Publication Information

Title:
Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
Type:
Journal
Info:
Electrochemistry Communications 98 (2019) 73-77
Date:
2018-11-29

Author Information

Name Institution
Valerio Di PalmaEindhoven University of Technology
G. ZafeiropoulosDutch Institute For Fundamental Energy Research (DIFFER)
T. GoldsweerEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology
Mauritius C. M. (Richard) van de SandenEindhoven University of Technology
Mariadriana CreatoreEindhoven University of Technology
M.N. TsampasDutch Institute For Fundamental Energy Research (DIFFER)

Films



Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Density
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Electrochemical Performance
Analysis: CV, Cyclic Voltammetry

Characteristic: Catalysis
Analysis: CV, Cyclic Voltammetry

Substrates

Si(100)

Keywords

Catalysts

Notes

1415