TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti, CAS# 3275-24-9

Where to buy

NumberVendorRegionLink
1Entegris๐Ÿ‡บ๐Ÿ‡ธTDMAT
2Gelest๐Ÿ‡บ๐Ÿ‡ธTitanium Tetrakis(Dimethylamide), 99+%
3Ereztech๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV) (99.9%-Ti)
4Pegasus Chemicals๐Ÿ‡ฌ๐Ÿ‡งTetrakis(dimethylamido)titanium(IV)
5DOCK/CHEMICALS๐Ÿ‡ฉ๐Ÿ‡ชTetrakisdimethylamidotitanium
6Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder with high temperature valve for CVD/ALD
7Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT
8Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder for CVD/ALD
9Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT (99.99%-Ti) PURATREM

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 145 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
2Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
3Fully CMOS-compatible titanium nitride nanoantennas
4Plasma-enhanced atomic layer deposition of titanium vanadium nitride
5Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
6Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
7Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
8Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
9Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
10Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
11Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
12Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
13Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
14Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
15Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
16ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
17Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
18Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
19ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
20Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
21Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
22Room temperature atomic layer deposition of TiO2 on gold nanoparticles
23Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
24Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
25Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
26Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
27Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
28Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
29Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
30Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
31The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
32Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
33Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
34Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
35Transient characterization of the electroforming process in TiO2 based resistive switching devices
36Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
37Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
38Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
39Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
40The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
41Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
42Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
43Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
44Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
45Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
46Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
47Atomic layer deposition of titanium nitride for quantum circuits
48Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
49Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
50Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
51Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
52Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
53Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
54Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
55Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
56Texture of atomic layer deposited ruthenium
57Atomic layer deposition of titanium nitride from TDMAT precursor
58Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
59Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
60A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
61Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
62Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
63Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
64Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
65Biofilm prevention on cochlear implants
66Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
67Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
68Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
69Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
70Low-temperature (โ‰ค200ยฐC) plasma enhanced atomic layer deposition of dense titanium nitride thin films
71Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
72Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
73Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
74Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
75Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
76The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
77Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
78Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
79Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
80Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
81Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
82Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
83Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
84Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
85Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
86Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
87Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
88Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
89Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
90Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
91Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
92Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
93High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
94Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
95Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
96Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
97The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
98Annealing behavior of ferroelectric Si-doped HfO2 thin films
99Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
100Lithium-Iron (III) Fluoride Battery with Double Surface Protection
101Nonvolatile Capacitive Crossbar Array for In-Memory Computing
102Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
103Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
104In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
105Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
106Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
107Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
108Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
109Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
110Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
111Analysis of nitrogen species in titanium oxynitride ALD films
112Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200ยฐC
113Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
114X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
115Impact of interface materials on side permeation in indirect encapsulation of organic electronics
116Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
117In-gap states in titanium dioxide and oxynitride atomic layer deposited films
118On the determination of ฯ‡(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
119Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
120Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
121Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
122Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
123Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
124Obtaining low resistivity (~100 ยตฮฉ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
125Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
126Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
127Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
128Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
129Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
130Plasma-enhanced atomic layer deposition of titanium vanadium nitride
131Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
132Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
133Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
134Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
135Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
136Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
137ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
138Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
139Sub-10-nm ferroelectric Gd-doped HfO2 layers
140Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
141Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
142Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
143Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
144Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
145Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique