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Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
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Publication Information
Title:
Designing high performance precursors for atomic layer deposition of silicon oxide
Type:
Journal
Info:
J. Vac. Sci. Technol. A 33(1), Jan/Feb 2015
Date:
2014-11-21
Author Information
| Name | Institution |
|---|---|
| Anupama Mallikarjunan | Air Products |
Films
Plasma SiO2
Plasma SiO2
Plasma SiO2
Film/Plasma Properties
Substrates
Keywords
Notes
| 226 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |