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Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
Gallium nitride thin films by microwave plasma-assisted ALD
Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
Designing high performance precursors for atomic layer deposition of silicon oxide
Type:
Journal
Info:
J. Vac. Sci. Technol. A 33(1), Jan/Feb 2015
Date:
2014-11-21
Author Information
| Name | Institution |
|---|---|
| Anupama Mallikarjunan | Air Products |
Films
Plasma SiO2
Plasma SiO2
Plasma SiO2
Film/Plasma Properties
Substrates
Notes
| 226 |