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In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films Influence of oxygen source on the ferroelectric properties of ALD grown Hf_1-xZr_xO₂ films

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Number	Title
1	A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
2	A controlled growth of WN_x and WC_x thin films prepared by atomic layer deposition
3	A Silicon Nitride MIM Capacitor for Analog/Mixed-Signal Integrated Circuit using Manufacturable Atomic Layer Deposition Equipment
4	Al₂O₃ and SiO₂ Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
5	Al₂O₃ multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
6	Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
7	Atmospheric pressure plasma enhanced spatial ALD of silver
8	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
9	Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
10	Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
11	Atomic Layer Deposition of HfO₂ Thin Films on Ultrathin SiO₂ Formed by Remote Plasma Oxidation
12	Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)₂ and H₂ and O₂ Plasmas
13	Atomic Layer Deposition of LiCoO₂ Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
14	Atomic layer deposition of molybdenum oxide from (NtBu)₂(NMe₂)₂Mo and O₂ plasma
15	Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
16	Atomic layer deposition of titanium nitride from TDMAT precursor
17	Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
18	Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization
19	Atomic layer epitaxy of Si on Ge(100) using Si₂Cl₆ and atomic hydrogen
20	Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
21	Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
22	Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
23	Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
24	Characteristics of Al_xTi_1-xO_y Films Grown by Plasma-Enhanced Atomic Layer Deposition
25	Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
26	Characteristics of Atomic-Layer-Deposited HfO₂ Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
27	Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)₂ Precursor
28	Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
29	Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O₂ plasma
30	Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO₂ Thin Films
31	Characteristics of the HfO₂ Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
32	Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
33	Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
34	Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
35	Characteristics of ZrO₂ gate dielectric deposited using Zr(t –butoxide) and Zr(NEt₂)₄ precursors by plasma enhanced atomic layer deposition method
36	Chemically conformal deposition of SrTiO₃ thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H₂O
37	Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
38	Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)₂] and Dicobalt Octacarbonyl [Co₂(CO)₈]
39	Comparison of the Deposition Characteristics and Electrical Properties for La₂O₃, HfO₂ and LHO Films
40	Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
41	Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
42	Controlled erbium incorporation and photoluminescence of Er-doped Y₂O₃
43	Controlling the composition of Ti_1-xAl_xN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
44	Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
45	Defect-sealing of Al₂O₃/ZrO₂ multilayer for barrier coating by plasma-enhanced atomic layer deposition process
46	Designing high performance precursors for atomic layer deposition of silicon oxide
47	Effect of Nitrogen Incorporation in HfO₂ Films Deposited by Plasma-Enhanced Atomic Layer Deposition
48	Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO₃ Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
49	Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaN_x on Adhesion with Copper
50	Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
51	Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO₂
52	Electrical characteristics of Ga₂O₃-TiO₂ nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
53	Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
54	Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
55	Electrical properties of SrTa₂O₆ thin films by plasma enhanced atomic layer deposition (PEALD)
56	Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
57	Encapsulation method for atom probe tomography analysis of nanoparticles
58	Er coordination in Y₂O₃ thin films studied by extended x-ray absorption fine structure
59	Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
60	Fabrication and Characterization of Flexible Thin Film Transistors on Thin Solution-Cast Substrates
61	Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al₂O₃ Gate Dielectric
62	Fast PEALD ZnO Thin-Film Transistor Circuits
63	Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
64	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO₂ layer
65	From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
66	Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
67	Gas sensing properties in epitaxial SnO₂ films grown on TiO₂ single crystals with various orientations
68	Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
69	Growth characteristics and electrical properties of La₂O₃ gate oxides grown by thermal and plasma-enhanced atomic layer deposition
70	Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
71	High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
72	High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
73	Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl₄/NH₃ System
74	Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
75	Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
76	Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
77	Improvements on Interface Reliability and Capacitance Dispersion of Fluorinated ALD-Al₂O₃ Gate Dielectrics by CF₄ Plasma Treatment
78	In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
79	In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuN_x Barriers for Seedless Copper Electroplating
80	Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
81	Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
82	Infrared Study of Room Temperature Atomic Layer Deposition of SnO₂ Using Sn(CH₃)₄ and Plasma Excited Humidified Argon
83	Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
84	Infrared Study on Room-temperature Atomic Layer Deposition of TiO₂ Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
85	Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
86	Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
87	Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
88	Localized defect states and charge trapping in atomic layer deposited-Al₂O₃ films
89	Low Temperature Atomic Layer Deposition of Crystalline In₂O₃ Films
90	Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
91	Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
92	Low-Power Double-Gate ZnO TFT Active Rectifier
93	Low-Temperature ALD Growth of SrTiO₃ Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
94	Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
95	Low-temperature atomic layer deposition of MoO_x for silicon heterojunction solar cells
96	Low-temperature atomic layer deposition of TiO₂, Al₂O₃,and ZnO thin films
97	Low-Temperature Conformal Atomic Layer Deposition of SiN_x Films Using Si₂Cl₆ and NH₃ Plasma
98	Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
99	Low-Temperature Growth of SiO₂ Films by Plasma-Enhanced Atomic Layer Deposition
100	Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
101	Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
102	Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
103	Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
104	Moisture Barrier Properties of Al₂O₃ Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
105	Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO₄-precursor and H₂-plasma
106	Nitride mediated epitaxy of CoSi₂ through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
107	Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
108	Nucleation and growth of Pt atomic layer deposition on Al₂O₃ substrates using (methylcyclopentadienyl)-trimethyl platinum and O₂ plasma
109	Nucleation and growth of tantalum nitride atomic layer deposition on Al₂O₃ using TBTDET and hydrogen radicals
110	Optical and Electrical Properties of Al_xTi_1-xO Films
111	Optical and Electrical Properties of Ti_xSi_1-xO_y Films
112	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
113	Optical properties of Y₂O₃ thin films doped with spatially controlled Er³⁺ by atomic layer deposition
114	Oxide Charge Engineering of Atomic Layer Deposited AlO_xN_y/Al₂O₃ Gate Dielectrics: A Path to Enhancement Mode GaN Devices
115	Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
116	Oxide TFT LC Oscillators on Glass and Plastic for Wireless Functions in Large-Area Flexible Electronic Systems
117	Patterned deposition by plasma enhanced spatial atomic layer deposition
118	PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
119	PEALD of SiO₂ and Al₂O₃ Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
120	Permeation barrier properties of an Al₂O₃/ZrO₂ multilayer deposited by remote plasma atomic layer deposition
121	Plasma Enhanced Atomic Layer Deposition of Al₂O₃ and TiN
122	Plasma enhanced atomic layer deposition of Fe₂O₃ thin films
123	Plasma enhanced atomic layer deposition of Ga₂O₃ thin films
124	Plasma enhanced atomic layer deposition of HfO₂ and ZrO₂ high-k thin films
125	Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
126	Plasma Enhanced Atomic Layer Deposition of SiO₂ Using Space-Divided Plasma System
127	Plasma enhanced atomic layer deposition of SrTiO₃ thin films with Sr(tmhd)₂ and Ti(i-OPr)₄
128	Plasma Enhanced Atomic Layer Deposition of TiC_xN_y Film with Various Reactive Gases
129	Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
130	Plasma-Enhanced ALD of TiO₂ Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
131	Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl₄ , SiH₄, and N₂/H₂/Ar Plasma
132	Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
133	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
134	Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
135	Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
136	Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
137	Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
138	Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
139	Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
140	Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO₂ for Nonvolatile Memory Devices
141	Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
142	Radical-enhanced atomic layer deposition of Y₂O₃ via a beta-diketonate precursor and O radicals
143	Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al₂O₃ films deposited by remote plasma atomic layer deposition
144	Reaction mechanism of room temperature HfO₂ atomic layer deposition using remote plasma excited water and oxygen
145	Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
146	Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
147	Remote Plasma ALD of Platinum and Platinum Oxide Films
148	Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
149	Remote Plasma Atomic Layer Deposition of Co₃O₄ Thin Film
150	Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
151	Resistive switching properties of plasma enhanced-ALD La₂O₃ for novel nonvolatile memory application
152	Role of the (Ta/Nb)O_x/Al₂O₃ interface on the flatband voltage shift for Al₂O₃/(Ta/Nb)O_x/Al₂O₃ multilayer charge trap capacitors
153	Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
154	Room temperature atomic layer deposition of TiO₂ on gold nanoparticles
155	Room-Temperature Atomic Layer Deposition of HfO₂ By Using Remote Plasma Source
156	Room-temperature atomic layer deposition of ZrO₂ using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
157	RT Atomic Layer Deposition of Al₂O₃ By Using Remote Plasma Excited Water Vapor
158	RT Atomic Layer Deposition of ZrO₂ By Using Plasma Excited Water Vapor
159	Ru thin film grown on TaN by plasma enhanced atomic layer deposition
160	Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
161	Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
162	Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
163	Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
164	Study on the characteristics of aluminum thin films prepared by atomic layer deposition
165	Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
166	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
167	Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
168	Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
169	Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
170	The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
171	The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
172	Thermal and plasma enhanced atomic layer deposition of TiO₂: Comparison of spectroscopic and electric properties
173	Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
174	Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
175	Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
176	Ultra-thin Al₂O₃ coating on the acid-treated 0.3Li₂MnO₃·0.7LiMn_0.60Ni_0.25Co_0.15O₂ electrode for Li-ion batteries
177	XPS study of homemade plasma enhanced atomic layer deposited La₂O₃/ZrO₂ bilayer thin films
178	ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
179	ZrO₂ Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method