1 | Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma |
2 | Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy |
3 | Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time |
4 | Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs |
5 | Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy |
6 | Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3 |
7 | Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers |
8 | Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer |
9 | Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation |
10 | Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction |
11 | Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension |
12 | Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma |
13 | Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2 |
14 | Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD |
15 | Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications |
16 | Innovative remote plasma source for atomic layer deposition for GaN devices |
17 | Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks |
18 | Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions |
19 | Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology |
20 | Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum |
21 | Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3 |
22 | Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries |
23 | Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3 |
24 | Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment |
25 | Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors |
26 | Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma |
27 | Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing |
28 | Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant |
29 | Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges |
30 | Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition |
31 | Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition |
32 | Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2 |
33 | Anti-stiction coating for mechanically tunable photonic crystal devices |
34 | Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells |
35 | Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers |
36 | Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films |
37 | Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition |
38 | On the Contact Optimization of ALD-Based MoS2 FETs: Correlation of Processing Conditions and Interface Chemistry with Device Electrical Performance |
39 | Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing |
40 | Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications |
41 | Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating |
42 | Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface |
43 | Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD |
44 | Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas |
45 | Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition |
46 | Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films |
47 | Room-Temperature Atomic Layer Deposition of Platinum |
48 | Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2 |
49 | The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides |
50 | Comparative study of ALD SiO2 thin films for optical applications |
51 | Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films |
52 | Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor |
53 | Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches |
54 | Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells |
55 | Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma |
56 | Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation |
57 | Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor |
58 | Energy-enhanced atomic layer deposition for more process and precursor versatility |
59 | Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells |
60 | Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon |
61 | Atomic layer deposition of Pd and Pt nanoparticles for catalysis: on the mechanisms of nanoparticle formation |
62 | Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition |
63 | Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3 |
64 | Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers |
65 | In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3 |
66 | Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films |
67 | 'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition |
68 | Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3 |
69 | Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film |
70 | Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition |
71 | Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma |
72 | Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma |
73 | Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film |
74 | Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation |
75 | Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers |
76 | Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry |
77 | Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy |
78 | Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry |
79 | Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films |
80 | Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma |
81 | Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas |
82 | Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution |
83 | Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma |
84 | Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure |
85 | Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth |
86 | Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection |
87 | Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma |
88 | Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy |
89 | Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3 |
90 | Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions |
91 | Remote Plasma ALD of Platinum and Platinum Oxide Films |
92 | Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2 |
93 | Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma |
94 | Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films |
95 | Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies |
96 | Encapsulation method for atom probe tomography analysis of nanoparticles |
97 | Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties |
98 | Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films |
99 | Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition |
100 | Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate |
101 | Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition |
102 | Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes |
103 | Plasma-Assisted ALD of LiPO(N) for Solid State Batteries |
104 | Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD |
105 | Opportunities of Atomic Layer Deposition for Perovskite Solar Cells |
106 | In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd |
107 | Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma |
108 | Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3 |
109 | Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride |
110 | Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition |
111 | Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates |
112 | Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties |
113 | Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells |
114 | Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma |
115 | In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition |
116 | Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications |
117 | Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices |
118 | Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells |
119 | Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor |
120 | Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition |
121 | Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers |
122 | Atomic layer deposition of high-mobility hydrogen-doped zinc oxide |
123 | Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides |
124 | Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks |
125 | Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization |
126 | Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies |
127 | Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films |
128 | Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle |