H2O, Water, CAS# 7732-18-5

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
2Encapsulation method for atom probe tomography analysis of nanoparticles
3Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
4A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
5A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
6A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
7A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
8A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
9AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
10AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
11AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
12AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
13AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
14AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
15Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
16Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
17Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
18Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
19Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
20Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
21Atomic layer deposition of metal-oxide thin films on cellulose fibers
22Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
23Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
24Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
25AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
26Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
27Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
28Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
29Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
30Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
31Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
32Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
33Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment
34Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
35Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
36Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
37Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
38Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
39Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
40Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
41Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
42Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
43Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
44Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
45Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
46Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
47Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
48Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
49Experimental verification of electro-refractive phase modulation in graphene
50Fast Flexible Plastic Substrate ZnO Circuits
51Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
52Fiber-matrix interface reinforcement using Atomic Layer Deposition
53Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
54Gate Insulator for High Mobility Oxide TFT
55Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
56Hafnia and alumina on sulphur passivated germanium
57High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
58High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
59Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
60Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
61Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
62Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
63Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
64Improved understanding of recombination at the Si/Al2O3 interface
65Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
66In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
67In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
68In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
69Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
70Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
71Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
72Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
73Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
74Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
75Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
76Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
77Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
78Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
79Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
80Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
81Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
82Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
83Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
84Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
85Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
86MANOS performance dependence on ALD Al2O3 oxidation source
87Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
88Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
89Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
90Nitride passivation of the interface between high-k dielectrics and SiGe
91Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
92Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
93On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
94Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
95Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
96Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
97Passivation effects of atomic-layer-deposited aluminum oxide
98Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
99Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
100Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
101Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
102Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
103Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
104Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
105Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
106Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
107Protective capping and surface passivation of III-V nanowires by atomic layer deposition
108RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
109Single-Cell Photonic Nanocavity Probes
110Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
111Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
112Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
113Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
114Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
115Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
116Symmetrical Al2O3-based passivation layers for p- and n-type silicon
117Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
118Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
119Toward Understanding Positive Bias Temperature Instability in Fully Recessed-Gate GaN MISFETs
120Trapped charge densities in Al2O3-based silicon surface passivation layers
121Tribological properties of thin films made by atomic layer deposition sliding against silicon
122Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
123Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
124Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
125Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
126Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
127Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
128Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
129Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
130Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
131Atomic Layer Deposition of Gold Metal
132Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
133Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
134Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
135Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
136Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
137Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
138Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
139The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
140Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
141Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
142Plasma enhanced atomic layer deposition of Ga2O3 thin films
143Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
144RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
145Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
146A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
147A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
148An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
149Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
150Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
151Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
152Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
153Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
154Breakdown and Protection of ALD Moisture Barrier Thin Films
155Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
156Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
157Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
158Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
159Hafnia and alumina on sulphur passivated germanium
160High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
161High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
162In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
163Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
164Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
165Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
166Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
167Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
168Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
169Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
170Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
171Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
172On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
173Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
174Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
175Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
176Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
177Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
178Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
179Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
180Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
181Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
182Symmetrical Al2O3-based passivation layers for p- and n-type silicon
183Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
184The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
185Trapped charge densities in Al2O3-based silicon surface passivation layers
186Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
187Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
188Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
189Enhanced electrical and reliability characteristics in HfON gated Ge p-MOSFETs with H2 and NH3 plasma treated interfacial layers
190Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
191Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
192Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
193Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
194Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
195Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
196Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
197Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
198Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
199Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
200Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
201Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
202Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
203Atomic Layer Deposition of the Solid Electrolyte LiPON
204Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
205Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
206Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
207Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
208Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
209P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
210Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
211Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
212Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
213Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
214Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
215Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
216Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
217Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
218Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
219Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
220Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
221Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
222Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
223Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
224Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
225Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
226Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
227Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
228Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
229Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
230Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
231Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
232Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
233Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
234In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
235Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
236Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
237Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
238Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
239Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
240Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
241A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
242Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
243Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
244Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
245Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
246Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
247Breakdown and Protection of ALD Moisture Barrier Thin Films
248Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
249Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
250Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
251Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
252Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
253Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
254Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
255Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
256Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
257In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
258In-gap states in titanium dioxide and oxynitride atomic layer deposited films
259Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
260Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
261Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
262Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
263Low temperature temporal and spatial atomic layer deposition of TiO2 films
264Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
265Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
266Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
267Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
268Protective capping and surface passivation of III-V nanowires by atomic layer deposition
269Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
270Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
271Room temperature atomic layer deposition of TiO2 on gold nanoparticles
272Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
273Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
274Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
275Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
276Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
277Tribological properties of thin films made by atomic layer deposition sliding against silicon
278Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
279X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
280Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
281Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
282Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
283Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
284Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
285Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
286Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
287Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
288Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
289Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
290Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
291Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
292Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
293Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
294Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
295Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
296Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
297Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
298Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
299Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
300Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
301Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
302Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
303New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
304P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
305Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
306Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
307Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
308Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
309The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
310The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
311Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
312P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
313Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
314P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
315Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
316Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
317Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
318Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
319RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
320Single-Cell Photonic Nanocavity Probes
321Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
322Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics