Erwin (W.M.M.) Kessels Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Erwin (W.M.M.) Kessels returned 129 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
2In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
3Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
4'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
5Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
6Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
7In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
8Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
9Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
10Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
11Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
12Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
13Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
14Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
15Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
16Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
17Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
18Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
19Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
20On the Contact Optimization of ALD-Based MoS2 FETs: Correlation of Processing Conditions and Interface Chemistry with Device Electrical Performance
21Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
22Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
23Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
24Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
25Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
26Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
27Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
28Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
29Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
30Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
31Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
32Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
33Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
34Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
35Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
36Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
37Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
38Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
39Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
40Atomic layer deposition of Pd and Pt nanoparticles for catalysis: on the mechanisms of nanoparticle formation
41Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
42Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
43Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
44Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
45Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
46Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
47Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
48Anti-stiction coating for mechanically tunable photonic crystal devices
49Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
50Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
51Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
52Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
53Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
54Energy-enhanced atomic layer deposition for more process and precursor versatility
55Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
56Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
57Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
58Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
59Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
60Encapsulation method for atom probe tomography analysis of nanoparticles
61Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
62Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
63Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
64Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
65Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
66Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
67Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
68Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
69In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
70Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
71Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
72Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
73Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
74Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
75Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
76Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
77Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
78Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
79Comparative study of ALD SiO2 thin films for optical applications
80Room-Temperature Atomic Layer Deposition of Platinum
81Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
82Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
83Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
84Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
85Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
86Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
87Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
88Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
89Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
90Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
91Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
92Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
93Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
94Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
95Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
96Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
97Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
98Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
99Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
100Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
101Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
102Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
103Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
104Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
105Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
106Remote Plasma ALD of Platinum and Platinum Oxide Films
107Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
108Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
109Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
110Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
111Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
112Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
113Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
114Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
115Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
116Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
117The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
118Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
119Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
120Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
121Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
122Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
123Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
124Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
125Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
126Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
127Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
128Innovative remote plasma source for atomic layer deposition for GaN devices
129Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD