BTBAS, bis(tert-butylamido) silane, (t-BuCNH)2SiH2, CAS# 186598-40-3

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈBis(t-butylamino)silane, 97+% BTBAS
2DOCK/CHEMICALSπŸ‡©πŸ‡ͺBis(tertiarybutylamino)silane
3Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈBis(t-butylamino)silane, BTBAS (99.999%-Si) PURATREM
4EreztechπŸ‡ΊπŸ‡ΈBis(t-butylamino)silane
5EpiValenceπŸ‡¬πŸ‡§Bis(t-Butylamino) silane
6GelestπŸ‡ΊπŸ‡ΈDi(t-Butylamino)Silane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 16 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
2Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
3Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
4Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
5Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
6Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
7Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
8Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
9Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
10Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
11Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
12Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
13Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
14Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
15Designing high performance precursors for atomic layer deposition of silicon oxide
16Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD