H2O, Water, CAS# 7732-18-5

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 258 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
2Encapsulation method for atom probe tomography analysis of nanoparticles
3Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
4A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
5A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
6A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
7A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
8AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
9AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
10AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
11AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
12AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
13AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
14Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
15Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
16Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
17Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
18Atomic layer deposition of metal-oxide thin films on cellulose fibers
19Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
20AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
21Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
22Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
23Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
24Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
25Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
26Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
27Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment
28Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
29Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
30Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
31Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
32Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
33Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
34Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
35Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
36Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
37Electronic and optical device applications of hollow cathode plasma assisted atomic layer deposition based GaN thin films
38Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
39Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
40Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
41Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
42Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
43Experimental verification of electro-refractive phase modulation in graphene
44Fast Flexible Plastic Substrate ZnO Circuits
45Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
46Gate Insulator for High Mobility Oxide TFT
47Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
48Hafnia and alumina on sulphur passivated germanium
49High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
50Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
51Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
52Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
53Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
54Improved understanding of recombination at the Si/Al2O3 interface
55Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
56In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
57In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
58Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
59Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
60Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
61Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
62Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
63Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
64Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
65Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
66Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
67Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
68Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
69Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
70Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
71Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
72Low temperature thin film transistors with hollow cathode plasma-assisted atomic layer deposition based GaN channels
73Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
74MANOS performance dependence on ALD Al2O3 oxidation source
75Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
76Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
77Nitride passivation of the interface between high-k dielectrics and SiGe
78Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
79Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
80On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
81Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
82Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
83Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
84Passivation effects of atomic-layer-deposited aluminum oxide
85Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
86Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
87Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
88Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
89Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
90Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
91Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
92Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
93Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
94RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
95Single-Cell Photonic Nanocavity Probes
96Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
97Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
98Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
99Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
100Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
101Symmetrical Al2O3-based passivation layers for p- and n-type silicon
102Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
103Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
104Toward Understanding Positive Bias Temperature Instability in Fully Recessed-Gate GaN MISFETs
105Trapped charge densities in Al2O3-based silicon surface passivation layers
106Tribological properties of thin films made by atomic layer deposition sliding against silicon
107Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
108Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
109Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
110Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
111Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
112Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
113Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
114Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
115Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
116Atomic Layer Deposition of Gold Metal
117Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
118Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
119Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
120Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
121The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
122Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
123Plasma enhanced atomic layer deposition of Ga2O3 thin films
124Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
125RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
126Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
127A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
128A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
129An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
130Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
131Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
132Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
133Breakdown and Protection of ALD Moisture Barrier Thin Films
134Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
135Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
136Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
137Hafnia and alumina on sulphur passivated germanium
138High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
139High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
140Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
141Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
142Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
143Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
144Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
145Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
146On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
147Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
148Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
149Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
150Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
151Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
152Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
153Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
154Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
155Symmetrical Al2O3-based passivation layers for p- and n-type silicon
156Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
157The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
158Trapped charge densities in Al2O3-based silicon surface passivation layers
159Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
160Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
161Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
162Enhanced electrical and reliability characteristics in HfON gated Ge p-MOSFETs with H2 and NH3 plasma treated interfacial layers
163Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
164Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
165Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
166Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
167Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
168Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
169Atomic Layer Deposition of the Solid Electrolyte LiPON
170Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
171Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
172Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
173Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
174Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
175Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
176Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
177Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
178Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
179Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
180Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
181Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
182Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
183Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
184Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
185Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
186Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
187Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
188In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
189Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
190Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
191Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
192Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
193Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
194A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
195Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
196Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
197Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
198Breakdown and Protection of ALD Moisture Barrier Thin Films
199Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
200Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
201Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
202Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
203Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
204Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
205Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
206In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
207In-gap states in titanium dioxide and oxynitride atomic layer deposited films
208Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
209Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
210Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
211Low temperature temporal and spatial atomic layer deposition of TiO2 films
212Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
213Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
214Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
215Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
216Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
217Room temperature atomic layer deposition of TiO2 on gold nanoparticles
218Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
219Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
220Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
221Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
222Tribological properties of thin films made by atomic layer deposition sliding against silicon
223Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
224X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
225Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
226Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
227Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
228Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
229Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
230Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
231Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
232Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
233Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
234Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
235Characteristics of ZnO Thin Films by Means of Plasma Enhanced Atomic Layer Deposition
236Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
237Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
238Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
239Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
240Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
241Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
242New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
243Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
244Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
245Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
246Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
247The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
248The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
249Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
250Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
251Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
252Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
253Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
254Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
255RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
256Single-Cell Photonic Nanocavity Probes
257Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
258Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics


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