Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
Type:
Journal
Info:
J. Phys. D: Appl. Phys. 55 085105
Date:
2021-11-03
Author Information
Name | Institution |
---|---|
S. O'Donnell | Dublin City University |
F. Jose | Dublin City University |
K. Shiel | Dublin City University |
M. Snelgrove | Dublin City University |
C. McFeely | Dublin City University |
E. McGill | Dublin City University |
R. O'Connor | Dublin City University |
Films
Thermal TiO2
Thermal TiO2
Plasma TiO2
Plasma TiO2
Film/Plasma Properties
Characteristic: Thickness
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Nucleation
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Photoelectrochemical (PEC) Activity
Analysis: -
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Substrates
Silicon |
Notes
1631 |