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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 350 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Symmetrical Al2O3-based passivation layers for p- and n-type silicon
2High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
3Tribological properties of thin films made by atomic layer deposition sliding against silicon
4Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
5Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
6Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
7Low temperature temporal and spatial atomic layer deposition of TiO2 films
8Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
9Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
10Fast Flexible Plastic Substrate ZnO Circuits
11Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
12Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
13Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
14Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
15Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
16Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
17Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
18Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
19Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
20Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices
21Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
22Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
23Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
24P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
25Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
26Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
27Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
28Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
29Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
30Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
31Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
32Improved understanding of recombination at the Si/Al2O3 interface
33Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
34The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
35Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
36Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
37Protective capping and surface passivation of III-V nanowires by atomic layer deposition
38A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
39Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
40Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
41In-gap states in titanium dioxide and oxynitride atomic layer deposited films
42Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
43Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
44Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
45Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
46Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
47Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
48Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
49Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
50P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
51Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
52Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
53Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
54Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
55Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
56Trapped charge densities in Al2O3-based silicon surface passivation layers
57Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
58Atomic layer deposition of metal-oxide thin films on cellulose fibers
59Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
60Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
61Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
62Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
63Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
64Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
65A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
66A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
67A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
68P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
69AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
70Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
71Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
72Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
73Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
74Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
75Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
76Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
77Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
78Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
79Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
80Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
81On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
82Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
83Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
84Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
85Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
86Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
87Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
88Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
89Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
90Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
91Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
92Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
93Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
94Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
95Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
96Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
97Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
98Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
99High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
100Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
101Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
102Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
103Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
104AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
105Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
106Atomic Layer Deposition of Gold Metal
107Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
108Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
109Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
110Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
111Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
112Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
113Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
114Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
115Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
116Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
117Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
118Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
119Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
120In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
121Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
122Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
123Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
124Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
125Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
126On the Trail Ancient Worlds: Comparative Study of Commercial Scandium and Yttrium Precursors, Asgard, Midgard, Vanaheim and Olympus
127Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
128Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
129Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
130Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
131Enhanced electrical and reliability characteristics in HfON gated Ge p-MOSFETs with H2 and NH3 plasma treated interfacial layers
132Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
133Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
134Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
135Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
136Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
137Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
138Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
139Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
140Fiber-matrix interface reinforcement using Atomic Layer Deposition
141Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
142Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
143In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
144Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
145Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
146Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
147Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
148Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
149Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
150Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment
151In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
152Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
153Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
154Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
155Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
156Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
157Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
158Trapped charge densities in Al2O3-based silicon surface passivation layers
159Symmetrical Al2O3-based passivation layers for p- and n-type silicon
160A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
161Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
162Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
163Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
164High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
165Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
166Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
167In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
168A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
169RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
170Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
171Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
172Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
173Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
174In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
175Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
176Gate Insulator for High Mobility Oxide TFT
177Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
178Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
179Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
180Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
181Single-Cell Photonic Nanocavity Probes
182The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
183Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
184P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
185Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
186Single-Cell Photonic Nanocavity Probes
187Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
188Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
189Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
190Experimental verification of electro-refractive phase modulation in graphene
191Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
192Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
193High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
194Protective capping and surface passivation of III-V nanowires by atomic layer deposition
195AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
196Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
197RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
198Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
199Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
200Room temperature atomic layer deposition of TiO2 on gold nanoparticles
201Tribological properties of thin films made by atomic layer deposition sliding against silicon
202Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
203Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
204Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
205Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
206Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
207Passivation effects of atomic-layer-deposited aluminum oxide
208The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
209Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
210Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
211Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
212Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
213Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
214Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
215Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
216Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
217The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
218AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
219Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
220Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
221On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
222Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
223An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
224Nitride passivation of the interface between high-k dielectrics and SiGe
225Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
226Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
227Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
228Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
229Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
230Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
231Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
232Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
233Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
234A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
235Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
236Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
237Encapsulation method for atom probe tomography analysis of nanoparticles
238Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
239New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
240Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
241AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
242The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
243Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
244Breakdown and Protection of ALD Moisture Barrier Thin Films
245Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
246Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
247Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
248Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
249Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
250Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
251Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
252Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
253Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
254Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
255Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
256Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
257Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
258Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
259Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
260Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
261Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
262RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
263Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
264Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
265Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
266Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
267The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
268Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
269Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
270Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
271Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
272Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
273Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
274Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
275Plasma enhanced atomic layer deposition of Ga2O3 thin films
276Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
277MANOS performance dependence on ALD Al2O3 oxidation source
278Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
279Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
280Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
281Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
282Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
283Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
284Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
285Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
286Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
287Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
288Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
289Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
290Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
291Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
292Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
293Toward Understanding Positive Bias Temperature Instability in Fully Recessed-Gate GaN MISFETs
294Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
295Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
296Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
297Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
298Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
299Atomic Layer Deposition of the Solid Electrolyte LiPON
300Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
301Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
302Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
303A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
304Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
305Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
306Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
307Hafnia and alumina on sulphur passivated germanium
308Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
309Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
310Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
311In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
312Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
313Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
314Breakdown and Protection of ALD Moisture Barrier Thin Films
315Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
316X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
317Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
318The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
319Hafnia and alumina on sulphur passivated germanium
320Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
321Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
322Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
323Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
324Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
325AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
326Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
327Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
328Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
329Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
330Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
331Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
332Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
333Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
334Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
335Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
336Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
337AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
338Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
339Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
340Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
341Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
342In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
343Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
344Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
345Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
346Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
347Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
348Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability