Custom Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Custom hardware returned 183 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
2Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
3Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
4Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
5Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
6Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
7Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
8Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
9Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
10Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
11Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
12A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
13Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
14Optical and Electrical Properties of AlxTi1-xO Films
15Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
16RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
17Atmospheric pressure plasma enhanced spatial ALD of silver
18Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
19The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
20Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
21Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
22Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
23Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
24Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
25Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
26Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
27Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
28Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
29Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
30Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
31Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
32Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
33Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
34Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
35Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
36Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
37Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
38Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
39High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
40Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
41Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
42Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
43ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
44ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
45The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
46Atomic layer deposition of titanium nitride from TDMAT precursor
47Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
48Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
49Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
50Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
51Plasma enhanced atomic layer deposition of Ga2O3 thin films
52Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
53Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
54Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
55Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
56Low-Power Double-Gate ZnO TFT Active Rectifier
57Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
58Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
59Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
60PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
61Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
62Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
63Ru thin film grown on TaN by plasma enhanced atomic layer deposition
64Patterned deposition by plasma enhanced spatial atomic layer deposition
65Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
66Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
67Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
68Study on the characteristics of aluminum thin films prepared by atomic layer deposition
69Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
70Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
71Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
72Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
73Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
74Oxide TFT LC Oscillators on Glass and Plastic for Wireless Functions in Large-Area Flexible Electronic Systems
75Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
76Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
77PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
78Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
79Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
80Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
81Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
82Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
83Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
84Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
85Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
86Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
87Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
88Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
89Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
90Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
91Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
92Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
93XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
94Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
95Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
96Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
97Improvements on Interface Reliability and Capacitance Dispersion of Fluorinated ALD-Al2O3 Gate Dielectrics by CF4 Plasma Treatment
98Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
99Designing high performance precursors for atomic layer deposition of silicon oxide
100Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
101In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
102In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
103Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
104Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
105Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
106Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
107Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
108Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
109Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
110Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
111Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
112Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
113Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
114Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
115The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
116Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
117Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
118Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
119Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
120Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
121Remote Plasma ALD of Platinum and Platinum Oxide Films
122Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
123Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
124Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
125Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
126Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
127Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
128Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
129Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
130Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
131Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
132Plasma enhanced atomic layer deposition of Fe2O3 thin films
133Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
134Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
135Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
136Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
137Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
138Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
139Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
140Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
141Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
142A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
143Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
144Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
145Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
146Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
147Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
148Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
149Optical and Electrical Properties of TixSi1-xOy Films
150Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
151Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
152Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
153Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
154Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
155Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
156Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
157A Silicon Nitride MIM Capacitor for Analog/Mixed-Signal Integrated Circuit using Manufacturable Atomic Layer Deposition Equipment
158Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
159Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
160Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
161Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
162Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
163Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
164Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization
165Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
166Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
167Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
168Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
169Fabrication and Characterization of Flexible Thin Film Transistors on Thin Solution-Cast Substrates
170Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
171From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
172Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
173Room temperature atomic layer deposition of TiO2 on gold nanoparticles
174Fast PEALD ZnO Thin-Film Transistor Circuits
175Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
176RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
177Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
178Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
179Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
180Encapsulation method for atom probe tomography analysis of nanoparticles
181Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
182Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
183Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source