| 1 | A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD |
| 2 | A controlled growth of WNx and WCx thin films prepared by atomic layer deposition |
| 3 | A Silicon Nitride MIM Capacitor for Analog/Mixed-Signal Integrated Circuit using Manufacturable Atomic Layer Deposition Equipment |
| 4 | Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms |
| 5 | Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition |
| 6 | Alloyed 2D Metal-Semiconductor Atomic Layer Junctions |
| 7 | Atmospheric pressure plasma enhanced spatial ALD of silver |
| 8 | Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges |
| 9 | Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications |
| 10 | Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides |
| 11 | Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation |
| 12 | Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas |
| 13 | Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries |
| 14 | Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma |
| 15 | Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors |
| 16 | Atomic layer deposition of titanium nitride from TDMAT precursor |
| 17 | Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates |
| 18 | Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization |
| 19 | Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen |
| 20 | Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method |
| 21 | Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor |
| 22 | Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum |
| 23 | Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics |
| 24 | Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes |
| 25 | Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition |
| 26 | Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition |
| 27 | Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer |
| 28 | Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor |
| 29 | Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition |
| 30 | Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma |
| 31 | Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films |
| 32 | Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate |
| 33 | Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl |
| 34 | Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method |
| 35 | Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten |
| 36 | Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method |
| 37 | Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O |
| 38 | Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8] |
| 39 | Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films |
| 40 | Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide |
| 41 | Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor |
| 42 | Controlled erbium incorporation and photoluminescence of Er-doped Y2O3 |
| 43 | Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition |
| 44 | Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition |
| 45 | Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process |
| 46 | Designing high performance precursors for atomic layer deposition of silicon oxide |
| 47 | Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition |
| 48 | Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition |
| 49 | Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper |
| 50 | Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition |
| 51 | Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2 |
| 52 | Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications |
| 53 | Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition |
| 54 | Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition |
| 55 | Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD) |
| 56 | Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions |
| 57 | Encapsulation method for atom probe tomography analysis of nanoparticles |
| 58 | Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification |
| 59 | Fabrication and Characterization of Flexible Thin Film Transistors on Thin Solution-Cast Substrates |
| 60 | Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric |
| 61 | Fast PEALD ZnO Thin-Film Transistor Circuits |
| 62 | Fixed-Gap Tunnel Junction for Reading DNA Nucleotides |
| 63 | Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer |
| 64 | Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition |
| 65 | Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations |
| 66 | Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon |
| 67 | Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition |
| 68 | Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition |
| 69 | High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films |
| 70 | High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition |
| 71 | Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System |
| 72 | Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition |
| 73 | Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization |
| 74 | Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition |
| 75 | Improvements on Interface Reliability and Capacitance Dispersion of Fluorinated ALD-Al2O3 Gate Dielectrics by CF4 Plasma Treatment |
| 76 | In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition |
| 77 | In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd |
| 78 | In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating |
| 79 | Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition |
| 80 | Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon |
| 81 | Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia |
| 82 | Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor |
| 83 | Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment |
| 84 | Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications |
| 85 | Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition |
| 86 | Localized defect states and charge trapping in atomic layer deposited-Al2O3 films |
| 87 | Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films |
| 88 | Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy |
| 89 | Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers |
| 90 | Low-Power Double-Gate ZnO TFT Active Rectifier |
| 91 | Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source |
| 92 | Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma |
| 93 | Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells |
| 94 | Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films |
| 95 | Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma |
| 96 | Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application |
| 97 | Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition |
| 98 | Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing |
| 99 | Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition |
| 100 | Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition |
| 101 | Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system |
| 102 | Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures |
| 103 | Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma |
| 104 | Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co |
| 105 | Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers |
| 106 | Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma |
| 107 | Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals |
| 108 | Optical and Electrical Properties of AlxTi1-xO Films |
| 109 | Optical and Electrical Properties of TixSi1-xOy Films |
| 110 | Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes |
| 111 | Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices |
| 112 | Oxide semiconductor thin film transistors on thin solution-cast flexible substrates |
| 113 | Oxide TFT LC Oscillators on Glass and Plastic for Wireless Functions in Large-Area Flexible Electronic Systems |
| 114 | Patterned deposition by plasma enhanced spatial atomic layer deposition |
| 115 | PEALD of a Ruthenium Adhesion Layer for Copper Interconnects |
| 116 | PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads |
| 117 | Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition |
| 118 | Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN |
| 119 | Plasma enhanced atomic layer deposition of Fe2O3 thin films |
| 120 | Plasma enhanced atomic layer deposition of Ga2O3 thin films |
| 121 | Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films |
| 122 | Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires |
| 123 | Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System |
| 124 | Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4 |
| 125 | Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases |
| 126 | Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets |
| 127 | Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application |
| 128 | Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma |
| 129 | Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating |
| 130 | Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation |
| 131 | Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals |
| 132 | Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers |
| 133 | Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films |
| 134 | Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas |
| 135 | Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition |
| 136 | Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices |
| 137 | Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects |
| 138 | Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals |
| 139 | Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition |
| 140 | Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen |
| 141 | Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride |
| 142 | Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods |
| 143 | Remote Plasma ALD of Platinum and Platinum Oxide Films |
| 144 | Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films |
| 145 | Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film |
| 146 | Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor |
| 147 | Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application |
| 148 | Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors |
| 149 | Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy |
| 150 | Room temperature atomic layer deposition of TiO2 on gold nanoparticles |
| 151 | Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source |
| 152 | Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon |
| 153 | RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor |
| 154 | RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor |
| 155 | Ru thin film grown on TaN by plasma enhanced atomic layer deposition |
| 156 | Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes |
| 157 | Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions |
| 158 | Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition |
| 159 | Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions |
| 160 | Study on the characteristics of aluminum thin films prepared by atomic layer deposition |
| 161 | Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition |
| 162 | Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth |
| 163 | Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition |
| 164 | Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy |
| 165 | Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition |
| 166 | The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor |
| 167 | The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism |
| 168 | Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties |
| 169 | Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode |
| 170 | Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors |
| 171 | Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN |
| 172 | Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects |
| 173 | Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries |
| 174 | Very high frequency plasma reactant for atomic layer deposition |
| 175 | ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method |