H2O, Water, CAS# 7732-18-5

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
2Fast Flexible Plastic Substrate ZnO Circuits
3Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
4Breakdown and Protection of ALD Moisture Barrier Thin Films
5Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
6Protective capping and surface passivation of III-V nanowires by atomic layer deposition
7Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
8Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
9Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
10Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
11In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
12A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
13Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
14AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
15MANOS performance dependence on ALD Al2O3 oxidation source
16AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
17Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
18Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
19Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
20Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
21Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
22Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
23Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
24Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
25Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment
26P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
27Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
28Encapsulation method for atom probe tomography analysis of nanoparticles
29A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
30Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
31Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
32Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
33Low temperature temporal and spatial atomic layer deposition of TiO2 films
34Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
35Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
36Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
37Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
38Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
39Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
40A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
41Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
42Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
43Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
44Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
45Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
46An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
47Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
48In-gap states in titanium dioxide and oxynitride atomic layer deposited films
49Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
50Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
51Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
52Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
53Protective capping and surface passivation of III-V nanowires by atomic layer deposition
54Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
55Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
56Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
57Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
58Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
59Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
60Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
61Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
62Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
63Room temperature atomic layer deposition of TiO2 on gold nanoparticles
64Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
65Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
66Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
67Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
68Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
69In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
70Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
71Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
72Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
73Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
74Toward Understanding Positive Bias Temperature Instability in Fully Recessed-Gate GaN MISFETs
75Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
76P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
77Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
78Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
79Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
80Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
81Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
82Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
83Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
84Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
85The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
86Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
87Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
88Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
89Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
90Atomic Layer Deposition of Gold Metal
91Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
92Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
93Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
94Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
95Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
96Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
97Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
98Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
99Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
100Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
101Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
102Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
103Nitride passivation of the interface between high-k dielectrics and SiGe
104Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
105Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
106Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
107Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
108Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
109Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
110Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
111Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
112Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
113Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
114Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
115Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
116In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
117Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
118Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
119Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
120Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
121Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
122Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
123Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
124Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
125Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
126Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
127Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
128Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
129Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
130Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
131Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
132Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
133Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
134Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
135Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
136Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
137Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
138Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
139Enhanced electrical and reliability characteristics in HfON gated Ge p-MOSFETs with H2 and NH3 plasma treated interfacial layers
140AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
141Experimental verification of electro-refractive phase modulation in graphene
142Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
143Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
144Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
145Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
146High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
147Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
148Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
149Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
150Plasma enhanced atomic layer deposition of Ga2O3 thin films
151Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
152Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
153Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
154Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
155Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
156Passivation effects of atomic-layer-deposited aluminum oxide
157Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
158The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
159Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
160Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
161Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
162A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
163A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
164Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
165Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
166Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
167Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
168Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
169Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
170Breakdown and Protection of ALD Moisture Barrier Thin Films
171Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
172Atomic Layer Deposition of the Solid Electrolyte LiPON
173Single-Cell Photonic Nanocavity Probes
174Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
175Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
176Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
177Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
178Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
179Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
180Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
181RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
182Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
183Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
184Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
185A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
186Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
187Hafnia and alumina on sulphur passivated germanium
188In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
189On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
190Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
191Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
192Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
193Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
194AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
195Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
196Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
197X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
198Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
199Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
200Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
201New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
202Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
203Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
204Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
205Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
206Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
207Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
208Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
209Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
210Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
211Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
212Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
213Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
214Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
215Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
216The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
217Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
218Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
219Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
220Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
221Symmetrical Al2O3-based passivation layers for p- and n-type silicon
222Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
223Fiber-matrix interface reinforcement using Atomic Layer Deposition
224Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
225P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
226Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
227A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
228Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
229Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
230Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
231Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
232Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
233Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
234Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
235Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
236Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
237Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
238Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
239Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
240The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
241Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
242P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
243Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
244Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
245Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
246Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
247Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
248Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
249Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
250Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
251Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
252Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
253Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
254Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
255Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
256Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
257Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
258Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
259In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
260Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
261AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
262Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
263Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
264Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
265Trapped charge densities in Al2O3-based silicon surface passivation layers
266Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
267Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
268Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
269A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
270Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
271Tribological properties of thin films made by atomic layer deposition sliding against silicon
272Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
273Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
274In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
275Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
276Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
277Hafnia and alumina on sulphur passivated germanium
278Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
279Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
280AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
281Gate Insulator for High Mobility Oxide TFT
282AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
283Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
284On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
285Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
286High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
287Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
288Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
289Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
290Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
291Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
292Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
293Symmetrical Al2O3-based passivation layers for p- and n-type silicon
294In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
295Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
296Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
297Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
298RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
299Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
300Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
301Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
302Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
303RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
304Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
305Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
306Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
307Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
308High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
309Improved understanding of recombination at the Si/Al2O3 interface
310Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
311Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
312Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
313Trapped charge densities in Al2O3-based silicon surface passivation layers
314High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
315Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
316Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
317Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
318Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
319Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
320Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
321The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
322Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
323Atomic layer deposition of metal-oxide thin films on cellulose fibers
324Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
325Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
326Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
327Single-Cell Photonic Nanocavity Probes
328Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
329Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
330Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
331The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
332Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
333Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
334Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
335Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
336Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
337Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
338Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
339Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
340Tribological properties of thin films made by atomic layer deposition sliding against silicon
341Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
342The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films