Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant

Type:
Journal
Info:
J. Phys. Chem. C, 2018, 122 (39), pp 22519-22529
Date:
2018-08-10
DOI:
http://dx.doi.org/10.1021/acs.jpcc.8b06342

Author Information

Name Institution
Martijn F. J. VosEindhoven University of Technology
Gerben van StraatenEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology
Adriaan J. M. MackusEindhoven University of Technology

Films

Plasma Co

Hardware used: Custom Remote Inductively Coupled Plasma
cobaltacene, bis(cyclopentadienyl)cobalt, Cp2Co
CAS#: 1277-43-6
Where to buy precursor
NH3, Ammonia
CAS#: 7664-41-7
Deposition Temperature = 300C

Plasma Co

Hardware used: Custom Remote Inductively Coupled Plasma
cobaltacene, bis(cyclopentadienyl)cobalt, Cp2Co
CAS#: 1277-43-6
Where to buy precursor
N2, Nitrogen
CAS#: 7727-37-9
H2, Hydrogen
CAS#: 1333-74-0

Where to buy onsite generators

Deposition Temperature = 300C

Film/Plasma Properties

Characteristic: Plasma Species
Analysis: QMS, Quadrupole Mass Spectrometer
Diagnostic: Pfeiffer QMS 200

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Diagnostic: Ocean Optics UBS 4000-UV-VIS

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000U

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Diagnostic: JEOL 2010F

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Diagnostic: Signatone SYS-301 resistivity probing system

Substrates

SiO2

Notes

Study includes both "AB" N2/H2 gas mix plasma and consecutive "ABC" N2 and H2 plasmas.
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