Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3

Type:
Journal
Info:
Journal of Applied Physics 103, 103302 (2008)
Date:
2008-03-17

Author Information

Name Institution
S. B. S. HeilEindhoven University of Technology
J. L. van HemmenEindhoven University of Technology
Mauritius C. M. (Richard) van de SandenEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films

Plasma Al2O3


Plasma Al2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Thickness
Analysis: QCM, Quartz Crystal Microbalance

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy

Substrates

SiO2

Keywords

Notes

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