Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


cobaltacene, bis(cyclopentadienyl)cobalt, Cp2Co, CAS# 1277-43-6

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.🇺🇸Bis(cyclopentadienyl)cobalt(II), min. 98% (Cobaltocene)
2Pegasus Chemicals🇬🇧Bis(cyclopentadienyl)cobalt
3Ereztech🇺🇸Bis(cyclopentadienyl) cobalt

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 32 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
2Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
3Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
4Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
5Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
6Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
7A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
8Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
9Reaction Mechanism of the Metal Precursor Pulse in Plasma-Enhanced Atomic Layer Deposition of Cobalt and the Role of Surface Facets
10Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
11Plasma-enhanced atomic layer deposition of Co on metal surfaces
12Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
13Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
14Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
15High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
16Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
17Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
18Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
19Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
20Co/CoP Nanoparticles Encapsulated Within N, P-Doped Carbon Nanotubes on Nanoporous Metal-Organic Framework Nanosheets for Oxygen Reduction and Oxygen Evolution Reactions
21Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
22Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
23Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
24Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
25Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
26Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
27Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
28Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
29High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
30Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
31Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
32Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co