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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 354 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
2Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
3A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
4Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
5Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
6Hafnia and alumina on sulphur passivated germanium
7Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
8Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment
9Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
10Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
11Passivation effects of atomic-layer-deposited aluminum oxide
12On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
13Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
14In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
15Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
16High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
17Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
18Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
19Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
20Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
21Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
22Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
23Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
24Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
25Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
26Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
27Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
28Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
29Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
30Gate Insulator for High Mobility Oxide TFT
31Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
32Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
33Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
34Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
35An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
36Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
37Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
38A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
39Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
40Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
41Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
42AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
43The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
44Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
45Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
46Toward Understanding Positive Bias Temperature Instability in Fully Recessed-Gate GaN MISFETs
47Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
48Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
49Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
50Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
51Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
52Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
53Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
54Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
55Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
56Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
57Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
58Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
59High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
60Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
61In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
62Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
63Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
64Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
65Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
66Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
67Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
68Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
69New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
70Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
71Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
72Symmetrical Al2O3-based passivation layers for p- and n-type silicon
73Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
74Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
75Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
76Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
77P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
78In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
79The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
80Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
81Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
82Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
83Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
84Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
85Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
86Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
87Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
88Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
89Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
90Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
91AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
92Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
93Enhanced electrical and reliability characteristics in HfON gated Ge p-MOSFETs with H2 and NH3 plasma treated interfacial layers
94Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
95Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
96In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
97Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
98Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
99High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
100Tribological properties of thin films made by atomic layer deposition sliding against silicon
101Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
102Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
103Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
104Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
105Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
106The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
107Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
108Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
109Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
110Low temperature temporal and spatial atomic layer deposition of TiO2 films
111Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
112Room temperature atomic layer deposition of TiO2 on gold nanoparticles
113Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
114Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
115In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
116Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
117Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
118Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
119Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells
120Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
121Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
122Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
123Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
124Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
125Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
126Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
127Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
128Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
129Atomic layer deposition of metal-oxide thin films on cellulose fibers
130Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
131Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
132Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
133Nitride passivation of the interface between high-k dielectrics and SiGe
134Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
135Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
136Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
137Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
138Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
139On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
140A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
141Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
142AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
143Single-Cell Photonic Nanocavity Probes
144Atomic Layer Deposition of Gold Metal
145Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
146Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
147Encapsulation method for atom probe tomography analysis of nanoparticles
148Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
149Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
150Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
151ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
152Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
153Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
154AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
155Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
156The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
157Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
158The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
159Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
160Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
161Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
162Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
163Improved understanding of recombination at the Si/Al2O3 interface
164Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
165Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
166Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
167MANOS performance dependence on ALD Al2O3 oxidation source
168AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
169Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
170A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
171Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
172Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
173Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
174Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
175RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
176Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
177Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
178Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
179Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
180A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
181Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
182In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
183Breakdown and Protection of ALD Moisture Barrier Thin Films
184Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
185Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
186Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
187Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
188P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
189In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
190Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
191Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
192Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
193Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
194Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
195Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
196Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
197Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
198Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
199Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
200Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
201Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
202Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
203Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
204Symmetrical Al2O3-based passivation layers for p- and n-type silicon
205Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
206Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
207Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
208Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
209Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
210Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
211In-gap states in titanium dioxide and oxynitride atomic layer deposited films
212Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
213Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
214Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
215Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
216Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
217P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
218Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
219Single-Cell Photonic Nanocavity Probes
220Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
221Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
222Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
223Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
224Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
225Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
226The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
227Protective capping and surface passivation of III-V nanowires by atomic layer deposition
228Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
229Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
230P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
231Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
232Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
233Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
234Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
235A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
236Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
237Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
238Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
239Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
240Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
241Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
242Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
243A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
244Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
245Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
246Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
247Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
248Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
249Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
250Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
251Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
252Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
253Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
254Thermal stability of antiferroelectric-like Al:HfO2 thin films with TiN or Pt electrodes
255Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
256Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
257Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
258Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
259Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
260Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
261Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
262Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
263Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
264Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
265Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
266Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
267Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
268Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
269RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
270Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
271Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
272Fast Flexible Plastic Substrate ZnO Circuits
273Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
274Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
275Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
276Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
277Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
278Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
279Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
280AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
281Trapped charge densities in Al2O3-based silicon surface passivation layers
282Atomic Layer Deposition of the Solid Electrolyte LiPON
283Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
284Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
285Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
286Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
287Protective capping and surface passivation of III-V nanowires by atomic layer deposition
288Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
289Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
290Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
291Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
292Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
293Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
294Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
295Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
296Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
297Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
298Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices
299Fiber-matrix interface reinforcement using Atomic Layer Deposition
300Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
301On the Trail Ancient Worlds: Comparative Study of Commercial Scandium and Yttrium Precursors, Asgard, Midgard, Vanaheim and Olympus
302Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
303Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
304Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
305Experimental verification of electro-refractive phase modulation in graphene
306Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
307Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
308Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
309Trapped charge densities in Al2O3-based silicon surface passivation layers
310RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
311Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
312Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
313Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
314Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
315Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
316Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
317The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
318Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
319Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
320Tribological properties of thin films made by atomic layer deposition sliding against silicon
321Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
322Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
323Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
324Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
325Plasma enhanced atomic layer deposition of Ga2O3 thin films
326AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
327Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
328Hafnia and alumina on sulphur passivated germanium
329Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
330Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
331Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
332Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
333Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
334Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
335Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
336Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
337X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
338Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
339Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
340Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
341Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
342Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
343Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
344Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
345Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
346A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
347High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
348Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
349Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
350Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
351Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
352Breakdown and Protection of ALD Moisture Barrier Thin Films