Publication Information

Title: Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes

Type: Journal

Info: J. Vac. Sci. Technol. A 28(1), Jan/Feb 2010

Date: 2009-12-09

DOI: http://dx.doi.org/10.1116/1.3256227

Author Information

Name

Institution

Adriaan J. M. Mackus

Eindhoven University of Technology

S. B. S. Heil

Eindhoven University of Technology

E. Langereis

Eindhoven University of Technology

Harm C. M. Knoops

Eindhoven University of Technology

Mauritius C. M. (Richard) van de Sanden

Eindhoven University of Technology

Erwin (W.M.M.) Kessels

Eindhoven University of Technology

Films

Plasma Al2O3 using Custom

Deposition Temperature Range N/A

TMA, AlMe3, Trimethyl Aluminum

75-24-1

Where to buy precursor

O2, Oxygen

7782-44-7

Plasma Al2O3 using Oxford Instruments FlexAL

Deposition Temperature Range N/A

TMA, AlMe3, Trimethyl Aluminum

75-24-1

Where to buy precursor

O2, Oxygen

7782-44-7

Plasma Ta2O5 using Custom

Deposition Temperature Range N/A

Ta(NMe2)5, Pentakis(DiMethylAmino)Tantalum, PDMAT

19824-59-0

Where to buy precursor

O2, Oxygen

7782-44-7

Plasma TaNx using Custom

Deposition Temperature Range N/A

Ta(NMe2)5, Pentakis(DiMethylAmino)Tantalum, PDMAT

19824-59-0

Where to buy precursor

N2, Nitrogen

7727-37-9

H2, Hydrogen

1333-74-0

Plasma TiN using Oxford Instruments FlexAL

Deposition Temperature Range N/A

TiCl4, Titanium Tetrachloride

7550-45-0

Where to buy precursor

N2, Nitrogen

7727-37-9

H2, Hydrogen

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

OES

OES, Optical Emission Spectroscopy

Ocean Optics UBS 4000-UV-VIS

Substrates

Keywords

Notes

110


Mark Sowa

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