H₂O, Water, CAS# 7732-18-5

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 262 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
2	Encapsulation method for atom probe tomography analysis of nanoparticles
3	Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
4	A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
5	A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
6	A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
7	A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
8	AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
9	AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
10	AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
11	AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
12	AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
13	AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
14	Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
15	Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
16	Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
17	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
18	Atomic layer deposition of metal-oxide thin films on cellulose fibers
19	Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
20	AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
21	Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
22	Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
23	Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
24	Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
25	Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
26	Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
27	Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment
28	Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
29	Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
30	Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
31	Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
32	Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
33	Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
34	Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
35	Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
36	Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
37	Electronic and optical device applications of hollow cathode plasma assisted atomic layer deposition based GaN thin films
38	Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
39	Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
40	Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
41	Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
42	Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
43	Experimental verification of electro-refractive phase modulation in graphene
44	Fast Flexible Plastic Substrate ZnO Circuits
45	Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
46	Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
47	Gate Insulator for High Mobility Oxide TFT
48	Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
49	Hafnia and alumina on sulphur passivated germanium
50	High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
51	High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
52	Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
53	Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
54	Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
55	Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
56	Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
57	Improved understanding of recombination at the Si/Al2O3 interface
58	Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
59	In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
60	In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
61	Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
62	Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
63	Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
64	Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
65	Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
66	Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
67	Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
68	Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
69	Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
70	Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
71	Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
72	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
73	Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
74	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
75	Low temperature thin film transistors with hollow cathode plasma-assisted atomic layer deposition based GaN channels
76	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
77	MANOS performance dependence on ALD Al2O3 oxidation source
78	Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
79	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
80	Nitride passivation of the interface between high-k dielectrics and SiGe
81	Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
82	Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
83	On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
84	Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
85	Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
86	Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
87	Passivation effects of atomic-layer-deposited aluminum oxide
88	Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
89	Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
90	Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
91	Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
92	Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
93	Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
94	Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
95	Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
96	Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
97	RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
98	Single-Cell Photonic Nanocavity Probes
99	Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
100	Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
101	Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
102	Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
103	Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
104	Symmetrical Al2O3-based passivation layers for p- and n-type silicon
105	Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
106	Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
107	Toward Understanding Positive Bias Temperature Instability in Fully Recessed-Gate GaN MISFETs
108	Trapped charge densities in Al2O3-based silicon surface passivation layers
109	Tribological properties of thin films made by atomic layer deposition sliding against silicon
110	Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
111	Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
112	Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
113	Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
114	Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
115	Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
116	Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
117	Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
118	Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
119	Atomic Layer Deposition of Gold Metal
120	Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
121	Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
122	Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
123	Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
124	The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
125	Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
126	Plasma enhanced atomic layer deposition of Ga2O3 thin films
127	Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
128	RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
129	Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
130	A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
131	A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
132	An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
133	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
134	Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
135	Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
136	Breakdown and Protection of ALD Moisture Barrier Thin Films
137	Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
138	Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
139	Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
140	Hafnia and alumina on sulphur passivated germanium
141	High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
142	High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
143	Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
144	Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
145	Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
146	Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
147	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
148	Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
149	On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
150	Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
151	Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
152	Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
153	Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
154	Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
155	Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
156	Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
157	Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
158	Symmetrical Al2O3-based passivation layers for p- and n-type silicon
159	Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
160	The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
161	Trapped charge densities in Al2O3-based silicon surface passivation layers
162	Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
163	Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
164	Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
165	Enhanced electrical and reliability characteristics in HfON gated Ge p-MOSFETs with H2 and NH3 plasma treated interfacial layers
166	Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
167	Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
168	Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
169	Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
170	Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
171	Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
172	Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
173	Atomic Layer Deposition of the Solid Electrolyte LiPON
174	Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
175	Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
176	Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
177	Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
178	Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
179	Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
180	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
181	Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
182	Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
183	Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
184	Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
185	Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
186	Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
187	Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
188	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
189	Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
190	Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
191	Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
192	In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
193	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
194	Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
195	Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
196	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
197	Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
198	A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
199	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
200	Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
201	Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
202	Breakdown and Protection of ALD Moisture Barrier Thin Films
203	Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
204	Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
205	Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
206	Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
207	Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
208	Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
209	Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
210	In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
211	In-gap states in titanium dioxide and oxynitride atomic layer deposited films
212	Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
213	Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
214	Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
215	Low temperature temporal and spatial atomic layer deposition of TiO2 films
216	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
217	Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
218	Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
219	Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
220	Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
221	Room temperature atomic layer deposition of TiO2 on gold nanoparticles
222	Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
223	Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
224	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
225	Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
226	Tribological properties of thin films made by atomic layer deposition sliding against silicon
227	Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
228	X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
229	Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
230	Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
231	Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
232	Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
233	Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
234	Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
235	Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
236	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
237	Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
238	Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
239	Characteristics of ZnO Thin Films by Means of Plasma Enhanced Atomic Layer Deposition
240	Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
241	Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
242	Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
243	Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
244	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
245	Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
246	New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
247	Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
248	Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
249	Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
250	Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
251	The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
252	The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
253	Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
254	Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
255	Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
256	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
257	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
258	Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
259	RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
260	Single-Cell Photonic Nanocavity Probes
261	Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
262	Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics

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