TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti, CAS# 3275-24-9

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT (99.99%-Ti) PURATREM
2Pegasus Chemicals๐Ÿ‡ฌ๐Ÿ‡งTetrakis(dimethylamido)titanium(IV)
3EpiValence๐Ÿ‡ฌ๐Ÿ‡งTitanium dimethylamide
4Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder for CVD/ALD
5Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder with high temperature valve for CVD/ALD
6Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT
7Ereztech๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV) (99.9%-Ti)
8DOCK/CHEMICALS๐Ÿ‡ฉ๐Ÿ‡ชTetrakisdimethylamidotitanium
9Gelest๐Ÿ‡บ๐Ÿ‡ธTitanium Tetrakis(Dimethylamide), 99+%
10Entegris๐Ÿ‡บ๐Ÿ‡ธTDMAT

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 142 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
2Obtaining low resistivity (~100 ยตฮฉ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
3Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
4Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
5Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
6Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
7Impact of interface materials on side permeation in indirect encapsulation of organic electronics
8Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
9Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
10Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200ยฐC
11Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
12Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
13Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
14Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
15Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
16Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
17Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
18Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
19Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
20Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
21Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
22Lithium-Iron (III) Fluoride Battery with Double Surface Protection
23Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
24Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
25Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
26Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
27Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
28Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
29Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
30Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
31Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
32Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
33Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
34Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
35Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
36Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
37Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
38Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
39Analysis of nitrogen species in titanium oxynitride ALD films
40Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
41Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
42Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
43Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
44Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
45In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
46Atomic layer deposition of titanium nitride from TDMAT precursor
47Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
48The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
49Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
50On the determination of ฯ‡(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
51Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
52Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
53Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
54The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
55Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
56Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
57Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
58Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
59Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
60Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
61Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
62Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
63In-gap states in titanium dioxide and oxynitride atomic layer deposited films
64Fully CMOS-compatible titanium nitride nanoantennas
65Biofilm prevention on cochlear implants
66Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
67Plasma-enhanced atomic layer deposition of titanium vanadium nitride
68Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
69Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
70Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
71Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
72Plasma-enhanced atomic layer deposition of titanium vanadium nitride
73The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
74Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
75High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
76Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
77Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
78Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
79Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
80Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
81Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
82Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
83Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
84Atomic layer deposition of titanium nitride for quantum circuits
85Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
86Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
87Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
88Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
89Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
90The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
91Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
92Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
93Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
94Transient characterization of the electroforming process in TiO2 based resistive switching devices
95Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
96Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
97Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
98Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
99Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
100Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
101ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
102Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
103Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
104Room temperature atomic layer deposition of TiO2 on gold nanoparticles
105Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
106Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
107Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
108Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
109ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
110Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
111Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
112Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
113Sub-10-nm ferroelectric Gd-doped HfO2 layers
114Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
115X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
116Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
117Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
118Low-temperature (โ‰ค200ยฐC) plasma enhanced atomic layer deposition of dense titanium nitride thin films
119ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
120Texture of atomic layer deposited ruthenium
121Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
122Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
123Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
124Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
125Annealing behavior of ferroelectric Si-doped HfO2 thin films
126Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
127Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
128Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
129Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
130Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
131Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
132Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
133A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
134Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
135Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
136Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
137Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
138Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
139Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
140Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
141Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
142Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance