Publication Information

Title: Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition

Type: Journal

Info: Journal of Applied Physics 114, 173511 (2013)

Date: 2013-10-21

DOI: http://dx.doi.org/10.1063/1.4829031

Author Information

Name

Institution

Hyunsoo Jung

Hanyang University

Hagyoung Choi

Hanyang University

Heeyoung Jeon

Hanyang University

Sanghun Lee

Hanyang University

Hyeongtag Jeon

Hanyang University

Films

Plasma Al2O3 using Custom

Deposition Temperature Range N/A

TMA, Trimethyl Aluminum, Trimethylalane, Trimethylaluminium, Aluminium Trimethyl, Aluminum Trimethanide, Al(CH3)3, AlMe3, Al2(CH3)6, Al2Me6

75-24-1

Oxygen, O2

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Water Vapor Transmission Rate (WVTR)

Calcium Test

Custom

Thickness

SEM, Scanning Electron Microscopy

Unknown

Density

XRR, X-Ray Reflectivity

Unknown

Compositional Depth Profiling

AES, Auger Electron Spectroscopy

Unknown

Bonding States

XPS, X-ray Photoelectron Spectroscopy

Unknown

Plasma Species

FHM, Floating Harmonic Method

Unknown

Substrates

PES, Poly(Ether Sulfone)

Keywords

Encapsulation

Diffusion Barrier

Notes

575


Mark Sowa

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