BTBAS, bis(tert-butylamido) silane, (t-BuCNH)2SiH2, CAS# 186598-40-3

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈBis(t-butylamino)silane, 97+% BTBAS
2DOCK/CHEMICALSπŸ‡©πŸ‡ͺBis(tertiarybutylamino)silane
3GelestπŸ‡ΊπŸ‡ΈDi(t-Butylamino)Silane
4EreztechπŸ‡ΊπŸ‡ΈBis(t-butylamino)silane
5Pegasus ChemicalsπŸ‡¬πŸ‡§Bis(tertbutylamino)silane
6Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈBis(t-butylamino)silane, BTBAS (99.999%-Si) PURATREM

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 17 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
2Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
3Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
4Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
5Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
6Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
7Residual stress study of thin films deposited by atomic layer deposition
8Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
9Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
10Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
11Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
12Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
13Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
14Designing high performance precursors for atomic layer deposition of silicon oxide
15Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
16Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
17Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma