Mauritius C. M. (Richard) van de Sanden Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Mauritius C. M. (Richard) van de Sanden returned 40 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
2	Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
3	Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
4	Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
5	Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
6	Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
7	Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
8	In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
9	In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
10	In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
11	Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
12	Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
13	Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
14	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
15	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
16	Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
17	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
18	Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
19	Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
20	Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
21	Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
22	Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
23	Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
24	Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
25	Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
26	Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
27	Remote Plasma ALD of Platinum and Platinum Oxide Films
28	Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
29	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
30	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
31	Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
32	Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
33	Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
34	Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
35	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
36	Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
37	Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
38	Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
39	Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
40	The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides

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