H₂O, Water, CAS# 7732-18-5

Plasma Enhanced Atomic Layer Deposition Film Publications

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Number	Title
1	Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
2	Encapsulation method for atom probe tomography analysis of nanoparticles
3	Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
4	A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
5	A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
6	A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
7	A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
8	A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
9	AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
10	AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
11	AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
12	AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
13	AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
14	AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
15	Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
16	Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
17	Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
18	Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
19	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
20	Atomic layer deposition of metal-oxide thin films on cellulose fibers
21	Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
22	Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
23	AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
24	Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
25	Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
26	Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
27	Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
28	Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
29	Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
30	Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
31	Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment
32	Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
33	Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
34	Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
35	Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
36	Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
37	Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
38	Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
39	Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
40	Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
41	Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
42	Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
43	Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
44	Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
45	Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
46	Experimental verification of electro-refractive phase modulation in graphene
47	Fast Flexible Plastic Substrate ZnO Circuits
48	Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
49	Fiber-matrix interface reinforcement using Atomic Layer Deposition
50	Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
51	Gate Insulator for High Mobility Oxide TFT
52	Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
53	Hafnia and alumina on sulphur passivated germanium
54	High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
55	High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
56	Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
57	Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
58	Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
59	Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
60	Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
61	Improved understanding of recombination at the Si/Al2O3 interface
62	Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
63	In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
64	In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
65	Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
66	Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
67	Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
68	Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
69	Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
70	Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
71	Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
72	Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
73	Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
74	Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
75	Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
76	Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
77	Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
78	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
79	Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
80	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
81	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
82	MANOS performance dependence on ALD Al2O3 oxidation source
83	Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
84	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
85	Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
86	Nitride passivation of the interface between high-k dielectrics and SiGe
87	Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
88	Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
89	On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
90	Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
91	Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
92	Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
93	Passivation effects of atomic-layer-deposited aluminum oxide
94	Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
95	Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
96	Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
97	Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
98	Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
99	Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
100	Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
101	Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
102	Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
103	Protective capping and surface passivation of III-V nanowires by atomic layer deposition
104	RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
105	Single-Cell Photonic Nanocavity Probes
106	Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
107	Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
108	Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
109	Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
110	Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
111	Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
112	Symmetrical Al2O3-based passivation layers for p- and n-type silicon
113	Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
114	Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
115	Toward Understanding Positive Bias Temperature Instability in Fully Recessed-Gate GaN MISFETs
116	Trapped charge densities in Al2O3-based silicon surface passivation layers
117	Tribological properties of thin films made by atomic layer deposition sliding against silicon
118	Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
119	Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
120	Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
121	Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
122	Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
123	Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
124	Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
125	Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
126	Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
127	Atomic Layer Deposition of Gold Metal
128	Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
129	Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
130	Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
131	Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
132	Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
133	The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
134	Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
135	Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
136	Plasma enhanced atomic layer deposition of Ga2O3 thin films
137	Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
138	RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
139	Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
140	A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
141	A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
142	An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
143	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
144	Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
145	Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
146	Breakdown and Protection of ALD Moisture Barrier Thin Films
147	Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
148	Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
149	Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
150	Hafnia and alumina on sulphur passivated germanium
151	High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
152	High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
153	In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
154	Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
155	Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
156	Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
157	Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
158	Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
159	Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
160	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
161	Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
162	On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
163	Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
164	Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
165	Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
166	Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
167	Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
168	Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
169	Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
170	Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
171	Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
172	Symmetrical Al2O3-based passivation layers for p- and n-type silicon
173	Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
174	The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
175	Trapped charge densities in Al2O3-based silicon surface passivation layers
176	Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
177	Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
178	Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
179	Enhanced electrical and reliability characteristics in HfON gated Ge p-MOSFETs with H2 and NH3 plasma treated interfacial layers
180	Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
181	Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
182	Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
183	Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
184	Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
185	Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
186	Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
187	Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
188	Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
189	Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
190	Atomic Layer Deposition of the Solid Electrolyte LiPON
191	Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
192	Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
193	Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
194	Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
195	Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
196	P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
197	Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
198	Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
199	Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
200	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
201	Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
202	Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
203	Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
204	Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
205	Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
206	Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
207	Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
208	Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
209	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
210	Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
211	Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
212	Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
213	Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
214	Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
215	In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
216	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
217	Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
218	Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
219	Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
220	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
221	Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
222	A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
223	Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
224	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
225	Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
226	Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
227	Breakdown and Protection of ALD Moisture Barrier Thin Films
228	Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
229	Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
230	Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
231	Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
232	Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
233	Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
234	Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
235	Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
236	Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
237	In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
238	In-gap states in titanium dioxide and oxynitride atomic layer deposited films
239	Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
240	Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
241	Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
242	Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
243	Low temperature temporal and spatial atomic layer deposition of TiO2 films
244	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
245	Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
246	Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
247	Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
248	Protective capping and surface passivation of III-V nanowires by atomic layer deposition
249	Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
250	Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
251	Room temperature atomic layer deposition of TiO2 on gold nanoparticles
252	Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
253	Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
254	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
255	Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
256	Tribological properties of thin films made by atomic layer deposition sliding against silicon
257	Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
258	X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
259	Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
260	Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
261	Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
262	Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
263	Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
264	Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
265	Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
266	Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
267	Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
268	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
269	Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
270	Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
271	Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
272	Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
273	Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
274	Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
275	Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
276	Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
277	Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
278	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
279	Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
280	New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
281	P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
282	Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
283	Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
284	Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
285	Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
286	The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
287	The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
288	Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
289	P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
290	Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
291	P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
292	Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
293	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
294	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
295	Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
296	RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
297	Single-Cell Photonic Nanocavity Probes
298	Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
299	Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics

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