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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 354 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
2Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
3Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
4Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
5Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
6Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
7Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
8Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
9Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
10An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
11Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
12Atomic layer deposition of metal-oxide thin films on cellulose fibers
13Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
14Breakdown and Protection of ALD Moisture Barrier Thin Films
15Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
16Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices
17Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
18Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
19Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
20In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
21Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
22Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
23Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
24Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
25Nitride passivation of the interface between high-k dielectrics and SiGe
26Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
27Trapped charge densities in Al2O3-based silicon surface passivation layers
28ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
29AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
30Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
31Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
32Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
33Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
34Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
35AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
36Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
37Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
38A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
39In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
40Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
41Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
42Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
43Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
44Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
45In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
46Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
47Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
48Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
49Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
50Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
51Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
52Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
53The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
54Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
55AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
56Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
57A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
58AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
59Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
60Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
61Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
62Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
63Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
64A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
65Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
66Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
67Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
68Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
69High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
70Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
71Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
72Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
73Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
74Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
75Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
76Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells
77Symmetrical Al2O3-based passivation layers for p- and n-type silicon
78Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
79Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
80Single-Cell Photonic Nanocavity Probes
81MANOS performance dependence on ALD Al2O3 oxidation source
82Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
83Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
84Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
85Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
86Room temperature atomic layer deposition of TiO2 on gold nanoparticles
87Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
88Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
89Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
90Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
91Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
92Thermal stability of antiferroelectric-like Al:HfO2 thin films with TiN or Pt electrodes
93P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
94On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
95High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
96Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
97Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
98Protective capping and surface passivation of III-V nanowires by atomic layer deposition
99Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
100Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
101Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
102Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
103Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
104Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
105Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
106Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
107AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
108Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
109Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
110Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
111X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
112RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
113The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
114Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
115Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
116Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
117Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
118RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
119Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
120Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
121Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
122Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
123Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
124Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
125In-gap states in titanium dioxide and oxynitride atomic layer deposited films
126Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
127Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
128Low temperature temporal and spatial atomic layer deposition of TiO2 films
129Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
130P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
131Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
132Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
133Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
134In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
135Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
136Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
137Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
138Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
139Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
140New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
141Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
142Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
143Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
144Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
145Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
146Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
147Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
148Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
149P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
150Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
151The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
152Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
153Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
154Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
155Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
156Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
157Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
158Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
159Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
160Toward Understanding Positive Bias Temperature Instability in Fully Recessed-Gate GaN MISFETs
161Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
162Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
163Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
164Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
165Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
166Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
167Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
168Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
169Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
170Passivation effects of atomic-layer-deposited aluminum oxide
171Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
172Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
173Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
174High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
175Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
176Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
177Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
178Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
179Symmetrical Al2O3-based passivation layers for p- and n-type silicon
180Atomic Layer Deposition of the Solid Electrolyte LiPON
181Experimental verification of electro-refractive phase modulation in graphene
182Plasma enhanced atomic layer deposition of Ga2O3 thin films
183Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
184Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
185Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
186Fiber-matrix interface reinforcement using Atomic Layer Deposition
187Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
188Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
189The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
190Gate Insulator for High Mobility Oxide TFT
191Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
192Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
193Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
194A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
195Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
196Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
197Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
198Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
199Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
200Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
201Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
202Atomic Layer Deposition of Gold Metal
203Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
204Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
205Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
206Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
207Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
208Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
209Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
210Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
211Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
212P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
213Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
214Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
215Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
216Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
217Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
218Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
219Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
220Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
221Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
222Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
223Hafnia and alumina on sulphur passivated germanium
224Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
225Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
226Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
227Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
228Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
229On the Trail Ancient Worlds: Comparative Study of Commercial Scandium and Yttrium Precursors, Asgard, Midgard, Vanaheim and Olympus
230Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
231Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
232Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
233AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
234Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
235Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
236Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
237Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
238AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
239Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
240Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
241Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
242Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
243High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
244In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
245Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
246Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
247Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
248Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
249Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
250Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
251Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
252Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
253Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
254Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
255Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
256Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
257Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
258Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
259On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
260Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
261Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
262Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
263Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
264Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
265Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
266A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
267Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
268Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
269Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
270Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
271Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
272Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
273Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
274Hafnia and alumina on sulphur passivated germanium
275Improved understanding of recombination at the Si/Al2O3 interface
276The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
277Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
278Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
279In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
280Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
281The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
282Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
283Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
284Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
285Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
286Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
287Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
288Protective capping and surface passivation of III-V nanowires by atomic layer deposition
289Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
290Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
291Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
292Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
293Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
294Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
295Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
296Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
297Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
298Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
299Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
300Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
301Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
302Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
303Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
304Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
305Single-Cell Photonic Nanocavity Probes
306Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
307Trapped charge densities in Al2O3-based silicon surface passivation layers
308Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
309Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
310Breakdown and Protection of ALD Moisture Barrier Thin Films
311Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
312Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
313Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
314A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
315Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
316Tribological properties of thin films made by atomic layer deposition sliding against silicon
317Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
318Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
319Encapsulation method for atom probe tomography analysis of nanoparticles
320Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
321The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
322Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
323Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
324Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
325Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
326Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
327Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
328Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
329Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
330Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
331Fast Flexible Plastic Substrate ZnO Circuits
332Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
333A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
334RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
335Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
336Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
337Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment
338Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
339Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
340Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
341Tribological properties of thin films made by atomic layer deposition sliding against silicon
342Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
343A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
344Enhanced electrical and reliability characteristics in HfON gated Ge p-MOSFETs with H2 and NH3 plasma treated interfacial layers
345Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
346Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
347Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
348Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
349Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
350Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
351In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
352Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition