BTBAS, bis(tert-butylamido) silane, (t-BuCNH)2SiH2, CAS# 186598-40-3

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.🇺🇸Bis(t-butylamino)silane, 97+% BTBAS
2Strem Chemicals, Inc.🇺🇸Bis(t-butylamino)silane, BTBAS (99.999%-Si) PURATREM
3Gelest🇺🇸Di(t-Butylamino)Silane
4Ereztech🇺🇸Bis(t-butylamino)silane
5DOCK/CHEMICALS🇩🇪Bis(tertiarybutylamino)silane
6Pegasus Chemicals🇬🇧Bis(tertbutylamino)silane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 17 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Residual stress study of thin films deposited by atomic layer deposition
2Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
3Designing high performance precursors for atomic layer deposition of silicon oxide
4Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
5Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
6Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
7Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
8Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
9Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
10Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
11Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
12Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
13Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
14Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
15Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
16Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
17Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD