Publication Information

Title:
Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
Type:
Journal
Info:
J. Phys. Chem. C, 2018, 122 (39), pp 22519-22529
Date:
2018-08-10

Author Information

Name Institution
Martijn F. J. VosEindhoven University of Technology
Gerben van StraatenEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology
Adriaan J. M. MackusEindhoven University of Technology

Films



Film/Plasma Properties

Characteristic: Plasma Species
Analysis: QMS, Quadrupole Mass Spectrometer

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Substrates

SiO2

Keywords

Notes

Study includes both "AB" N2/H2 gas mix plasma and consecutive "ABC" N2 and H2 plasmas.
1416