Publication Information

Title:
Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
Type:
Conference Proceedings
Info:
ECS Transactions, 3 (15) 79-86 (2007)
Date:
2007-03-01

Author Information

Name Institution
Chris HodsonOxford Instruments
Nick SinghOxford Instruments
S. B. S. HeilEindhoven University of Technology
J. L. van HemmenEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films



Plasma TiN


Film/Plasma Properties

Characteristic: Thickness
Analysis: Reflectometry

Characteristic: Uniformity
Analysis: Reflectometry

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy

Characteristic: Resistivity, Sheet Resistance
Analysis: -

Substrates

Silicon

Keywords

Plasma vs Thermal Comparison

Notes

1328