMICALSπŸ‡©πŸ‡ͺBis(tertiarybutylamino)silane
4Pegasus ChemicalsπŸ‡¬πŸ‡§Bis(tertbutylamino)silane
5EreztechπŸ‡ΊπŸ‡ΈBis(t-butylamino)silane
6Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈBis(t-butylamino)silane, 97+% BTBAS
7GelestπŸ‡ΊπŸ‡ΈDi(t-Butylamino)Silane

www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.

If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.


Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 17 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
2Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
3Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
4Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
5Residual stress study of thin films deposited by atomic layer deposition
6Designing high performance precursors for atomic layer deposition of silicon oxide
7Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
8Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
9Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
10Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
11Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
12Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
13Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
14Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
15Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
16Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
17Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma