Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance

Type:
Journal
Info:
J. Phys. D: Appl. Phys. 55 085105
Date:
2021-11-03
DOI:
http://dx.doi.org/10.1088/1361-6463/ac360c

Author Information

Name Institution
S. O'DonnellDublin City University
F. JoseDublin City University
K. ShielDublin City University
M. SnelgroveDublin City University
C. McFeelyDublin City University
E. McGillDublin City University
R. O'ConnorDublin City University

Films

Thermal TiO2

Hardware used: Oxford Instruments FlexAL
TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti
CAS#: 3275-24-9
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature = 250C

Thermal TiO2

Hardware used: Oxford Instruments FlexAL
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature = 250C

Plasma TiO2

Hardware used: Oxford Instruments FlexAL
TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti
CAS#: 3275-24-9
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 270C

Plasma TiO2

Hardware used: Oxford Instruments FlexAL
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 270C

Film/Plasma Properties

Characteristic: Thickness
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: ScientaOmicron ESCA+

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: ScientaOmicron ESCA+

Characteristic: Nucleation
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: ScientaOmicron ESCA+

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam XLS-100

Characteristic: Photoelectrochemical (PEC) Activity
Analysis: -
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Bruker Fastscan/ICON

Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Diagnostic: Nicolet iS50 FTIR

Substrates

Silicon

Notes

1631