Harm C. M. Knoops Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Harm C. M. Knoops returned 29 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
2Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
3Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
4Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
5Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
6Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
7Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
8Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
9Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
10Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
11Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
12Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
13Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
14Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
15Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
16Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
17Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
18Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
19Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
20Remote Plasma ALD of Platinum and Platinum Oxide Films
21Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
22Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
23Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
24Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
25Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
26Room-Temperature Atomic Layer Deposition of Platinum
27Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
28Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
29Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies