Erwin (W.M.M.) Kessels Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Erwin (W.M.M.) Kessels returned 129 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
2Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
3Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
4The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
5Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
6Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
7Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
8Atomic layer deposition of Pd and Pt nanoparticles for catalysis: on the mechanisms of nanoparticle formation
9Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
10Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
11Remote Plasma ALD of Platinum and Platinum Oxide Films
12Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
13Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
14Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
15Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
16Encapsulation method for atom probe tomography analysis of nanoparticles
17Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
18Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
19Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
20Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
21Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
22Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
23Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
24Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
25Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
26Innovative remote plasma source for atomic layer deposition for GaN devices
27Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
28Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
29Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
30Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
31Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
32Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
33Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
34Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
35Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
36In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
37Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
38Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
39Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
40Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
41Comparative study of ALD SiO2 thin films for optical applications
42Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
43Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
44Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
45Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
46Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
47Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
48Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
49Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
50Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
51Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
52Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
53In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
54Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
55Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
56Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
57Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
58Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
59Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
60Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
61Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
62Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
63Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
64Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
65Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
66Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
67Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
68Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
69Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
70Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
71Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
72Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
73Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
74Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
75Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
76Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
77Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
78Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
79Room-Temperature Atomic Layer Deposition of Platinum
80Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
81Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
82Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
83Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
84Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
85Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
86Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
87Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
88'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
89Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
90Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
91Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
92Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
93Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
94Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
95Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
96Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
97Anti-stiction coating for mechanically tunable photonic crystal devices
98Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
99Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
100Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
101Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
102On the Contact Optimization of ALD-Based MoS2 FETs: Correlation of Processing Conditions and Interface Chemistry with Device Electrical Performance
103Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
104Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
105Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
106Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
107Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
108Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
109Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
110Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
111Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
112Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
113Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
114In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
115Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
116Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
117Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
118Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
119Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
120Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
121Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
122Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
123Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
124Energy-enhanced atomic layer deposition for more process and precursor versatility
125Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
126Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
127Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
128Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
129Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation