Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition

Type:
Journal
Info:
Journal of Applied Physics 114, 173511 (2013)
Date:
2013-10-21
DOI:
http://dx.doi.org/10.1063/1.4829031

Author Information

Name Institution
Hyunsoo JungHanyang University
Hagyoung ChoiHanyang University
Heeyoung JeonHanyang University
Sanghun LeeHanyang University
Hyeongtag JeonHanyang University

Films

Plasma Al2O3

Hardware used: Custom
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Calcium Test
Diagnostic: Custom

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Diagnostic: -

Characteristic: Compositional Depth Profiling
Analysis: AES, Auger Electron Spectroscopy
Diagnostic: -

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Plasma Species
Analysis: FHM, Floating Harmonic Method
Diagnostic: -

Substrates

PES, Poly(Ether Sulfone)

Notes

575