Title: Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
Type: Journal
Info: J. Vac. Sci. Technol. A 28(1), Jan/Feb 2010
Date: 2009-12-09
DOI: http://dx.doi.org/10.1116/1.3256227
Name
Institution
Eindhoven University of Technology
Eindhoven University of Technology
Eindhoven University of Technology
Eindhoven University of Technology
Eindhoven University of Technology
Eindhoven University of Technology
Characteristic
Analysis
Diagnostic
OES
OES, Optical Emission Spectroscopy
Ocean Optics UBS 4000-UV-VIS
110
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