Custom Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Custom hardware returned 158 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
2	A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
3	Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
4	Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
5	Atmospheric pressure plasma enhanced spatial ALD of silver
6	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
7	Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
8	Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
9	Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
10	Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
11	Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
12	Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
13	Atomic layer deposition of titanium nitride from TDMAT precursor
14	Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
15	Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
16	Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
17	Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
18	Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
19	Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
20	Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
21	Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
22	Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
23	Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
24	Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
25	Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
26	Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
27	Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
28	Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
29	Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
30	Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
31	Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
32	Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
33	Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
34	Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
35	Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
36	Designing high performance precursors for atomic layer deposition of silicon oxide
37	Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
38	Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
39	Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
40	Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
41	Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
42	Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
43	Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
44	Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
45	Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
46	Encapsulation method for atom probe tomography analysis of nanoparticles
47	Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
48	Fabrication and Characterization of Flexible Thin Film Transistors on Thin Solution-Cast Substrates
49	Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
50	Fast PEALD ZnO Thin-Film Transistor Circuits
51	Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
52	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
53	Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
54	Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
55	Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
56	Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
57	High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
58	High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
59	Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
60	Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
61	Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
62	Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
63	In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
64	In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
65	In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
66	Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
67	Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
68	Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
69	Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
70	Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
71	Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
72	Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
73	Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
74	Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
75	Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
76	Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
77	Low-Power Double-Gate ZnO TFT Active Rectifier
78	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
79	Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
80	Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
81	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
82	Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
83	Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
84	Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
85	Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
86	Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
87	Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
88	Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
89	Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
90	Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
91	Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
92	Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
93	Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
94	Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
95	Optical and Electrical Properties of AlxTi1-xO Films
96	Optical and Electrical Properties of TixSi1-xOy Films
97	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
98	Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
99	Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
100	Oxide TFT LC Oscillators on Glass and Plastic for Wireless Functions in Large-Area Flexible Electronic Systems
101	Patterned deposition by plasma enhanced spatial atomic layer deposition
102	PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
103	PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
104	Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
105	Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
106	Plasma enhanced atomic layer deposition of Fe2O3 thin films
107	Plasma enhanced atomic layer deposition of Ga2O3 thin films
108	Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
109	Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
110	Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
111	Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
112	Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
113	Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
114	Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
115	Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
116	Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
117	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
118	Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
119	Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
120	Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
121	Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
122	Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
123	Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
124	Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
125	Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
126	Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
127	Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
128	Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
129	Remote Plasma ALD of Platinum and Platinum Oxide Films
130	Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
131	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
132	Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
133	Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
134	Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
135	Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
136	Room temperature atomic layer deposition of TiO2 on gold nanoparticles
137	Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
138	Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
139	RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
140	RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
141	Ru thin film grown on TaN by plasma enhanced atomic layer deposition
142	Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
143	Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
144	Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
145	Study on the characteristics of aluminum thin films prepared by atomic layer deposition
146	Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
147	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
148	Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
149	Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
150	The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
151	The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
152	Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
153	Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
154	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
155	Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
156	Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
157	Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
158	Very high frequency plasma reactant for atomic layer deposition

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