BTBAS, bis(tert-butylamido) silane, (t-BuCNH)2SiH2, CAS# 186598-40-3

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.🇺🇸Bis(t-butylamino)silane, BTBAS (99.999%-Si) PURATREM
2Ereztech🇺🇸Bis(t-butylamino)silane
3Gelest🇺🇸Di(t-Butylamino)Silane
4Strem Chemicals, Inc.🇺🇸Bis(t-butylamino)silane, 97+% BTBAS
5DOCK/CHEMICALS🇩🇪Bis(tertiarybutylamino)silane
6Pegasus Chemicals🇬🇧Bis(tertbutylamino)silane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 17 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
2Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
3Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
4Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
5Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
6Designing high performance precursors for atomic layer deposition of silicon oxide
7Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
8Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
9Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
10Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
11Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
12Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
13Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
14Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
15Residual stress study of thin films deposited by atomic layer deposition
16Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
17Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide