Custom Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
2A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
3A Silicon Nitride MIM Capacitor for Analog/Mixed-Signal Integrated Circuit using Manufacturable Atomic Layer Deposition Equipment
4Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
5Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
6Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
7Atmospheric pressure plasma enhanced spatial ALD of silver
8Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
9Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
10Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
11Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
12Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
13Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
14Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
15Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
16Atomic layer deposition of titanium nitride from TDMAT precursor
17Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
18Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization
19Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
20Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
21Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
22Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
23Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
24Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
25Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
26Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
27Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
28Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
29Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
30Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
31Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
32Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
33Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
34Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
35Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
36Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
37Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
38Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
39Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
40Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
41Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
42Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
43Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
44Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
45Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
46Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
47Designing high performance precursors for atomic layer deposition of silicon oxide
48Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
49Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
50Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
51Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
52Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
53Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
54Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
55Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
56Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
57Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
58Encapsulation method for atom probe tomography analysis of nanoparticles
59Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
60Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
61Fabrication and Characterization of Flexible Thin Film Transistors on Thin Solution-Cast Substrates
62Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
63Fast PEALD ZnO Thin-Film Transistor Circuits
64Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
65Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
66Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
67Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
68Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
69Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
70Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
71High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
72High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
73Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
74Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
75Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
76Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
77Improvements on Interface Reliability and Capacitance Dispersion of Fluorinated ALD-Al2O3 Gate Dielectrics by CF4 Plasma Treatment
78In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
79In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
80Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
81Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
82Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
83Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
84Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
85Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
86Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
87Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
88Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
89Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
90Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
91Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
92Low-Power Double-Gate ZnO TFT Active Rectifier
93Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
94Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
95Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
96Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
97Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
98Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
99Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
100Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
101Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
102Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
103Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
104Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
105Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
106Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
107Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
108Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
109Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
110Optical and Electrical Properties of AlxTi1-xO Films
111Optical and Electrical Properties of TixSi1-xOy Films
112Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
113Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
114Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
115Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
116Oxide TFT LC Oscillators on Glass and Plastic for Wireless Functions in Large-Area Flexible Electronic Systems
117Patterned deposition by plasma enhanced spatial atomic layer deposition
118PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
119PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
120Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
121Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
122Plasma enhanced atomic layer deposition of Fe2O3 thin films
123Plasma enhanced atomic layer deposition of Ga2O3 thin films
124Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
125Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
126Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
127Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
128Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
129Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
130Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
131Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
132Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
133Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
134Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
135Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
136Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
137Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
138Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
139Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
140Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
141Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
142Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
143Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
144Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
145Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
146Remote Plasma ALD of Platinum and Platinum Oxide Films
147Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
148Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
149Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
150Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
151Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
152Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
153Room temperature atomic layer deposition of TiO2 on gold nanoparticles
154Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
155Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
156RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
157RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
158Ru thin film grown on TaN by plasma enhanced atomic layer deposition
159Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
160Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
161Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
162Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
163Study on the characteristics of aluminum thin films prepared by atomic layer deposition
164Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
165Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
166Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
167Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
168Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
169The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
170The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
171Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
172Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
173Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
174Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
175Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
176Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
177Very high frequency plasma reactant for atomic layer deposition
178XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
179ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
180ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method