H2O, Water, CAS# 7732-18-5

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
2Encapsulation method for atom probe tomography analysis of nanoparticles
3Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
4A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
5A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
6A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
7A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
8A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
9AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
10AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
11AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
12AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
13AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
14AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
15Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
16Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
17Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
18Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
19Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
20Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
21Atomic layer deposition of metal-oxide thin films on cellulose fibers
22Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
23Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
24AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
25Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
26Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
27Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
28Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
29Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
30Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
31Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
32Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment
33Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
34Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
35Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
36Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
37Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
38Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
39Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
40Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
41Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
42Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
43Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
44Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
45Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
46Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
47Experimental verification of electro-refractive phase modulation in graphene
48Fast Flexible Plastic Substrate ZnO Circuits
49Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
50Fiber-matrix interface reinforcement using Atomic Layer Deposition
51Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
52Gate Insulator for High Mobility Oxide TFT
53Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
54Hafnia and alumina on sulphur passivated germanium
55High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
56High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
57Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
58Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
59Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
60Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
61Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
62Improved understanding of recombination at the Si/Al2O3 interface
63Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
64In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
65In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
66Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
67Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
68Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
69Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
70Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
71Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
72Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
73Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
74Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
75Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
76Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
77Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
78Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
79Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
80Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
81Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
82Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
83MANOS performance dependence on ALD Al2O3 oxidation source
84Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
85Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
86Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
87Nitride passivation of the interface between high-k dielectrics and SiGe
88Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
89Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
90On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
91Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
92Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
93Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
94Passivation effects of atomic-layer-deposited aluminum oxide
95Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
96Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
97Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
98Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
99Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
100Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
101Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
102Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
103Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
104Protective capping and surface passivation of III-V nanowires by atomic layer deposition
105RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
106Single-Cell Photonic Nanocavity Probes
107Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
108Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
109Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
110Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
111Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
112Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
113Symmetrical Al2O3-based passivation layers for p- and n-type silicon
114Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
115Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
116Toward Understanding Positive Bias Temperature Instability in Fully Recessed-Gate GaN MISFETs
117Trapped charge densities in Al2O3-based silicon surface passivation layers
118Tribological properties of thin films made by atomic layer deposition sliding against silicon
119Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
120Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
121Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
122Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
123Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
124Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
125Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
126Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
127Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
128Atomic Layer Deposition of Gold Metal
129Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
130Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
131Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
132Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
133Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
134Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
135The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
136Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
137Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
138Plasma enhanced atomic layer deposition of Ga2O3 thin films
139Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
140RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
141Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
142A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
143A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
144An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
145Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
146Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
147Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
148Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
149Breakdown and Protection of ALD Moisture Barrier Thin Films
150Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
151Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
152Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
153Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
154Hafnia and alumina on sulphur passivated germanium
155High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
156High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
157In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
158Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
159Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
160Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
161Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
162Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
163Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
164Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
165Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
166Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
167On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
168Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
169Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
170Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
171Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
172Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
173Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
174Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
175Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
176Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
177Symmetrical Al2O3-based passivation layers for p- and n-type silicon
178Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
179The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
180Trapped charge densities in Al2O3-based silicon surface passivation layers
181Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
182Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
183Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
184Enhanced electrical and reliability characteristics in HfON gated Ge p-MOSFETs with H2 and NH3 plasma treated interfacial layers
185Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
186Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
187Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
188Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
189Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
190Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
191Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
192Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
193Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
194Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
195Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
196Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
197Atomic Layer Deposition of the Solid Electrolyte LiPON
198Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
199Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
200Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
201Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
202Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
203P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
204Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
205Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
206Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
207Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
208Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
209Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
210Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
211Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
212Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
213Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
214Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
215Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
216Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
217Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
218Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
219Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
220Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
221Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
222Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
223In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
224Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
225Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
226Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
227Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
228Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
229Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
230A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
231Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
232Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
233Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
234Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
235Breakdown and Protection of ALD Moisture Barrier Thin Films
236Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
237Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
238Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
239Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
240Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
241Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
242Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
243Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
244Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
245In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
246In-gap states in titanium dioxide and oxynitride atomic layer deposited films
247Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
248Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
249Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
250Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
251Low temperature temporal and spatial atomic layer deposition of TiO2 films
252Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
253Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
254Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
255Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
256Protective capping and surface passivation of III-V nanowires by atomic layer deposition
257Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
258Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
259Room temperature atomic layer deposition of TiO2 on gold nanoparticles
260Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
261Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
262Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
263Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
264Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
265Tribological properties of thin films made by atomic layer deposition sliding against silicon
266Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
267X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
268Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
269Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
270Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
271Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
272Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
273Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
274Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
275Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
276Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
277Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
278Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
279Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
280Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
281Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
282Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
283Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
284Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
285Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
286Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
287Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
288Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
289Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
290Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
291New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
292P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
293Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
294Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
295Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
296Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
297The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
298The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
299Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
300P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
301Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
302P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
303Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
304Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
305Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
306Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
307RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
308Single-Cell Photonic Nanocavity Probes
309Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
310Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics