Harm C. M. Knoops Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Harm C. M. Knoops returned 37 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Remote Plasma ALD of Platinum and Platinum Oxide Films
2Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
3Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
4Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
5Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
6'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
7Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
8Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
9Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
10Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
11Co3O4 as Anode Material for Thin Film ĀµBatteries prepared by Remote Plasma Atomic Layer Deposition
12Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
13Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
14Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
15Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
16Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
17Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
18Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
19Innovative remote plasma source for atomic layer deposition for GaN devices
20Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
21Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
22Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
23Room-Temperature Atomic Layer Deposition of Platinum
24Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
25Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
26Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
27Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
28Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
29Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
30Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
31Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
32Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
33Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
34Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
35Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
36Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
37Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers