Mauritius C. M. (Richard) van de Sanden Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Mauritius C. M. (Richard) van de Sanden returned 48 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
2Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
3Remote Plasma ALD of Platinum and Platinum Oxide Films
4Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
5Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
6Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
7Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
8Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
9Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
10Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
11Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
12Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
13Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
14Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
15The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
16Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
17Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
18Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
19Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
20Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
21Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
22Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
23Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
24Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
25Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
26Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
27Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
28Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
29Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
30Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
31Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
32Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
33Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
34Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
35Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
36Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
37In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
38In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
39Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
40Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
41Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
42Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
43Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
44Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
45Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
46In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
47Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
48Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3