Custom Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Custom hardware returned 172 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
2A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
3A Silicon Nitride MIM Capacitor for Analog/Mixed-Signal Integrated Circuit using Manufacturable Atomic Layer Deposition Equipment
4Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
5Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
6Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
7Atmospheric pressure plasma enhanced spatial ALD of silver
8Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
9Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
10Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
11Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
12Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
13Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
14Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
15Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
16Atomic layer deposition of titanium nitride from TDMAT precursor
17Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
18Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization
19Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
20Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
21Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
22Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
23Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
24Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
25Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
26Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
27Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
28Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
29Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
30Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
31Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
32Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
33Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
34Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
35Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
36Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
37Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
38Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
39Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
40Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
41Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
42Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
43Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
44Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
45Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
46Designing high performance precursors for atomic layer deposition of silicon oxide
47Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
48Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
49Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
50Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
51Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
52Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
53Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
54Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
55Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
56Encapsulation method for atom probe tomography analysis of nanoparticles
57Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
58Fabrication and Characterization of Flexible Thin Film Transistors on Thin Solution-Cast Substrates
59Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
60Fast PEALD ZnO Thin-Film Transistor Circuits
61Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
62Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
63Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
64Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
65Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
66Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
67Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
68High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
69High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
70Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
71Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
72Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
73Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
74Improvements on Interface Reliability and Capacitance Dispersion of Fluorinated ALD-Al2O3 Gate Dielectrics by CF4 Plasma Treatment
75In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
76In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
77In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
78Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
79Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
80Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
81Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
82Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
83Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
84Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
85Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
86Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
87Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
88Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
89Low-Power Double-Gate ZnO TFT Active Rectifier
90Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
91Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
92Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
93Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
94Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
95Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
96Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
97Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
98Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
99Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
100Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
101Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
102Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
103Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
104Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
105Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
106Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
107Optical and Electrical Properties of AlxTi1-xO Films
108Optical and Electrical Properties of TixSi1-xOy Films
109Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
110Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
111Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
112Oxide TFT LC Oscillators on Glass and Plastic for Wireless Functions in Large-Area Flexible Electronic Systems
113Patterned deposition by plasma enhanced spatial atomic layer deposition
114PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
115PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
116Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
117Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
118Plasma enhanced atomic layer deposition of Fe2O3 thin films
119Plasma enhanced atomic layer deposition of Ga2O3 thin films
120Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
121Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
122Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
123Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
124Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
125Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
126Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
127Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
128Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
129Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
130Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
131Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
132Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
133Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
134Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
135Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
136Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
137Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
138Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
139Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
140Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
141Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
142Remote Plasma ALD of Platinum and Platinum Oxide Films
143Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
144Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
145Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
146Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
147Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
148Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
149Room temperature atomic layer deposition of TiO2 on gold nanoparticles
150Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
151Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
152RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
153RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
154Ru thin film grown on TaN by plasma enhanced atomic layer deposition
155Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
156Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
157Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
158Study on the characteristics of aluminum thin films prepared by atomic layer deposition
159Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
160Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
161Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
162Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
163The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
164The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
165Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
166Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
167Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
168Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
169Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
170Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
171Very high frequency plasma reactant for atomic layer deposition
172ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method


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