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Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
Type:
Journal
Info:
J. Phys. D: Appl. Phys. 55 085105
Date:
2021-11-03
Author Information
| Name | Institution |
|---|---|
| S. O'Donnell | Dublin City University |
| F. Jose | Dublin City University |
| K. Shiel | Dublin City University |
| M. Snelgrove | Dublin City University |
| C. McFeely | Dublin City University |
| E. McGill | Dublin City University |
| R. O'Connor | Dublin City University |
Films
Thermal TiO2
Thermal TiO2
Plasma TiO2
Plasma TiO2
Film/Plasma Properties
Characteristic: Thickness
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Nucleation
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Photoelectrochemical (PEC) Activity
Analysis: -
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Substrates
| Silicon |
Notes
| 1631 |