Harm C. M. Knoops Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Harm C. M. Knoops returned 37 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
2Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
3Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
4Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
5Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
6'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
7Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
8Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
9Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
10Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
11Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
12Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
13Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
14Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
15Innovative remote plasma source for atomic layer deposition for GaN devices
16Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
17Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
18Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
19Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
20Remote Plasma ALD of Platinum and Platinum Oxide Films
21Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
22Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
23Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
24Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
25Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
26Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
27Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
28Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
29Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
30Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
31Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
32Co3O4 as Anode Material for Thin Film ĀµBatteries prepared by Remote Plasma Atomic Layer Deposition
33Room-Temperature Atomic Layer Deposition of Platinum
34Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
35Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
36Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
37Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties