Publication Information

Title:
Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
Type:
Journal
Info:
J. Vac. Sci. Technol. A 28(1), Jan/Feb 2010
Date:
2009-12-09

Author Information

Name Institution
Adriaan J. M. MackusEindhoven University of Technology
S. B. S. HeilEindhoven University of Technology
E. LangereisEindhoven University of Technology
Harm C. M. KnoopsEindhoven University of Technology
Mauritius C. M. (Richard) van de SandenEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films

Plasma Al2O3


Plasma Al2O3


Plasma Ta2O5


Plasma TaNx


Plasma TiN


Film/Plasma Properties

Characteristic: OES
Analysis: OES, Optical Emission Spectroscopy

Substrates

Keywords

Notes

110