TDMATi, (Me2N)4Ti, [(CH3)2N]4Ti, Tetrakis (DiMethylAmido) Titanium, Titanium Dimethylamide, CAS# 3275-24-9

Where to buy

NumberVendorLink
1Strem Chemicals, Inc.Tetrakis(dimethylamino)titanium(IV), 99% TDMAT (99.99%-Ti) PURATREM
2Strem Chemicals, Inc.Tetrakis(dimethylamino)titanium(IV), 99% TDMAT
3EreztechTetrakis(dimethylamino)titanium(IV) (99.9%-Ti)
4Strem Chemicals, Inc.Tetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder for CVD/ALD
5GelestTitanium Tetrakis(Dimethylamide), 99+%
6EntegrisTDMAT
7Strem Chemicals, Inc.Tetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder with high temperature valve for CVD/ALD

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 104 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
2Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
3Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
4Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
5Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
6Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
7Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
8Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
9Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
10Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
11Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
12Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
13Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
14ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
15ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
16Annealing behavior of ferroelectric Si-doped HfO2 thin films
17Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
18Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
19Atomic layer deposition of titanium nitride for quantum circuits
20Atomic layer deposition of titanium nitride from TDMAT precursor
21Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
22Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
23Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
24Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
25Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
26Fully CMOS-compatible titanium nitride nanoantennas
27High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
28Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
29In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
30Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
31Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
32Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
33Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
34Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
35Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
36Plasma-enhanced atomic layer deposition of titanium vanadium nitride
37Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
38Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
39Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
40Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
41Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
42Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
43Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
44Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
45Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
46Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
47Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
48Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
49Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
50Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
51Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
52Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
53Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
54A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
55Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
56Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
57Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
58Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
59Biofilm prevention on cochlear implants
60Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
61Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
62Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
63Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
64Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
65Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
66Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
67Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
68Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
69Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
70Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
71Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
72Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
73Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
74Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
75Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
76Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
77Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
78Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
79Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
80Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
81On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
82Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
83Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
84Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
85Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
86Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
87Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
88Room temperature atomic layer deposition of TiO2 on gold nanoparticles
89Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
90Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
91The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
92The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
93Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
94Transient characterization of the electroforming process in TiO2 based resistive switching devices
95Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
96Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
97X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
98Analysis of nitrogen species in titanium oxynitride ALD films
99Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
100In-gap states in titanium dioxide and oxynitride atomic layer deposited films
101Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
102Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
103Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
104Plasma-enhanced atomic layer deposition of titanium vanadium nitride


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