H2O, Water, CAS# 7732-18-5

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
2Trapped charge densities in Al2O3-based silicon surface passivation layers
3Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
4Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
5Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
6Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
7Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
8In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
9P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
10Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
11The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
12Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
13In-gap states in titanium dioxide and oxynitride atomic layer deposited films
14Protective capping and surface passivation of III-V nanowires by atomic layer deposition
15Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
16Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
17Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
18RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
19Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
20Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
21Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
22Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
23High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
24Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
25Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
26Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
27Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
28Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
29Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
30Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
31Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
32Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
33Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
34Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
35Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
36Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
37Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
38Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
39Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
40Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
41Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
42Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
43Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
44Enhanced electrical and reliability characteristics in HfON gated Ge p-MOSFETs with H2 and NH3 plasma treated interfacial layers
45Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
46Toward Understanding Positive Bias Temperature Instability in Fully Recessed-Gate GaN MISFETs
47Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
48Breakdown and Protection of ALD Moisture Barrier Thin Films
49AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
50Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
51Symmetrical Al2O3-based passivation layers for p- and n-type silicon
52Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
53Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
54Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
55Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
56A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
57Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
58Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
59On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
60Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
61Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
62Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
63Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
64P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
65Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
66Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
67Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
68Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
69Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
70Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
71An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
72Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
73Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
74Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
75Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
76Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
77Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
78Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
79Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
80Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
81Experimental verification of electro-refractive phase modulation in graphene
82The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
83Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
84Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
85A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
86Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
87Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
88Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
89Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
90Hafnia and alumina on sulphur passivated germanium
91A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
92Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
93Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
94Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
95RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
96Room temperature atomic layer deposition of TiO2 on gold nanoparticles
97Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
98Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
99Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
100Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
101Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
102Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
103Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
104Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
105Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
106Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
107Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
108Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
109Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
110Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
111Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
112In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
113Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
114Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
115Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
116Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
117AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
118In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
119Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
120Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
121In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
122Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
123Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment
124Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
125Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
126Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
127Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
128Gate Insulator for High Mobility Oxide TFT
129Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
130Atomic Layer Deposition of Gold Metal
131Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
132Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
133Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
134Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
135Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
136Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
137Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
138Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
139Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
140Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
141Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
142New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
143Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
144Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
145Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
146Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
147Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
148Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
149Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
150Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
151Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
152Improved understanding of recombination at the Si/Al2O3 interface
153Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
154Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
155Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
156The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
157P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
158Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
159A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
160In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
161Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
162Fast Flexible Plastic Substrate ZnO Circuits
163Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
164Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
165Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
166Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
167Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
168Atomic layer deposition of metal-oxide thin films on cellulose fibers
169Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
170MANOS performance dependence on ALD Al2O3 oxidation source
171Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
172Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
173Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
174Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
175Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
176The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
177Atomic Layer Deposition of the Solid Electrolyte LiPON
178Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
179Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
180Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
181Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
182Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
183Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
184The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
185Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
186AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
187Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
188Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
189Plasma enhanced atomic layer deposition of Ga2O3 thin films
190Single-Cell Photonic Nanocavity Probes
191Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
192Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
193Single-Cell Photonic Nanocavity Probes
194Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
195Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
196Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
197Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
198Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
199Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
200Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
201A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
202Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
203Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
204Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
205Tribological properties of thin films made by atomic layer deposition sliding against silicon
206Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
207Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
208Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
209In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
210Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
211Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
212AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
213Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
214High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
215Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
216Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
217Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
218Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
219Encapsulation method for atom probe tomography analysis of nanoparticles
220High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
221Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
222Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
223Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
224Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
225Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
226Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
227Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
228Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
229Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
230Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
231Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
232Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
233Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
234Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
235X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
236Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
237Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
238Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
239Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
240Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
241P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
242The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
243Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
244Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
245Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
246Low temperature temporal and spatial atomic layer deposition of TiO2 films
247A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
248Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
249Trapped charge densities in Al2O3-based silicon surface passivation layers
250Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
251Breakdown and Protection of ALD Moisture Barrier Thin Films
252Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
253Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
254Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
255Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
256The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
257Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
258AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
259Tribological properties of thin films made by atomic layer deposition sliding against silicon
260Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
261Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
262Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
263Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
264Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
265Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
266Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
267Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
268Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
269Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
270Passivation effects of atomic-layer-deposited aluminum oxide
271Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
272Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
273Protective capping and surface passivation of III-V nanowires by atomic layer deposition
274Nitride passivation of the interface between high-k dielectrics and SiGe
275Symmetrical Al2O3-based passivation layers for p- and n-type silicon
276Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
277Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
278Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
279Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
280Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
281Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
282Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
283In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
284Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
285Hafnia and alumina on sulphur passivated germanium
286Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
287Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
288Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
289Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
290Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
291A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
292Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
293Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
294Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
295Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
296Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
297Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
298Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
299Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
300Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
301On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
302Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
303Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
304Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
305Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
306AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
307Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
308Fiber-matrix interface reinforcement using Atomic Layer Deposition
309Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
310AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
311Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
312Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
313Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
314Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
315Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
316Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
317Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
318Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
319Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
320Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
321Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
322Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
323A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
324Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
325Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
326Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
327Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
328Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
329Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
330Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
331Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
332Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
333Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
334Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
335High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
336Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
337RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
338Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
339Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
340Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
341Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
342Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets