Publication Information

Title: Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes

Type: Journal

Info: J. Vac. Sci. Technol. A 28(1), Jan/Feb 2010

Date: 2009-12-09

DOI: http://dx.doi.org/10.1116/1.3256227

Author Information

Name

Institution

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Films

Plasma Al2O3 using Custom

Deposition Temperature Range N/A

75-24-1

7782-44-7

Deposition Temperature Range N/A

75-24-1

7782-44-7

Plasma Ta2O5 using Custom

Deposition Temperature Range N/A

19824-59-0

7782-44-7

Plasma TaNx using Custom

Deposition Temperature Range N/A

19824-59-0

7727-37-9

1333-74-0

Deposition Temperature Range N/A

7550-45-0

7727-37-9

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

OES

OES, Optical Emission Spectroscopy

Ocean Optics UBS 4000-UV-VIS

Substrates

Keywords

Notes

110



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