BTBAS, bis(tert-butylamido) silane, (t-BuCNH)2SiH2, CAS# 186598-40-3

Where to buy

NumberVendorRegionLink
1EreztechπŸ‡ΊπŸ‡ΈBis(t-butylamino)silane
2Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈBis(t-butylamino)silane, 97+% BTBAS
3GelestπŸ‡ΊπŸ‡ΈDi(t-Butylamino)Silane
4DOCK/CHEMICALSπŸ‡©πŸ‡ͺBis(tertiarybutylamino)silane
5Pegasus ChemicalsπŸ‡¬πŸ‡§Bis(tertbutylamino)silane
6Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈBis(t-butylamino)silane, BTBAS (99.999%-Si) PURATREM
7EpiValenceπŸ‡¬πŸ‡§Bis(t-Butylamino) silane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 17 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
2Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
3Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
4Residual stress study of thin films deposited by atomic layer deposition
5Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
6Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
7Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
8Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
9Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
10Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
11Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
12Designing high performance precursors for atomic layer deposition of silicon oxide
13Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
14Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
15Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
16Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
17Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma