Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition

Publication Information

Title: Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al₂O₃ films deposited by remote plasma atomic layer deposition

Type: Journal

Info: Journal of Applied Physics 114, 173511 (2013)

Date: 2013-10-21

DOI: http://dx.doi.org/10.1063/1.4829031

Author Information

Name

Institution

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Films

Plasma Al₂O₃ using Custom

Deposition Temperature Range N/A

TMA, AlMe₃, Trimethyl Aluminum

75-24-1

Where to buy precursor

O₂, Oxygen

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Water Vapor Transmission Rate (WVTR)

Calcium Test

Custom

Thickness

SEM, Scanning Electron Microscopy

Density

XRR, X-Ray Reflectivity

Compositional Depth Profiling

AES, Auger Electron Spectroscopy

Bonding States

XPS, X-ray Photoelectron Spectroscopy

Plasma Species

FHM, Floating Harmonic Method

Substrates

PES, Poly(Ether Sulfone)

Keywords

Encapsulation

Diffusion Barrier

Notes

575

Mark Sowa

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Precursors

Deposition Hardware

Film and Plasma Characteristics

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Publication Information

Author Information

Films

Plasma Al2O3 using Custom

Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Keywords

Notes

Shortcuts

Plasma Al₂O₃ using Custom