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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 354 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
2AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
3Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
4Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
5Room temperature atomic layer deposition of TiO2 on gold nanoparticles
6P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
7Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
8Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
9Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
10Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
11A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
12Plasma enhanced atomic layer deposition of Ga2O3 thin films
13Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
14Gate Insulator for High Mobility Oxide TFT
15Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
16Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment
17Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
18Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
19Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
20Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
21Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
22Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
23An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
24Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
25Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
26P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
27The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
28Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
29Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
30Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
31Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
32Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
33Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
34Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
35Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
36Atomic layer deposition of metal-oxide thin films on cellulose fibers
37Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
38Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
39Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
40Fiber-matrix interface reinforcement using Atomic Layer Deposition
41Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
42Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
43Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
44Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
45Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
46Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
47Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
48Protective capping and surface passivation of III-V nanowires by atomic layer deposition
49Improved understanding of recombination at the Si/Al2O3 interface
50Atomic Layer Deposition of the Solid Electrolyte LiPON
51Nitride passivation of the interface between high-k dielectrics and SiGe
52Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
53Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
54Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
55Hafnia and alumina on sulphur passivated germanium
56Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
57Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
58In-gap states in titanium dioxide and oxynitride atomic layer deposited films
59High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
60Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
61A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
62Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
63Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
64Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
65Trapped charge densities in Al2O3-based silicon surface passivation layers
66The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
67Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells
68Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
69Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
70Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
71Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
72A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
73Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
74Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
75Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
76Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
77Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
78Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
79Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
80Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
81Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
82Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
83Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
84Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
85Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
86Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
87The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
88Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
89Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
90Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
91Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
92Hafnia and alumina on sulphur passivated germanium
93Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
94Breakdown and Protection of ALD Moisture Barrier Thin Films
95Protective capping and surface passivation of III-V nanowires by atomic layer deposition
96Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
97Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
98Tribological properties of thin films made by atomic layer deposition sliding against silicon
99X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
100Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
101Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
102Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
103Low temperature temporal and spatial atomic layer deposition of TiO2 films
104Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
105Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
106Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
107Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
108Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
109Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
110Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
111AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
112Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
113Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
114Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
115A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
116In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
117AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
118Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
119Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
120A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
121Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
122Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
123Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
124Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
125Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
126Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
127Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
128Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
129Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
130Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
131Passivation effects of atomic-layer-deposited aluminum oxide
132Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
133Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
134Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
135Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
136Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
137Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
138Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
139Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
140Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
141Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
142Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
143Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
144Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
145Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
146On the Trail Ancient Worlds: Comparative Study of Commercial Scandium and Yttrium Precursors, Asgard, Midgard, Vanaheim and Olympus
147Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
148Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
149MANOS performance dependence on ALD Al2O3 oxidation source
150Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
151Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
152Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
153Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
154Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
155Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
156Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
157Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
158Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
159RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
160A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
161Thermal stability of antiferroelectric-like Al:HfO2 thin films with TiN or Pt electrodes
162Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
163Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
164Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
165Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
166Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
167Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
168A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
169ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
170Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
171Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
172Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
173Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
174Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
175Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
176Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
177Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
178Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
179Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
180In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
181Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
182Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
183In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
184Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices
185Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
186Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
187Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
188High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
189New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
190Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
191Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
192Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
193Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
194Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
195Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
196Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
197Encapsulation method for atom probe tomography analysis of nanoparticles
198Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
199Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
200Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
201Enhanced electrical and reliability characteristics in HfON gated Ge p-MOSFETs with H2 and NH3 plasma treated interfacial layers
202Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
203Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
204Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
205Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
206Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
207Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
208Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
209AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
210Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
211P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
212Experimental verification of electro-refractive phase modulation in graphene
213Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
214The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
215Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
216The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
217Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
218Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
219Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
220Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
221Symmetrical Al2O3-based passivation layers for p- and n-type silicon
222Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
223Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
224Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
225Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
226Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
227Trapped charge densities in Al2O3-based silicon surface passivation layers
228Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
229Fast Flexible Plastic Substrate ZnO Circuits
230Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
231Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
232Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
233Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
234Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
235Symmetrical Al2O3-based passivation layers for p- and n-type silicon
236Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
237Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
238Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
239High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
240AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
241Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
242Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
243Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
244Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
245Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
246AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
247Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
248Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
249Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
250Toward Understanding Positive Bias Temperature Instability in Fully Recessed-Gate GaN MISFETs
251In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
252Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
253Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
254Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
255Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
256RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
257Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
258Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
259Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
260AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
261Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
262In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
263Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
264Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
265Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
266Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
267Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
268Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
269Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
270Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
271Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
272Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
273Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
274Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
275Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
276Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
277Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
278Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
279Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
280Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
281Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
282Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
283Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
284Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
285Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
286Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
287P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
288Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
289Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
290Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
291Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
292Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
293Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
294Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
295Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
296Breakdown and Protection of ALD Moisture Barrier Thin Films
297Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
298Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
299Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
300Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
301Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
302Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
303Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
304Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
305Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
306Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
307Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
308Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
309Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
310Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
311Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
312In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
313Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
314Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
315Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
316Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
317Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
318Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
319Atomic Layer Deposition of Gold Metal
320Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
321Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
322High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
323Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
324In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
325Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
326Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
327On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
328On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
329Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
330Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
331Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
332Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
333Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
334Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
335Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
336Single-Cell Photonic Nanocavity Probes
337Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
338A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
339The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
340Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
341Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
342Tribological properties of thin films made by atomic layer deposition sliding against silicon
343Single-Cell Photonic Nanocavity Probes
344Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
345Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
346RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
347Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
348The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
349Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
350Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
351Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
352Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition