Mauritius C. M. (Richard) van de Sanden Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Mauritius C. M. (Richard) van de Sanden returned 35 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
2	Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
3	Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
4	Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
5	Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
6	Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
7	Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
8	In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
9	In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
10	Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
11	Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
12	Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
13	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
14	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
15	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
16	Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
17	Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
18	Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
19	Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
20	Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
21	Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
22	Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
23	Remote Plasma ALD of Platinum and Platinum Oxide Films
24	Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
25	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
26	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
27	Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
28	Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
29	Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
30	Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
31	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
32	Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
33	Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
34	Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
35	The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides

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