Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
Type:
Conference Proceedings
Info:
ECS Transactions, 3 (15) 79-86 (2007)
Date:
2007-03-01
Author Information
| Name | Institution |
|---|---|
| Chris Hodson | Oxford Instruments |
| Nick Singh | Oxford Instruments |
| S. B. S. Heil | Eindhoven University of Technology |
| J. L. van Hemmen | Eindhoven University of Technology |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
Films
Plasma HfO2
Thermal HfO2
Plasma TiN
Film/Plasma Properties
Characteristic: Thickness
Analysis: Reflectometry
Characteristic: Uniformity
Analysis: Reflectometry
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy
Characteristic: Resistivity, Sheet Resistance
Analysis: -
Substrates
| Silicon |
Notes
| 1328 |