Name

Institution

Adriaan J. M. Mackus

Eindhoven University of Technology

S. B. S. Heil

Eindhoven University of Technology

E. Langereis

Eindhoven University of Technology

Harm C. M. Knoops

Eindhoven University of Technology

Mauritius C. M. (Richard) van de Sanden

Eindhoven University of Technology

Erwin (W.M.M.) Kessels

Eindhoven University of Technology

Plasma Al₂O₃ using Custom

Deposition Temperature Range N/A

TMA, Trimethyl Aluminum, Trimethylalane, Trimethylaluminium, Aluminium Trimethyl, Aluminum Trimethanide, Al(CH₃)₃, AlMe₃, Al₂(CH₃)₆, Al₂Me₆

75-24-1

Where to buy precursor

Oxygen, O₂

7782-44-7

Plasma Al₂O₃ using Oxford Instruments FlexAL

Deposition Temperature Range N/A

TMA, Trimethyl Aluminum, Trimethylalane, Trimethylaluminium, Aluminium Trimethyl, Aluminum Trimethanide, Al(CH₃)₃, AlMe₃, Al₂(CH₃)₆, Al₂Me₆

75-24-1

Where to buy precursor

Oxygen, O₂

7782-44-7

Plasma Ta₂O₅ using Custom

Deposition Temperature Range N/A

Ta(NMe₂)₅, Pentakis(DiMethylAmino)Tantalum, PDMAT

19824-59-0

Where to buy precursor

Oxygen, O₂

7782-44-7

Plasma TaN_x using Custom

Deposition Temperature Range N/A

Ta(NMe₂)₅, Pentakis(DiMethylAmino)Tantalum, PDMAT

19824-59-0

Where to buy precursor

Nitrogen, N₂

7727-37-9

Hydrogen, H₂

1333-74-0

Plasma TiN using Oxford Instruments FlexAL

Deposition Temperature Range N/A

Titanium Tetrachloride, TiCl₄

7550-45-0

Where to buy precursor

Nitrogen, N₂

7727-37-9

Hydrogen, H₂

1333-74-0

Characteristic

Analysis

Diagnostic

OES

OES, Optical Emission Spectroscopy

Ocean Optics UBS 4000-UV-VIS

110