Hsin-Chih Lin Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Hsin-Chih Lin returned 11 record(s).

Number	Title
1	Effect of atomic layer plasma treatment on TALD-ZrO₂ film to improve the corrosion protection of Mg-Ca alloy
2	Effect of hydrogen participation on the improvement in electrical characteristics of HfO₂ gate dielectrics by post-deposition remote N₂ , N₂/H₂, and NH₃ plasma treatments
3	Suppression of GeO_x interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
4	AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
5	Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
6	Improvement in electrical characteristics of HfO₂ gate dielectrics treated by remote NH₃ plasma
7	Hydrophilic/hydrophobic surface of Al₂O₃ thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
8	In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
9	Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
10	Sub-nanometer heating depth of atomic layer annealing
11	Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique