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TDMAT, Tetrakis[(DiMethyl)Amido]Titanium, [Me2N]4Ti, CAS# 3275-24-9

Where to buy

NumberVendorLink
1Strem Chemicals, Inc.Tetrakis(dimethylamino)titanium(IV), 99% TDMAT
2Strem Chemicals, Inc.Tetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder for CVD/ALD
3Strem Chemicals, Inc.Tetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder with high temperature valve for CVD/ALD
4EpiValenceTitanium dimethylamide

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 82 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
2Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
3Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
4Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
5Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
6Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
7Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
8Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
9Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
10Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
11Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
12Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
13ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
14ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
15Annealing behavior of ferroelectric Si-doped HfO2 thin films
16Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
17Atomic layer deposition of titanium nitride from TDMAT precursor
18Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
19Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
20Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
21Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
22Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
23Fully CMOS-compatible titanium nitride nanoantennas
24High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
25Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
26Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
27Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
28Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
29Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
30Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
31Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
32Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
33Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
34Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
35Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
36Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
37Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
38Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
39Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
40Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
41A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
42Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
43Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
44Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
45Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
46Biofilm prevention on cochlear implants
47Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
48Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
49Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
50Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
51Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
52Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
53Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
54Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
55Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
56Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
57Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
58Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
59Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
60Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
61On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
62Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
63Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
64Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
65Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
66Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
67Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
68Room temperature atomic layer deposition of TiO2 on gold nanoparticles
69Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
70Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
71The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
72The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
73Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
74Transient characterization of the electroforming process in TiO2 based resistive switching devices
75Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
76Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
77X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
78Analysis of nitrogen species in titanium oxynitride ALD films
79Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
80Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
81Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
82Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition

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