Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
Type:
Journal
Info:
Journal of The Electrochemical Society, 158 (4) G92-G96 (2011)
Date:
2010-12-14
Author Information
Name | Institution |
---|---|
Merijn E. Donders | Materials innovation institute M2i |
Harm C. M. Knoops | Materials innovation institute M2i |
Mauritius C. M. (Richard) van de Sanden | Eindhoven University of Technology |
Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
Peter H. L. Notten | Eindhoven University of Technology |
Films
Plasma CoOx
Film/Plasma Properties
Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Substrates
Si(100) |
SiO2 |
Notes
694 |