TMA, trimethyl aluminum, AlMe3, CAS# 75-24-1

Informational Websites

NumberWebsite
1https://en.wikipedia.org/wiki/Trimethylaluminium

Where to buy

NumberVendorLink
1EpiValenceAluminium trimethyl
2Strem Chemicals, Inc.Trimethylaluminum, min. 98%, contained in 50 ml cylinder for CVD/ALD
3American ElementsTrimethylaluminum
4Strem Chemicals, Inc.Trimethylaluminum, elec. gr. (99.999+%-Al), contained in 50 ml electropolished cylinder for CVD/ALD
5Strem Chemicals, Inc.Trimethylaluminum, elec. gr. (99.999+%-Al)
6Sigma-Aldrich, Co. LLCTrimethylaluminum 97%
7Pegasus ChemicalsTrimethylaluminium
8Strem Chemicals, Inc.Trimethylaluminum, min. 98% (Material sold in non-returnable cylinder)
9Strem Chemicals, Inc.Trimethylaluminum, min. 98%, contained in high-temp 50 ml cylinder for CVD/ALD
10Strem Chemicals, Inc.Trimethylaluminum, elec. gr. (99.999+%-Al), contained in 50 ml cylinder for CVD/ALD

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 590 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
2Radical Enhanced Atomic Layer Deposition of Metals and Oxides
3Study on the characteristics of aluminum thin films prepared by atomic layer deposition
4Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
5Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
6Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
7Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
8Encapsulation method for atom probe tomography analysis of nanoparticles
9Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
10'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
111D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
1246-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
13A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
14A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
15A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
16A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
17A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
18A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
19A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
20AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
21Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
22Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
23Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
24Advances in the fabrication of graphene transistors on flexible substrates
25Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
26Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
27Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
28Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
29Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
30ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
31AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
32AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
33AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
34AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
35AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
36Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
37Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
38Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
39Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
40An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
41Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
42Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
43Anti-stiction coating for mechanically tunable photonic crystal devices
44Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
45Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
46Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
47Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
48Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
49Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
50Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
51Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
52Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
53Atomic layer deposition of metal-oxide thin films on cellulose fibers
54Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
55Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
56Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
57Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
58Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
59AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
60Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
61Band alignment of Al2O3 with (-201) β-Ga2O3
62Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
63Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
64Breakdown and Protection of ALD Moisture Barrier Thin Films
65Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
66Capacitance spectroscopy of gate-defined electronic lattices
67Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
68Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
69Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
70Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
71Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
72Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
73Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
74Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
75Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
76Charge effects of ultrafine FET with nanodot type floating gate
77Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
78Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
79Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
80Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
81Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
82Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
83Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
84Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
85Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
86Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
87Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
88Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
89Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
90Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
91Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
92Damage evaluation in graphene underlying atomic layer deposition dielectrics
93DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
94Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
95Densification of Thin Aluminum Oxide Films by Thermal Treatments
96Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
97Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
98Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
99DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
100Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
101Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
102Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment
103Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
104Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
105Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
106Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
107Dynamic tuning of plasmon resonance in the visible using graphene
108Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
109Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
110Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
111Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
112Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
113Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
114Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
115Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
116Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
117Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
118Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
119Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
120Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
121Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
122Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
123Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
124Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
125Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
126Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
127Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
128Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
129Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
130Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
131Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
132Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
133Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
134Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
135Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
136Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
137Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
138Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
139Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
140Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
141Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
142Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
143Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
144Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
145Energy-enhanced atomic layer deposition for more process and precursor versatility
146Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
147Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
148Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
149Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
150Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
151Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
152Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
153Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
154Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
155Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
156Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
157Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
158Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
159Experimental verification of electro-refractive phase modulation in graphene
160Fabrication and Characterization of Flexible Thin Film Transistors on Thin Solution-Cast Substrates
161Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
162Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
163Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
164Fast Flexible Plastic Substrate ZnO Circuits
165Fast PEALD ZnO Thin-Film Transistor Circuits
166Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
167Fiber-matrix interface reinforcement using Atomic Layer Deposition
168Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
169Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
170Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
171Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
172Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
173First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
174Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
175Flexible Al2O3/plasma polymer multilayer moisture barrier films deposited by a spatial atomic layer deposition process
176Flexible, light trapping substrates for organic photovoltaics
177Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
178Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
179Gate Insulator for High Mobility Oxide TFT
180Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
181Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
182Hafnia and alumina on sulphur passivated germanium
183High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
184High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
185High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
186High-efficiency embedded transmission grating
187High-Reflective Coatings For Ground and Space Based Applications
188High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
189Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
190Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
191Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
192Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
193Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
194Impact of interface materials on side permeation in indirect encapsulation of organic electronics
195Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
196Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
197Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
198Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
199Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
200Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
201Improved understanding of recombination at the Si/Al2O3 interface
202Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
203Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
204Improvements on Interface Reliability and Capacitance Dispersion of Fluorinated ALD-Al2O3 Gate Dielectrics by CF4 Plasma Treatment
205Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
206Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
207Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
208In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
209In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
210In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
211In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
212In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
213Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
214Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
215Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
216Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
217Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
218Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
219Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
220Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
221Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
222Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
223Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
224Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
225Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
226Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
227Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
228Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
229Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
230Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
231Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
232Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
233Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
234Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
235Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
236Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
237Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
238Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
239Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
240Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
241Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
242Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
243Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
244Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
245Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
246Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
247Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
248Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
249Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
250Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
251Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
252Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
253Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
254Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
255Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
256Lithium-Iron (III) Fluoride Battery with Double Surface Protection
257Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
258Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
259Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
260Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
261Low-Power Double-Gate ZnO TFT Active Rectifier
262Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
263Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
264Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
265Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
266MANOS performance dependence on ALD Al2O3 oxidation source
267Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
268Mechanical properties of thin-film Parylene-metal-Parylene devices
269Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
270Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
271Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
272Method of Fabrication for Encapsulated Polarizing Resonant Gratings
273Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
274Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
275Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
276Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
277Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
278Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
279Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
280MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
281Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
282N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
283Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
284Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
285Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
286Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
287Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
288Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
289Nitride passivation of the interface between high-k dielectrics and SiGe
290Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
291Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
292Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
293Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
294On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
295On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
296On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
297On the equilibrium concentration of boron-oxygen defects in crystalline silicon
298On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
299On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
300Optical display film as flexible and light trapping substrate for organic photovoltaics
301Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
302Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
303Optimization of the Surface Structure on Black Silicon for Surface Passivation
304Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
305Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
306Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
307Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
308Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
309Oxide TFT LC Oscillators on Glass and Plastic for Wireless Functions in Large-Area Flexible Electronic Systems
310Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
311Passivation effects of atomic-layer-deposited aluminum oxide
312Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
313Patterned deposition by plasma enhanced spatial atomic layer deposition
314PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
315Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
316Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
317Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
318Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
319Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
320Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
321Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
322Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
323Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
324Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
325Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
326Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
327Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
328Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
329Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
330Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
331Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
332Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
333Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
334Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
335Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
336Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
337Propagation Effects in Carbon Nanoelectronics
338Protective capping and surface passivation of III-V nanowires by atomic layer deposition
339Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
340Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
341Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
342Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
343Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
344Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
345Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
346Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
347Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
348Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
349RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
350Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
351Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
352Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
353Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
354Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
355Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
356Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
357Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
358Single-Cell Photonic Nanocavity Probes
359Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
360Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
361Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
362Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
363Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
364Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
365Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
366Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
367Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
368Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
369Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
370Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
371Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
372Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
373Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
374Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
375Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
376Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
377Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
378Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
379Symmetrical Al2O3-based passivation layers for p- and n-type silicon
380Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
381Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
382Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
383The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
384The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
385The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
386Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
387Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
388Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
389Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
390Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
391TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
392Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
393Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
394Toward Understanding Positive Bias Temperature Instability in Fully Recessed-Gate GaN MISFETs
395Trapped charge densities in Al2O3-based silicon surface passivation layers
396Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
397Tribological properties of thin films made by atomic layer deposition sliding against silicon
398Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
399Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
400Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
401Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
402Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
403Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
404Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
405Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
406Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
407Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
408Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
409Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
410Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
411Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
412Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
413Very high frequency plasma reactant for atomic layer deposition
414Wet Chemical Oxidation to Improve Interfacial Properties of Al2O3/Si and Interface Analysis of Al2O3/SiOx/Si Structure Using Surface Carrier Lifetime Simulation and Capacitance-Voltage Measurement
415Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
416Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
417Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
418Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
419Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
420Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
421Atomic layer epitaxy for quantum well nitride-based devices
422Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
423Perspectives on future directions in III-N semiconductor research
424Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
425823-mA/mm Drain Current Density and 945-MW/cm2 Baliga's Figure-of-Merit Enhancement-Mode GaN MISFETs With a Novel PEALD-AlN/LPCVD-Si3N4 Dual-Gate Dielectric
426A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
427A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
428A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
429ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
430AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
431AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
432AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
433AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
434Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
435Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
436Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
437Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
438Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
439Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
440Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
441Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
442Atomic layer epitaxy for quantum well nitride-based devices
443Bipolar resistive switching properties of AlN films deposited by plasma-enhanced atomic layer deposition
444Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
445Comparison of ammonia plasma and AlN passivation by plasma-enhanced atomic layer deposition
446Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
447Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
448Compatibility of AlN/SiNx Passivation Technique with High-Temperature Process
449Compatibility of AlN/SiNx Passivation With LPCVD-SiNx Gate Dielectric in GaN-Based MIS-HEMT
450Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
451Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
452Crystalline growth of AlN thin films by atomic layer deposition
453Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
454Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
455Effect of Film Thickness on the Electrical Properties of AlN Films Prepared by Plasma-Enhanced Atomic Layer Deposition
456Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
457Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
458Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
459Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
460Engineered Tunneling Contacts with Low-Temperature Atomic Layer Deposition of AlN on GaN
461Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
462Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
463GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
464GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
465Gate Recessed Quasi-Normally OFF Al2O3/AlGaN/GaN MIS-HEMT With Low Threshold Voltage Hysteresis Using PEALD AlN Interfacial Passivation Layer
466Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
467Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
468Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
469Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
470Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
471High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
472High performance graphene field effect transistors on an aluminum nitride substrate with high surface phonon energy
473High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
474Impact of AlN Interfacial Dipole on Effective Work Function of Ni and Band Alignment of Ni/HfO2/In0.53Ga0.47As Gate-Stack
475Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
476Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
477Improved Interface and Transport Properties of AlGaN/GaN MIS-HEMTs With PEALD-Grown AlN Gate Dielectric
478Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
479Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
480Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
481Investigation of AlGaN/GaN HEMTs Passivated by AlN Films Grown by Atomic Layer Epitaxy
482Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
483Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
484Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
485New materials for memristive switching
486Nitride memristors
487Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
488Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
489PEALD AlN: controlling growth and film crystallinity
490PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
491Perspectives on future directions in III-N semiconductor research
492Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
493Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
494Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
495Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
496Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
497Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
498Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
499Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
500Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
501Properties of AlN grown by plasma enhanced atomic layer deposition
502Properties of atomic-layer-deposited ultra-thin AlN films on GaAs surfaces
503Protective capping and surface passivation of III-V nanowires by atomic layer deposition
504Radical Enhanced Atomic Layer Deposition of Metals and Oxides
505Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
506Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
507Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
508Silicon surface passivation with atomic layer deposited aluminum nitride
509Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
510Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
511Structural and optical characterization of low-temperature ALD crystalline AlN
512Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
513Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
514Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
515Surface passivation of GaAs nanowires by the atomic layer deposition of AlN
516Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
517The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
518The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
519Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
520Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
521TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
522Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
523XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
524Improvements on Interface Reliability and Capacitance Dispersion of Fluorinated ALD-Al2O3 Gate Dielectrics by CF4 Plasma Treatment
525Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
526Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
527Effects of Recessed-Gate Structure on AlGaN/GaN-on-SiC MIS-HEMTs with Thin AlOxNy MIS Gate
528Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
529Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
530Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
531Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
532Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
533Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
534Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
535Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
536Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
537Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
538Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
539Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
540Plasma enhanced atomic layer deposition of aluminum sulfide thin films
541Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
542Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
543Composite materials and nanoporous thin layers made by atomic layer deposition
544Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
545Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
546Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
547Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
548Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
549Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
550Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
551Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
552Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
553Optical and Electrical Properties of AlxTi1-xO Films
554Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
555Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
556Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
557Breakdown and Protection of ALD Moisture Barrier Thin Films
558Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
559A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
560Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
561Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
562The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
563Tuning size and coverage of Pd nanoparticles using atomic layer deposition
564Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
565Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
566Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
567Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
568Tribological properties of thin films made by atomic layer deposition sliding against silicon
569Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
570Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
571Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition