Custom Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Plasma enhanced atomic layer deposition of Fe2O3 thin films
2Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
3Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
4Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
5Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
6Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
7Fast PEALD ZnO Thin-Film Transistor Circuits
8Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
9Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
10Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
11Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
12Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
13Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
14Fabrication and Characterization of Flexible Thin Film Transistors on Thin Solution-Cast Substrates
15Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
16Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
17Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
18Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
19Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
20RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
21Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
22Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
23Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
24Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
25Encapsulation method for atom probe tomography analysis of nanoparticles
26Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
27Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
28Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
29Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
30Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
31Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
32Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
33Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
34The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
35Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
36Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
37Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
38Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
39Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
40Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
41Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
42Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
43Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
44Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
45High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
46Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
47Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
48Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
49Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
50Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
51Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
52Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
53Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
54Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
55Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
56Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
57Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
58Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
59Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
60Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
61Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
62Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
63Atomic layer deposition of titanium nitride from TDMAT precursor
64Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
65Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
66Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
67Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
68Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
69Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
70Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
71Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
72Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
73Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
74Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
75Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization
76Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
77Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
78Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
79Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
80Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
81PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
82Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
83Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
84Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
85Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
86XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
87Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
88Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
89The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
90Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
91A Silicon Nitride MIM Capacitor for Analog/Mixed-Signal Integrated Circuit using Manufacturable Atomic Layer Deposition Equipment
92Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
93Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
94Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
95Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
96Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
97Optical and Electrical Properties of AlxTi1-xO Films
98ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
99Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
100Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
101Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
102Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
103Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
104Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
105Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
106Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
107Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
108Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
109Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
110Low-Power Double-Gate ZnO TFT Active Rectifier
111Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
112Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
113Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
114ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
115Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
116Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
117Ru thin film grown on TaN by plasma enhanced atomic layer deposition
118Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
119Oxide TFT LC Oscillators on Glass and Plastic for Wireless Functions in Large-Area Flexible Electronic Systems
120Atmospheric pressure plasma enhanced spatial ALD of silver
121Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
122Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
123Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
124Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
125High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
126Plasma enhanced atomic layer deposition of Ga2O3 thin films
127Optical and Electrical Properties of TixSi1-xOy Films
128Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
129Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
130Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
131Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
132From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
133Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
134Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
135Study on the characteristics of aluminum thin films prepared by atomic layer deposition
136Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
137Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
138Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
139In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
140Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
141Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
142Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
143Room temperature atomic layer deposition of TiO2 on gold nanoparticles
144Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
145Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
146Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
147A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
148Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
149Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
150Remote Plasma ALD of Platinum and Platinum Oxide Films
151RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
152Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
153Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
154Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
155In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
156Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
157Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
158Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
159Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
160Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
161Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
162Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
163Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
164Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
165PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
166A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
167Designing high performance precursors for atomic layer deposition of silicon oxide
168Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
169Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
170Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
171Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
172Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
173Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
174Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
175Patterned deposition by plasma enhanced spatial atomic layer deposition
176Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
177Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
178Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
179Improvements on Interface Reliability and Capacitance Dispersion of Fluorinated ALD-Al2O3 Gate Dielectrics by CF4 Plasma Treatment
180The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
181Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
182Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
183Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms