Erwin (W.M.M.) Kessels Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Erwin (W.M.M.) Kessels returned 93 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
2Anti-stiction coating for mechanically tunable photonic crystal devices
3Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
4Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
5Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
6Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
7Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
8Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
9Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
10Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
11Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
12Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
13Atomic layer deposition of Pd and Pt nanoparticles for catalysis: on the mechanisms of nanoparticle formation
14Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
15Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
16Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
17Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
18Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
19Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
20Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
21Comparative study of ALD SiO2 thin films for optical applications
22Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
23Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
24Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
25Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
26Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
27Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
28Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
29Encapsulation method for atom probe tomography analysis of nanoparticles
30Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
31Energy-enhanced atomic layer deposition for more process and precursor versatility
32Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
33Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
34Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
35Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
36In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
37In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
38In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
39Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
40Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
41Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
42Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
43Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
44Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
45Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
46Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
47Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
48Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
49Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
50Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
51Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
52Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
53Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
54Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
55Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
56Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
57Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
58Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
59Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
60Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
61Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
62Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
63Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
64Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
65Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
66Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
67Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
68Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
69Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
70Remote Plasma ALD of Platinum and Platinum Oxide Films
71Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
72Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
73Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
74Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
75Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
76Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
77Room-Temperature Atomic Layer Deposition of Platinum
78Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
79Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
80Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
81Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
82Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
83Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
84Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
85Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
86Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
87Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
88Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
89Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
90The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
91Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
92Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
93Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization


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