Designing high performance precursors for atomic layer deposition of silicon oxide

Type:
Journal
Info:
J. Vac. Sci. Technol. A 33(1), Jan/Feb 2015
Date:
2014-11-21

Author Information

Name Institution
Anupama MallikarjunanAir Products

Films

Thermal SiO2

Hardware used: Custom


CAS#: 10028-15-6

Thermal SiO2


Thermal SiO2


Plasma SiO2


Plasma SiO2


Plasma SiO2


Film/Plasma Properties

Substrates

Notes

226