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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 354 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
2An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
3Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
4Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
5Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
6Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
7AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
8Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
9Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
10Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
11In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
12Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
13RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
14Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
15Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
16Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
17Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
18Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
19Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
20Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
21Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
22Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
23Toward Understanding Positive Bias Temperature Instability in Fully Recessed-Gate GaN MISFETs
24RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
25Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
26AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
27Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
28Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
29Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
30A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
31Symmetrical Al2O3-based passivation layers for p- and n-type silicon
32Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
33Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
34High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
35Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
36Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
37Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
38Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
39The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
40Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
41Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
42Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
43Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
44Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
45Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
46Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
47Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
48Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
49The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
50Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
51Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
52Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
53Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
54Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
55Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
56Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
57Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
58Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
59Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
60Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
61Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
62Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
63Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
64Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
65A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
66Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
67Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
68Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
69Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
70Atomic layer deposition of metal-oxide thin films on cellulose fibers
71Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
72Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
73Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
74Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
75AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
76Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
77Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
78Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
79Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
80Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
81Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
82Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
83Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
84Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
85Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
86Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
87Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
88A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
89Encapsulation method for atom probe tomography analysis of nanoparticles
90Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
91New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
92Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
93Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
94Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
95Trapped charge densities in Al2O3-based silicon surface passivation layers
96Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
97Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
98AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
99Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
100Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
101In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
102Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
103Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
104Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
105Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
106Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
107Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
108Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
109Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
110Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
111Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
112Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
113Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
114Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
115Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
116Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
117Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
118Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
119Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
120Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
121Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
122Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
123Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
124Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
125MANOS performance dependence on ALD Al2O3 oxidation source
126Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
127Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
128Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
129Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
130Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
131Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
132Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
133Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
134On the Trail Ancient Worlds: Comparative Study of Commercial Scandium and Yttrium Precursors, Asgard, Midgard, Vanaheim and Olympus
135Single-Cell Photonic Nanocavity Probes
136Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
137Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
138Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
139Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
140X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
141Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
142Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
143Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
144Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
145Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
146Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
147Hafnia and alumina on sulphur passivated germanium
148Hafnia and alumina on sulphur passivated germanium
149In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
150High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
151Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
152Atomic Layer Deposition of Gold Metal
153Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
154Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
155Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
156P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
157A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
158Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
159A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
160Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
161Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
162Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
163A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
164Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
165Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
166Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
167Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
168Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
169The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
170Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
171Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
172Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
173Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
174Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
175Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
176Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
177In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
178Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
179The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
180Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
181Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
182Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
183A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
184Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
185Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
186Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
187Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
188Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
189In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
190Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
191Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
192ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
193Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
194Thermal stability of antiferroelectric-like Al:HfO2 thin films with TiN or Pt electrodes
195Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
196Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
197Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
198Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
199High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
200AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
201Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
202The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
203Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
204Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
205Symmetrical Al2O3-based passivation layers for p- and n-type silicon
206Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
207Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
208Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
209Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
210Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
211Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
212Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
213The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
214Protective capping and surface passivation of III-V nanowires by atomic layer deposition
215Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
216Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
217Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
218Enhanced electrical and reliability characteristics in HfON gated Ge p-MOSFETs with H2 and NH3 plasma treated interfacial layers
219Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
220Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
221Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
222Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
223Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
224Trapped charge densities in Al2O3-based silicon surface passivation layers
225Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
226Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
227Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
228Low temperature temporal and spatial atomic layer deposition of TiO2 films
229In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
230Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
231RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
232Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
233Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
234Room temperature atomic layer deposition of TiO2 on gold nanoparticles
235Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
236Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
237Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
238In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
239Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
240Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
241A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
242Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
243Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
244Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
245Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
246Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
247Atomic Layer Deposition of the Solid Electrolyte LiPON
248Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
249Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
250Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
251Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
252Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
253Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
254Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
255Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
256The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
257Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
258In-gap states in titanium dioxide and oxynitride atomic layer deposited films
259Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
260Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
261Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
262Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
263Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
264Fiber-matrix interface reinforcement using Atomic Layer Deposition
265Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
266Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
267Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
268Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
269Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
270Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
271Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
272P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
273Protective capping and surface passivation of III-V nanowires by atomic layer deposition
274Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
275High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
276Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
277Experimental verification of electro-refractive phase modulation in graphene
278Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
279AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
280Nitride passivation of the interface between high-k dielectrics and SiGe
281On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
282Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
283Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
284Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells
285Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
286Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
287Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
288Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
289Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
290Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
291Fast Flexible Plastic Substrate ZnO Circuits
292Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
293Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices
294Single-Cell Photonic Nanocavity Probes
295Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
296Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
297Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
298Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
299Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
300Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
301Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
302Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
303Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
304Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
305Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
306Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
307Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment
308Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
309P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
310Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
311Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
312Breakdown and Protection of ALD Moisture Barrier Thin Films
313Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
314Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
315Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
316Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
317Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
318Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
319Tribological properties of thin films made by atomic layer deposition sliding against silicon
320Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
321Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
322On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
323Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
324Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
325Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
326AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
327Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
328Improved understanding of recombination at the Si/Al2O3 interface
329Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
330Passivation effects of atomic-layer-deposited aluminum oxide
331Plasma enhanced atomic layer deposition of Ga2O3 thin films
332Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
333Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
334Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
335Breakdown and Protection of ALD Moisture Barrier Thin Films
336Gate Insulator for High Mobility Oxide TFT
337Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
338Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
339Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
340Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
341Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
342Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
343Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
344Tribological properties of thin films made by atomic layer deposition sliding against silicon
345Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
346Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
347P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
348Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
349Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
350Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
351Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
352Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions