H2O, Water, CAS# 7732-18-5

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
2The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
3Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
4Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
5Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
6Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
7Plasma enhanced atomic layer deposition of Ga2O3 thin films
8Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
9Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
10Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
11Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment
12Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
13Fast Flexible Plastic Substrate ZnO Circuits
14Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
15Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
16Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
17Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
18Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
19Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
20Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
21Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
22Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
23Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
24AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
25A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
26Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
27Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
28Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
29Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
30Tribological properties of thin films made by atomic layer deposition sliding against silicon
31Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
32Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
33Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
34Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
35Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
36Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
37Hafnia and alumina on sulphur passivated germanium
38Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
39Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
40Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
41X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
42Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
43Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
44Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
45Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
46Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
47Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
48High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
49An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
50Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
51Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
52Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
53Fiber-matrix interface reinforcement using Atomic Layer Deposition
54Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
55A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
56Enhanced electrical and reliability characteristics in HfON gated Ge p-MOSFETs with H2 and NH3 plasma treated interfacial layers
57Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
58In-gap states in titanium dioxide and oxynitride atomic layer deposited films
59Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
60Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
61Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
62Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
63Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
64Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
65Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
66Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
67Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
68A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
69RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
70Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
71Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
72Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
73Encapsulation method for atom probe tomography analysis of nanoparticles
74Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
75A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
76Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
77Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
78Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
79Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
80Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
81Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
82Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
83Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
84Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
85Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
86Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
87Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
88Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
89The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
90Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
91The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
92High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
93Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
94Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
95Single-Cell Photonic Nanocavity Probes
96Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
97Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
98Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
99Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
100Room temperature atomic layer deposition of TiO2 on gold nanoparticles
101Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
102Toward Understanding Positive Bias Temperature Instability in Fully Recessed-Gate GaN MISFETs
103Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
104Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
105Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
106Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
107Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
108The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
109Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
110Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
111Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
112Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
113Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
114Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
115A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
116P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
117Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
118In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
119Symmetrical Al2O3-based passivation layers for p- and n-type silicon
120Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
121Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
122Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
123Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
124Experimental verification of electro-refractive phase modulation in graphene
125Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
126Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
127Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
128Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
129A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
130Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
131Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
132AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
133Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
134Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
135Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
136Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
137Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
138Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
139Atomic Layer Deposition of the Solid Electrolyte LiPON
140Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
141Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
142Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
143Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
144Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
145Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
146Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
147Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
148P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
149Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
150In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
151Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
152Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
153Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
154AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
155Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
156Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
157Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
158Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
159Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
160Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
161Breakdown and Protection of ALD Moisture Barrier Thin Films
162Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
163Symmetrical Al2O3-based passivation layers for p- and n-type silicon
164AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
165Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
166Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
167Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
168Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
169Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
170Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
171P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
172Low temperature temporal and spatial atomic layer deposition of TiO2 films
173Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
174Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
175Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
176New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
177Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
178The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
179Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
180Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
181A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
182Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
183Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
184Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
185Nitride passivation of the interface between high-k dielectrics and SiGe
186Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
187Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
188Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
189Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
190In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
191On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
192Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
193Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
194Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
195On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
196Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
197High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
198A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
199Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
200Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
201Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
202Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
203Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
204Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
205Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
206Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
207Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
208Hafnia and alumina on sulphur passivated germanium
209Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
210Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
211Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
212Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
213Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
214Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
215Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
216Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
217In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
218Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
219Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
220Trapped charge densities in Al2O3-based silicon surface passivation layers
221Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
222Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
223Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
224Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
225Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
226Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
227Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
228Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
229Gate Insulator for High Mobility Oxide TFT
230Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
231Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
232Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
233RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
234Protective capping and surface passivation of III-V nanowires by atomic layer deposition
235Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
236Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
237Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
238Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
239Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
240Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
241Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
242P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
243Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
244Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
245Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
246Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
247Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
248Breakdown and Protection of ALD Moisture Barrier Thin Films
249Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
250Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
251In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
252Atomic layer deposition of metal-oxide thin films on cellulose fibers
253Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
254Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
255Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
256Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
257Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
258Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
259Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
260Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
261Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
262Tribological properties of thin films made by atomic layer deposition sliding against silicon
263Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
264Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
265Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
266AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
267Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
268The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
269Improved understanding of recombination at the Si/Al2O3 interface
270Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
271Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
272High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
273Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
274Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
275Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
276Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
277Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
278Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
279Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
280Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
281Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
282Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
283Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
284Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
285In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
286Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
287Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
288Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
289Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
290Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
291Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
292RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
293Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
294Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
295Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
296Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
297Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
298Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
299Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
300Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
301Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
302Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
303Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
304Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
305Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
306AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
307Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
308Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
309Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
310Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
311Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
312Protective capping and surface passivation of III-V nanowires by atomic layer deposition
313AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
314Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
315Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
316Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
317Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
318MANOS performance dependence on ALD Al2O3 oxidation source
319Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
320Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
321Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
322Trapped charge densities in Al2O3-based silicon surface passivation layers
323Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
324Single-Cell Photonic Nanocavity Probes
325Atomic Layer Deposition of Gold Metal
326Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
327Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
328Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
329Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
330Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
331Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
332Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
333Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
334Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
335In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
336Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
337Passivation effects of atomic-layer-deposited aluminum oxide
338The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
339Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
340Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes