Erwin (W.M.M.) Kessels Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Erwin (W.M.M.) Kessels returned 123 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
2Anti-stiction coating for mechanically tunable photonic crystal devices
3Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
4Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
5Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
6Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
7Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
8Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
9Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
10Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
11Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
12Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
13Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
14Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
15Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
16Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
17Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
18Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
19Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
20Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
21Atomic layer deposition of Pd and Pt nanoparticles for catalysis: on the mechanisms of nanoparticle formation
22Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
23Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
24Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
25Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
26Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
27Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
28Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
29Comparative study of ALD SiO2 thin films for optical applications
30Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
31Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
32Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
33Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
34Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
35Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
36Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
37Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
38Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
39Encapsulation method for atom probe tomography analysis of nanoparticles
40Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
41Energy-enhanced atomic layer deposition for more process and precursor versatility
42Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
43Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
44Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
45Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
46Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
47Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
48Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
49In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
50In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
51In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
52Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
53Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
54Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
55Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
56Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
57Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
58Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
59Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
60Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
61Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
62Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
63Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
64Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
65Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
66Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
67Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
68On the Contact Optimization of ALD-Based MoS2 FETs: Correlation of Processing Conditions and Interface Chemistry with Device Electrical Performance
69Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
70Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
71Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
72Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
73Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
74Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
75Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
76Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
77Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
78Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
79Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
80Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
81Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
82Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
83Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
84Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
85Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
86Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
87Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
88Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
89Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
90Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
91Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
92Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
93Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
94Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
95Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
96Remote Plasma ALD of Platinum and Platinum Oxide Films
97Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
98Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
99Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
100Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
101Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
102Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
103Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
104Room-Temperature Atomic Layer Deposition of Platinum
105Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
106Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
107Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
108Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
109Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
110Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
111Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
112Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
113Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
114Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
115Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
116Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
117Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
118Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
119The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
120Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
121Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
122Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
123Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization