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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 354 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
2Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
3Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
4Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
5RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
6Toward Understanding Positive Bias Temperature Instability in Fully Recessed-Gate GaN MISFETs
7Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
8Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
9Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
10AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
11Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
12Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
13Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
14Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
15Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
16Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
17Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
18Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
19Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
20Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
21Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
22Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
23Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
24Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
25RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
26Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
27Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
28Fast Flexible Plastic Substrate ZnO Circuits
29Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
30Passivation effects of atomic-layer-deposited aluminum oxide
31Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
32Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
33Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
34Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
35Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
36Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
37Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
38On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
39Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
40AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
41Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
42Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
43Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
44Low temperature temporal and spatial atomic layer deposition of TiO2 films
45Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
46Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
47Atomic Layer Deposition of Gold Metal
48Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
49Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
50The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
51Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
52Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
53AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
54Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
55High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
56Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
57Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
58High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
59Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
60Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
61Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
62A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
63Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
64Single-Cell Photonic Nanocavity Probes
65Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
66Experimental verification of electro-refractive phase modulation in graphene
67In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
68Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
69Breakdown and Protection of ALD Moisture Barrier Thin Films
70Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
71Room temperature atomic layer deposition of TiO2 on gold nanoparticles
72Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
73Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
74Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
75Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
76Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
77Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
78Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
79Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
80Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
81A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
82Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
83Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
84Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
85Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
86Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
87Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
88Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
89Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
90Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
91Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
92Atomic Layer Deposition of the Solid Electrolyte LiPON
93Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
94Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
95Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
96Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
97Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
98Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
99Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
100Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
101A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
102Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
103Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
104Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
105X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
106Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
107Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
108Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
109Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
110Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
111Tribological properties of thin films made by atomic layer deposition sliding against silicon
112Gate Insulator for High Mobility Oxide TFT
113Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
114Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
115In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
116Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
117Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
118Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
119Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
120Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
121Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
122Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
123Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
124Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
125Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
126Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
127P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
128Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
129Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
130Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
131Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
132Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
133Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
134RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
135Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
136Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
137Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
138Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
139Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
140Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
141Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
142Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
143Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
144Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
145Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
146Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
147Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
148Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
149Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
150Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
151MANOS performance dependence on ALD Al2O3 oxidation source
152Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
153Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
154P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
155Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
156Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
157Symmetrical Al2O3-based passivation layers for p- and n-type silicon
158Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
159A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
160Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
161Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
162Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
163Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
164Protective capping and surface passivation of III-V nanowires by atomic layer deposition
165Nitride passivation of the interface between high-k dielectrics and SiGe
166Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
167Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
168Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
169On the Trail Ancient Worlds: Comparative Study of Commercial Scandium and Yttrium Precursors, Asgard, Midgard, Vanaheim and Olympus
170Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
171In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
172Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
173Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
174Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
175Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
176Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
177Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
178Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
179Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
180Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
181Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
182Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
183Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
184Single-Cell Photonic Nanocavity Probes
185Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
186Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
187The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
188P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
189Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
190Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
191Thermal stability of antiferroelectric-like Al:HfO2 thin films with TiN or Pt electrodes
192Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
193High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
194Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
195Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
196Atomic layer deposition of metal-oxide thin films on cellulose fibers
197The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
198Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
199Symmetrical Al2O3-based passivation layers for p- and n-type silicon
200Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
201Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
202Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
203Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
204Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
205Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
206Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
207Breakdown and Protection of ALD Moisture Barrier Thin Films
208Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
209Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
210Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
211Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
212Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
213Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
214Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
215Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
216The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
217A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
218Fiber-matrix interface reinforcement using Atomic Layer Deposition
219Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
220Trapped charge densities in Al2O3-based silicon surface passivation layers
221An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
222Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
223Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
224Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
225Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
226Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
227Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
228Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
229Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
230Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
231Enhanced electrical and reliability characteristics in HfON gated Ge p-MOSFETs with H2 and NH3 plasma treated interfacial layers
232Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
233Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
234Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells
235Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
236Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
237ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
238Protective capping and surface passivation of III-V nanowires by atomic layer deposition
239Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
240Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
241Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
242Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
243Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
244Encapsulation method for atom probe tomography analysis of nanoparticles
245Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
246Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
247Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
248In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
249Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
250The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
251Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
252Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
253Hafnia and alumina on sulphur passivated germanium
254Hafnia and alumina on sulphur passivated germanium
255Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
256Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
257Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
258Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
259In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
260Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
261Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
262Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
263Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
264A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
265P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
266Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
267Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
268Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
269Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
270Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
271Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
272Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
273Plasma enhanced atomic layer deposition of Ga2O3 thin films
274Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
275Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
276Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
277AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
278Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
279Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
280Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
281A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
282Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
283Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
284Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
285Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
286Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
287In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
288Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
289On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
290Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
291In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
292Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
293Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
294Trapped charge densities in Al2O3-based silicon surface passivation layers
295Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
296Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
297AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
298Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
299Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
300Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
301Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
302Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
303Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
304Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
305Tribological properties of thin films made by atomic layer deposition sliding against silicon
306Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
307Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
308Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
309Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
310Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
311High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
312Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
313Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
314Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
315Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
316Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
317Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
318New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
319Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
320The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
321Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
322Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
323Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
324Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices
325Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
326Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
327Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
328Improved understanding of recombination at the Si/Al2O3 interface
329Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
330Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment
331The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
332Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
333Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
334Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
335Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
336Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
337A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
338Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
339Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
340Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
341Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
342In-gap states in titanium dioxide and oxynitride atomic layer deposited films
343Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
344AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
345Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
346AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
347Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
348Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
349Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
350Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
351Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
352Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing