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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 349 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
2Single-Cell Photonic Nanocavity Probes
3Protective capping and surface passivation of III-V nanowires by atomic layer deposition
4A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
5Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
6Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
7Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
8Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
9An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
10Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
11Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
12Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
13Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
14Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
15Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
16Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
17Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
18A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
19Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
20Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
21High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
22Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
23Trapped charge densities in Al2O3-based silicon surface passivation layers
24RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
25Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
26Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
27Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
28Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
29Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
30Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
31AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
32Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
33Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
34Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
35Plasma enhanced atomic layer deposition of Ga2O3 thin films
36Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
37Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
38Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
39X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
40Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
41High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
42Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
43The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
44Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
45Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
46On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
47Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
48Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
49Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
50Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
51Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
52Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
53Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
54Fiber-matrix interface reinforcement using Atomic Layer Deposition
55Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
56Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
57Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
58Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
59Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
60Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
61A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
62Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
63Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
64Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
65Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
66Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
67Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
68Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
69Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
70Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
71Tribological properties of thin films made by atomic layer deposition sliding against silicon
72Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
73Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
74Atomic Layer Deposition of the Solid Electrolyte LiPON
75Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
76In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
77Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
78Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
79Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
80Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
81Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
82Fast Flexible Plastic Substrate ZnO Circuits
83RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
84Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
85Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
86Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
87Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
88Symmetrical Al2O3-based passivation layers for p- and n-type silicon
89Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
90In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
91Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
92Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
93Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
94Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
95Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
96Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
97Toward Understanding Positive Bias Temperature Instability in Fully Recessed-Gate GaN MISFETs
98Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
99Hafnia and alumina on sulphur passivated germanium
100Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
101Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
102Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
103Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
104Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
105Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
106AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
107Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
108Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
109Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
110Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
111Enhanced electrical and reliability characteristics in HfON gated Ge p-MOSFETs with H2 and NH3 plasma treated interfacial layers
112Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
113Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
114Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
115Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
116Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
117Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
118Low temperature temporal and spatial atomic layer deposition of TiO2 films
119Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
120Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
121Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
122Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
123Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
124Tribological properties of thin films made by atomic layer deposition sliding against silicon
125Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
126A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
127Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
128Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
129Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
130Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
131Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
132Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
133Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
134Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
135Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
136Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
137Breakdown and Protection of ALD Moisture Barrier Thin Films
138Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
139Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
140Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
141Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
142Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
143Hafnia and alumina on sulphur passivated germanium
144Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
145In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
146Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
147Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
148Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
149Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
150Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
151Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
152Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
153Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices
154Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
155Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
156Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
157Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
158Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
159Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
160Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
161A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
162Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
163Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
164In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
165Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
166Symmetrical Al2O3-based passivation layers for p- and n-type silicon
167Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
168A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
169In-gap states in titanium dioxide and oxynitride atomic layer deposited films
170Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
171Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
172Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
173Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
174AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
175Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
176Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
177Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
178Protective capping and surface passivation of III-V nanowires by atomic layer deposition
179Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
180A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
181Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
182Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
183Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
184In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
185Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
186AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
187A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
188Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
189Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
190Experimental verification of electro-refractive phase modulation in graphene
191Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
192Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
193Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
194Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
195Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
196Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
197Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
198Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
199Single-Cell Photonic Nanocavity Probes
200Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
201Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
202MANOS performance dependence on ALD Al2O3 oxidation source
203Atomic Layer Deposition of Gold Metal
204Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
205Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
206Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
207Room temperature atomic layer deposition of TiO2 on gold nanoparticles
208Gate Insulator for High Mobility Oxide TFT
209Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
210Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
211Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
212Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
213On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
214Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
215Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
216Trapped charge densities in Al2O3-based silicon surface passivation layers
217Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
218Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
219Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
220Nitride passivation of the interface between high-k dielectrics and SiGe
221Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
222AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
223Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
224Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
225Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
226Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
227Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
228Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
229Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
230Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
231Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
232Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
233P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
234Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
235Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
236Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
237Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
238Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
239Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
240Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
241Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
242Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
243Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
244In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
245Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
246P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
247Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
248The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
249Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
250Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
251Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
252Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
253New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
254Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
255Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
256Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
257Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
258Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
259Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
260Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
261Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
262Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
263Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
264Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
265Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
266Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
267Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
268Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
269Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
270Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
271Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
272Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
273Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
274Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
275The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
276Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
277Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
278Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
279Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
280The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
281Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
282Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
283Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
284The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
285In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
286Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
287Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
288Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
289Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
290Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
291Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
292Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
293Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
294Encapsulation method for atom probe tomography analysis of nanoparticles
295The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
296Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
297Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
298Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
299Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
300Improved understanding of recombination at the Si/Al2O3 interface
301Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
302Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
303Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
304Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
305Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
306Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
307Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
308Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
309Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
310Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
311P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
312Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
313Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
314Breakdown and Protection of ALD Moisture Barrier Thin Films
315The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
316Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
317Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
318Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
319Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
320Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
321P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
322Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
323Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
324Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
325Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
326Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
327Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment
328Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
329AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
330RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
331Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
332Passivation effects of atomic-layer-deposited aluminum oxide
333High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
334Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
335Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
336High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
337AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
338Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
339Atomic layer deposition of metal-oxide thin films on cellulose fibers
340Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
341Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
342Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
343Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
344Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
345Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
346Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
347Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition