H₂O, Water, CAS# 7732-18-5

Plasma Enhanced Atomic Layer Deposition Film Publications

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Number	Title
1	Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
2	Encapsulation method for atom probe tomography analysis of nanoparticles
3	Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
4	A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
5	A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
6	A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
7	A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
8	AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
9	AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
10	AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
11	AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
12	AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
13	AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
14	Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
15	Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
16	Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
17	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
18	Atomic layer deposition of metal-oxide thin films on cellulose fibers
19	Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
20	Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
21	AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
22	Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
23	Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
24	Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
25	Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
26	Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
27	Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
28	Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
29	Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment
30	Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
31	Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
32	Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
33	Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
34	Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
35	Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
36	Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
37	Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
38	Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
39	Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
40	Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
41	Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
42	Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
43	Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
44	Experimental verification of electro-refractive phase modulation in graphene
45	Fast Flexible Plastic Substrate ZnO Circuits
46	Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
47	Fiber-matrix interface reinforcement using Atomic Layer Deposition
48	Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
49	Gate Insulator for High Mobility Oxide TFT
50	Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
51	Hafnia and alumina on sulphur passivated germanium
52	High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
53	High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
54	Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
55	Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
56	Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
57	Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
58	Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
59	Improved understanding of recombination at the Si/Al2O3 interface
60	Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
61	In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
62	In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
63	Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
64	Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
65	Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
66	Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
67	Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
68	Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
69	Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
70	Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
71	Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
72	Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
73	Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
74	Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
75	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
76	Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
77	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
78	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
79	MANOS performance dependence on ALD Al2O3 oxidation source
80	Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
81	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
82	Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
83	Nitride passivation of the interface between high-k dielectrics and SiGe
84	Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
85	Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
86	On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
87	Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
88	Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
89	Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
90	Passivation effects of atomic-layer-deposited aluminum oxide
91	Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
92	Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
93	Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
94	Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
95	Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
96	Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
97	Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
98	Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
99	Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
100	Protective capping and surface passivation of III-V nanowires by atomic layer deposition
101	RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
102	Single-Cell Photonic Nanocavity Probes
103	Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
104	Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
105	Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
106	Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
107	Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
108	Symmetrical Al2O3-based passivation layers for p- and n-type silicon
109	Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
110	Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
111	Toward Understanding Positive Bias Temperature Instability in Fully Recessed-Gate GaN MISFETs
112	Trapped charge densities in Al2O3-based silicon surface passivation layers
113	Tribological properties of thin films made by atomic layer deposition sliding against silicon
114	Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
115	Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
116	Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
117	Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
118	Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
119	Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
120	Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
121	Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
122	Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
123	Atomic Layer Deposition of Gold Metal
124	Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
125	Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
126	Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
127	Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
128	Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
129	The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
130	Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
131	Plasma enhanced atomic layer deposition of Ga2O3 thin films
132	Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
133	RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
134	Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
135	A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
136	A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
137	An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
138	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
139	Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
140	Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
141	Breakdown and Protection of ALD Moisture Barrier Thin Films
142	Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
143	Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
144	Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
145	Hafnia and alumina on sulphur passivated germanium
146	High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
147	High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
148	In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
149	Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
150	Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
151	Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
152	Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
153	Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
154	Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
155	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
156	Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
157	On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
158	Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
159	Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
160	Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
161	Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
162	Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
163	Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
164	Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
165	Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
166	Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
167	Symmetrical Al2O3-based passivation layers for p- and n-type silicon
168	Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
169	The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
170	Trapped charge densities in Al2O3-based silicon surface passivation layers
171	Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
172	Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
173	Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
174	Enhanced electrical and reliability characteristics in HfON gated Ge p-MOSFETs with H2 and NH3 plasma treated interfacial layers
175	Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
176	Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
177	Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
178	Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
179	Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
180	Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
181	Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
182	Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
183	Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
184	Atomic Layer Deposition of the Solid Electrolyte LiPON
185	Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
186	Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
187	Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
188	Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
189	Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
190	P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
191	Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
192	Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
193	Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
194	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
195	Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
196	Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
197	Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
198	Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
199	Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
200	Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
201	Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
202	Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
203	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
204	Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
205	Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
206	Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
207	Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
208	Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
209	In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
210	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
211	Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
212	Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
213	Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
214	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
215	Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
216	A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
217	Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
218	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
219	Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
220	Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
221	Breakdown and Protection of ALD Moisture Barrier Thin Films
222	Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
223	Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
224	Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
225	Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
226	Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
227	Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
228	Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
229	Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
230	In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
231	In-gap states in titanium dioxide and oxynitride atomic layer deposited films
232	Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
233	Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
234	Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
235	Low temperature temporal and spatial atomic layer deposition of TiO2 films
236	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
237	Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
238	Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
239	Protective capping and surface passivation of III-V nanowires by atomic layer deposition
240	Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
241	Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
242	Room temperature atomic layer deposition of TiO2 on gold nanoparticles
243	Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
244	Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
245	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
246	Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
247	Tribological properties of thin films made by atomic layer deposition sliding against silicon
248	Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
249	X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
250	Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
251	Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
252	Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
253	Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
254	Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
255	Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
256	Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
257	Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
258	Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
259	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
260	Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
261	Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
262	Characteristics of ZnO Thin Films by Means of Plasma Enhanced Atomic Layer Deposition
263	Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
264	Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
265	Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
266	Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
267	Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
268	Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
269	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
270	Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
271	New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
272	P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
273	Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
274	Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
275	Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
276	Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
277	The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
278	The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
279	Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
280	P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
281	Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
282	P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
283	Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
284	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
285	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
286	Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
287	RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
288	Single-Cell Photonic Nanocavity Probes
289	Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
290	Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics

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