TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti, CAS# 3275-24-9

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1EreztechTetrakis(dimethylamino)titanium(IV) (99.9%-Ti)

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 133 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
2Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
3Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
4Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
5Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
6Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
7Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
8Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
9Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
10Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
11Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
12Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
13Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
14Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
15Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
16ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
17ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
18ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
19Annealing behavior of ferroelectric Si-doped HfO2 thin films
20Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
21Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
22Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
23Atomic layer deposition of titanium nitride for quantum circuits
24Atomic layer deposition of titanium nitride from TDMAT precursor
25Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
26Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
27Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
28Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
29Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
30Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
31Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
32Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
33Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
34Fully CMOS-compatible titanium nitride nanoantennas
35High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
36Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
37In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
38Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
39Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
40Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
41Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
42Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
43Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
44Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
45Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
46Plasma-enhanced atomic layer deposition of titanium vanadium nitride
47Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
48Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
49Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
50Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
51Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
52Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
53Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
54Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
55Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
56Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
57Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
58Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
59Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
60Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
61Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
62Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
63Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
64Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
65Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
66Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
67A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
68Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
69Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
70Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
71Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
72Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
73Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
74Biofilm prevention on cochlear implants
75Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
76Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
77Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
78Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
79Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
80Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
81Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
82Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
83Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
84Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
85Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
86Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
87Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
88Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
89Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
90Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
91Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
92Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
93Impact of interface materials on side permeation in indirect encapsulation of organic electronics
94Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
95Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
96Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
97Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
98Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
99Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
100Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
101Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
102Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
103Lithium-Iron (III) Fluoride Battery with Double Surface Protection
104Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
105Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
106On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
107Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
108Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
109Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
110Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
111Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
112Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
113Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
114Room temperature atomic layer deposition of TiO2 on gold nanoparticles
115Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
116Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
117Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
118Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
119The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
120The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
121The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
122Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
123Transient characterization of the electroforming process in TiO2 based resistive switching devices
124Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
125Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
126X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
127Analysis of nitrogen species in titanium oxynitride ALD films
128Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
129In-gap states in titanium dioxide and oxynitride atomic layer deposited films
130Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
131Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
132Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
133Plasma-enhanced atomic layer deposition of titanium vanadium nitride