TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti, CAS# 3275-24-9

Where to buy

NumberVendorRegionLink
1Gelest๐Ÿ‡บ๐Ÿ‡ธTitanium Tetrakis(Dimethylamide), 99+%
2Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT
3Entegris๐Ÿ‡บ๐Ÿ‡ธTDMAT
4Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT (99.99%-Ti) PURATREM
5Ereztech๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV) (99.9%-Ti)
6Pegasus Chemicals๐Ÿ‡ฌ๐Ÿ‡งTetrakis(dimethylamido)titanium(IV)
7Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder for CVD/ALD
8Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder with high temperature valve for CVD/ALD
9DOCK/CHEMICALS๐Ÿ‡ฉ๐Ÿ‡ชTetrakisdimethylamidotitanium

www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.

If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.


Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 149 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
2Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
3Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
4Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
5Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
6Texture of atomic layer deposited ruthenium
7Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
8Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
9ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
10Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
11Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
12Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
13Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
14High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
15Transient characterization of the electroforming process in TiO2 based resistive switching devices
16Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
17Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
18Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
19Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
20Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
21Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
22Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
23Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
24Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
25Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
26Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
27Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
28Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
29Plasma-enhanced atomic layer deposition of titanium vanadium nitride
30Thermal stability of antiferroelectric-like Al:HfO2 thin films with TiN or Pt electrodes
31Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
32Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
33Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
34Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
35Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
36Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
37ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
38Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
39Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
40Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
41Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
42Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
43Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
44Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
45Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
46Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
47Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
48Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
49Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
50Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100ยฐC through Control of Plasma Chemistry
51Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
52Analysis of nitrogen species in titanium oxynitride ALD films
53Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
54Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
55Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
56The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
57Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
58Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
59Atomic layer deposition of titanium nitride from TDMAT precursor
60Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
61Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
62Atomic layer deposition of titanium nitride for quantum circuits
63Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
64Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
65Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
66Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
67Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
68Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
69Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
70Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
71Low-temperature (โ‰ค200ยฐC) plasma enhanced atomic layer deposition of dense titanium nitride thin films
72Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
73On the determination of ฯ‡(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
74Fully CMOS-compatible titanium nitride nanoantennas
75X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
76In-gap states in titanium dioxide and oxynitride atomic layer deposited films
77Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
78The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
79Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
80Obtaining low resistivity (~100 ยตฮฉ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
81Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
82Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
83Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
84Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
85Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
86Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
87Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
88Room temperature atomic layer deposition of TiO2 on gold nanoparticles
89Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
90Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
91Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
92Lithium-Iron (III) Fluoride Battery with Double Surface Protection
93Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
94Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
95Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
96Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
97Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
98Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
99Sub-10-nm ferroelectric Gd-doped HfO2 layers
100Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
101The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
102Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
103Annealing behavior of ferroelectric Si-doped HfO2 thin films
104Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
105Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
106Plasma-enhanced atomic layer deposition of titanium vanadium nitride
107Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
108Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
109ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
110Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
111Biofilm prevention on cochlear implants
112Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
113Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
114Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
115In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
116Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
117Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
118Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
119Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
120Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
121Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
122Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
123Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
124Impact of interface materials on side permeation in indirect encapsulation of organic electronics
125Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
126Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200ยฐC
127Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
128Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
129Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
130Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
131Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
132Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
133Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
134The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
135RF Characterization of Novel Superconducting Materials and Multilayers
136Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
137Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
138Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
139Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
140Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
141Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
142Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
143A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
144Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
145Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
146Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
147Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
148Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
149Nonvolatile Capacitive Crossbar Array for In-Memory Computing