Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
Type:
Journal
Info:
Electrochemistry Communications 98 (2019) 73-77
Date:
2018-11-29
Author Information
| Name | Institution |
|---|---|
| Valerio Di Palma | Eindhoven University of Technology |
| Georgios Zafeiropoulos | Dutch Institute For Fundamental Energy Research (DIFFER) |
| T. Goldsweer | Eindhoven University of Technology |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
| Mauritius C. M. (Richard) van de Sanden | Eindhoven University of Technology |
| Mariadriana Creatore | Eindhoven University of Technology |
| Mihalis N. Tsampas | Dutch Institute For Fundamental Energy Research (DIFFER) |
Films
Plasma Co3(PO4)2
Plasma CoOx
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Density
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Electrochemical Performance
Analysis: CV, Cyclic Voltammetry
Characteristic: Catalysis
Analysis: CV, Cyclic Voltammetry
Substrates
| Si(100) |
Notes
| 1415 |