TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti, CAS# 3275-24-9

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT
2Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder with high temperature valve for CVD/ALD
3Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT (99.99%-Ti) PURATREM
4DOCK/CHEMICALS๐Ÿ‡ฉ๐Ÿ‡ชTetrakis(dimethylamino)titanium(IV)
5Entegris๐Ÿ‡บ๐Ÿ‡ธTDMAT
6EpiValence๐Ÿ‡ฌ๐Ÿ‡งTitanium dimethylamide
7Gelest๐Ÿ‡บ๐Ÿ‡ธTitanium Tetrakis(Dimethylamide), 99+%
8Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder for CVD/ALD
9Ereztech๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV) (99.9%-Ti)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 139 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
2ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
3Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
4Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
5Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
6Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
7Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
8Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
9Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
10Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
11Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
12Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
13Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
14Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
15Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
16Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
17Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
18Low-temperature (โ‰ค200ยฐC) plasma enhanced atomic layer deposition of dense titanium nitride thin films
19Fully CMOS-compatible titanium nitride nanoantennas
20Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
21Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
22Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
23Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
24Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
25Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
26Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
27Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
28Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
29Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
30Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
31Atomic layer deposition of titanium nitride from TDMAT precursor
32Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
33Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
34Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
35Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
36Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
37Room temperature atomic layer deposition of TiO2 on gold nanoparticles
38The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
39Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
40Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
41Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
42Atomic layer deposition of titanium nitride for quantum circuits
43The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
44Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
45Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
46Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
47Annealing behavior of ferroelectric Si-doped HfO2 thin films
48Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
49Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
50Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
51Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
52Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
53Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
54Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
55Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
56Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200ยฐC
57Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
58Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
59Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
60In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
61The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
62Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
63Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
64Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
65Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
66Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
67Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
68Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
69Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
70Impact of interface materials on side permeation in indirect encapsulation of organic electronics
71Plasma-enhanced atomic layer deposition of titanium vanadium nitride
72Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
73A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
74Biofilm prevention on cochlear implants
75Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
76Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
77Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
78Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
79Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
80Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
81Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
82Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
83Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
84High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
85Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
86Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
87Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
88Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
89Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
90X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
91Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
92Texture of atomic layer deposited ruthenium
93Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
94Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
95Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
96Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
97Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
98Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
99Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
100Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
101On the determination of ฯ‡(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
102Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
103Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
104Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
105ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
106ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
107Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
108Transient characterization of the electroforming process in TiO2 based resistive switching devices
109Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
110Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
111Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
112Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
113Analysis of nitrogen species in titanium oxynitride ALD films
114Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
115Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
116Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
117Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
118In-gap states in titanium dioxide and oxynitride atomic layer deposited films
119Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
120Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
121Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
122Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
123Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
124Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
125Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
126Plasma-enhanced atomic layer deposition of titanium vanadium nitride
127Lithium-Iron (III) Fluoride Battery with Double Surface Protection
128Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
129Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
130The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
131Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
132Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
133Obtaining low resistivity (~100 ยตฮฉ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
134Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
135Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
136Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
137Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
138Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
139Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor