Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)

Type:
Journal
Info:
Surface & Coatings Technology 305 (2016) 158 - 164
Date:
2016-08-06
DOI:
http://dx.doi.org/10.1016/j.surfcoat.2016.08.023

Author Information

Name Institution
Li-Chun WangNational Taiwan University
Yin-Yi HanNational Taiwan University Hospital
Kai-Chiang YangTaipei Medical University
Miin-Jang ChenNational Taiwan University
Hsin-Chih LinNational Taiwan University
Chung-Kwei LinTaipei Medical University
Yu-Tong HsuNational Taiwan University

Films

Thermal Al2O3

Hardware used: Veeco - Ultratech - Cambridge NanoTech Savannah
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature = 80C

Plasma Al2O3

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 80C

Film/Plasma Properties

Characteristic: Wetting Angle
Analysis: -
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: -
Diagnostic: -

Substrates

Polyvinylchloride, PVC

Notes

942