H2O, Water, CAS# 7732-18-5

Where to buy

NumberVendorRegionLink
1DOCK/CHEMICALS🇩🇪Water purified

www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.

If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.


Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 353 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
2RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
3Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
4Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
5Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
6Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
7Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
8New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
9Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
10P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
11Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
12Encapsulation method for atom probe tomography analysis of nanoparticles
13Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
14Tribological properties of thin films made by atomic layer deposition sliding against silicon
15Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
16Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
17Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
18Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
19Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
20Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
21Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
22Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
23Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
24Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
25Plasma enhanced atomic layer deposition of Ga2O3 thin films
26Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
27Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
28Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
29Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
30X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
31Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
32Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
33The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
34Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
35Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
36Fast Flexible Plastic Substrate ZnO Circuits
37Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
38Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells
39Thermal stability of antiferroelectric-like Al:HfO2 thin films with TiN or Pt electrodes
40Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
41Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
42Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
43Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
44Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
45Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
46Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
47Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
48Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
49Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
50Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
51In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
52Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
53Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
54Enhanced electrical and reliability characteristics in HfON gated Ge p-MOSFETs with H2 and NH3 plasma treated interfacial layers
55Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
56Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
57Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
58Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
59Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
60Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
61Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
62Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
63A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
64Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
65High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
66Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
67Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
68Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
69AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
70Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
71Protective capping and surface passivation of III-V nanowires by atomic layer deposition
72Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
73MANOS performance dependence on ALD Al2O3 oxidation source
74In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
75Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
76Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
77Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
78Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
79Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
80Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
81Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
82Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
83An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
84Single-Cell Photonic Nanocavity Probes
85Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
86In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
87Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
88Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
89Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
90Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
91Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
92A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
93P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
94AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
95Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
96Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
97Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
98Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
99Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
100Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
101Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
102Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
103Tribological properties of thin films made by atomic layer deposition sliding against silicon
104Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
105Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
106Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
107Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
108AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
109Atomic layer deposition of metal-oxide thin films on cellulose fibers
110Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
111Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
112High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
113Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
114Single-Cell Photonic Nanocavity Probes
115In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
116Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
117Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment
118Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
119Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
120Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
121Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
122Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
123Symmetrical Al2O3-based passivation layers for p- and n-type silicon
124Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
125Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
126Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
127On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
128Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
129Toward Understanding Positive Bias Temperature Instability in Fully Recessed-Gate GaN MISFETs
130Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
131Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
132Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
133Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
134Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
135Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
136Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
137Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
138Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
139Breakdown and Protection of ALD Moisture Barrier Thin Films
140A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
141Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
142Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
143Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
144Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
145Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
146In-gap states in titanium dioxide and oxynitride atomic layer deposited films
147Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
148Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
149Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
150Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
151Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
152Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
153Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
154Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
155Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
156Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
157Experimental verification of electro-refractive phase modulation in graphene
158Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
159Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
160On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
161Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
162Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
163Breakdown and Protection of ALD Moisture Barrier Thin Films
164Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
165Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
166Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
167Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
168Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
169Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
170Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
171Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
172Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
173Hafnia and alumina on sulphur passivated germanium
174Symmetrical Al2O3-based passivation layers for p- and n-type silicon
175Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
176Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
177Passivation effects of atomic-layer-deposited aluminum oxide
178Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
179In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
180Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
181Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
182Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
183In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
184Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
185Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
186Gate Insulator for High Mobility Oxide TFT
187Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
188Trapped charge densities in Al2O3-based silicon surface passivation layers
189Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
190A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
191Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
192Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
193Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
194Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices
195On the Trail Ancient Worlds: Comparative Study of Commercial Scandium and Yttrium Precursors, Asgard, Midgard, Vanaheim and Olympus
196Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
197Fiber-matrix interface reinforcement using Atomic Layer Deposition
198Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
199Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
200Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
201Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
202Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
203Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
204Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
205Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
206Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
207Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
208Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
209High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
210A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
211Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
212Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
213Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
214AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
215Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
216Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
217Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
218Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
219Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
220Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
221Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
222Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
223Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
224The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
225Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
226Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
227Room temperature atomic layer deposition of TiO2 on gold nanoparticles
228Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
229Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
230Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
231Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
232In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
233A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
234Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
235Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
236Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
237Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
238Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
239AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
240Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
241Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
242The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
243Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
244Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
245Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
246Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
247Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
248Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
249Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
250RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
251P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
252Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
253Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
254Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
255Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
256Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
257Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
258Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
259Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
260Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
261Atomic Layer Deposition of Gold Metal
262Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
263Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
264Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
265A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
266A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
267Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
268Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
269Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
270Low temperature temporal and spatial atomic layer deposition of TiO2 films
271Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
272Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
273AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
274Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
275Protective capping and surface passivation of III-V nanowires by atomic layer deposition
276Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
277Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
278Nitride passivation of the interface between high-k dielectrics and SiGe
279Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
280Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
281Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
282Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
283Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
284Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
285Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
286Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
287Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
288RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
289Improved understanding of recombination at the Si/Al2O3 interface
290Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
291Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
292Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
293Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
294Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
295P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
296Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
297Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
298Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
299High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
300Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
301Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
302The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
303Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
304Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
305AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
306Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
307The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
308Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
309Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
310Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
311Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
312Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
313Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
314Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
315Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
316Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
317Hafnia and alumina on sulphur passivated germanium
318Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
319Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
320Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
321Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
322Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
323Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
324Atomic Layer Deposition of the Solid Electrolyte LiPON
325Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
326Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
327Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
328The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
329Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
330Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
331Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
332Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
333Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
334Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
335Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
336Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
337Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
338Trapped charge densities in Al2O3-based silicon surface passivation layers
339Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
340Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
341Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
342Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
343Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
344Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
345Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
346The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
347Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
348Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
349Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
350Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
351Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2