Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:

  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.



Adriaan J. M. Mackus Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Adriaan J. M. Mackus returned 18 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
2Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
3Remote Plasma ALD of Platinum and Platinum Oxide Films
4In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
5Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
6Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
7Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
8Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
9Atomic layer deposition of Pd and Pt nanoparticles for catalysis: on the mechanisms of nanoparticle formation
10Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
11Area-Selective Atomic Layer Deposition of In2O3:H Using a ยต-Plasma Printer for Local Area Activation
12Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
13Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
14Room-Temperature Atomic Layer Deposition of Platinum
15Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
16Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
17Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
18Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition