Harm C. M. Knoops Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Harm C. M. Knoops returned 24 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
2	Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
3	Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
4	Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
5	Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
6	Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
7	Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
8	Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
9	Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
10	Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
11	Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
12	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
13	Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
14	Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
15	Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
16	Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
17	Remote Plasma ALD of Platinum and Platinum Oxide Films
18	Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
19	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
20	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
21	Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
22	Room-Temperature Atomic Layer Deposition of Platinum
23	Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
24	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies

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