TDMATi, (Me2N)4Ti, [(CH3)2N]4Ti, Tetrakis (DiMethylAmido) Titanium, Titanium Dimethylamide, CAS# 3275-24-9

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1EreztechTetrakis(dimethylamino)titanium(IV) (99.9%-Ti)

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 120 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
2Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
3Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
4Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
5Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
6Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
7Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
8Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
9Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
10Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
11Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
12Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
13Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
14ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
15ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
16ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
17Annealing behavior of ferroelectric Si-doped HfO2 thin films
18Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
19Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
20Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
21Atomic layer deposition of titanium nitride for quantum circuits
22Atomic layer deposition of titanium nitride from TDMAT precursor
23Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
24Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
25Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
26Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
27Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
28Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
29Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
30Fully CMOS-compatible titanium nitride nanoantennas
31High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
32Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
33In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
34Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
35Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
36Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
37Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
38Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
39Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
40Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
41Plasma-enhanced atomic layer deposition of titanium vanadium nitride
42Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
43Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
44Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
45Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
46Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
47Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
48Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
49Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
50Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
51Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
52Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
53Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
54Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
55Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
56Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
57Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
58Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
59Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
60A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
61Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
62Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
63Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
64Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
65Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
66Biofilm prevention on cochlear implants
67Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
68Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
69Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
70Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
71Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
72Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
73Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
74Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
75Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
76Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
77Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
78Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
79Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
80Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
81Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
82Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
83Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
84Impact of interface materials on side permeation in indirect encapsulation of organic electronics
85Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
86Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
87Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
88Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
89Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
90Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
91Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
92Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
93Lithium-Iron (III) Fluoride Battery with Double Surface Protection
94Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
95Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
96On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
97Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
98Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
99Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
100Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
101Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
102Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
103Room temperature atomic layer deposition of TiO2 on gold nanoparticles
104Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
105Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
106The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
107The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
108The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
109Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
110Transient characterization of the electroforming process in TiO2 based resistive switching devices
111Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
112Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
113X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
114Analysis of nitrogen species in titanium oxynitride ALD films
115Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
116In-gap states in titanium dioxide and oxynitride atomic layer deposited films
117Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
118Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
119Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
120Plasma-enhanced atomic layer deposition of titanium vanadium nitride