TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti, CAS# 3275-24-9

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder with high temperature valve for CVD/ALD
2Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT
3DOCK/CHEMICALS๐Ÿ‡ฉ๐Ÿ‡ชTetrakisdimethylamidotitanium
4Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder for CVD/ALD
5Gelest๐Ÿ‡บ๐Ÿ‡ธTitanium Tetrakis(Dimethylamide), 99+%
6Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT (99.99%-Ti) PURATREM
7Pegasus Chemicals๐Ÿ‡ฌ๐Ÿ‡งTetrakis(dimethylamido)titanium(IV)
8Entegris๐Ÿ‡บ๐Ÿ‡ธTDMAT
9Ereztech๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV) (99.9%-Ti)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 149 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
2The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
3Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
4Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
5The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
6Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
7Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
8Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
9Fully CMOS-compatible titanium nitride nanoantennas
10Nonvolatile Capacitive Crossbar Array for In-Memory Computing
11Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
12On the determination of ฯ‡(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
13Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
14Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
15Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
16Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
17Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
18Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
19Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
20Thermal stability of antiferroelectric-like Al:HfO2 thin films with TiN or Pt electrodes
21Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
22Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
23Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
24Lithium-Iron (III) Fluoride Battery with Double Surface Protection
25ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
26Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
27Room temperature atomic layer deposition of TiO2 on gold nanoparticles
28Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
29Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
30Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
31Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
32Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
33Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
34Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
35Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
36Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
37Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
38RF Characterization of Novel Superconducting Materials and Multilayers
39ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
40Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
41Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
42Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
43Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
44Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
45Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
46Biofilm prevention on cochlear implants
47Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
48Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
49Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
50Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
51Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
52Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
53Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
54Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
55Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
56X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
57Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200ยฐC
58Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
59Annealing behavior of ferroelectric Si-doped HfO2 thin films
60Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
61Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
62Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
63Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
64Transient characterization of the electroforming process in TiO2 based resistive switching devices
65Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
66Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
67Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
68Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
69Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
70Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
71Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
72In-gap states in titanium dioxide and oxynitride atomic layer deposited films
73Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
74Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
75Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
76Sub-10-nm ferroelectric Gd-doped HfO2 layers
77Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
78Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
79Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
80Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
81Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
82Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
83Analysis of nitrogen species in titanium oxynitride ALD films
84Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
85Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
86Obtaining low resistivity (~100 ยตฮฉ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
87Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
88Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
89Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
90Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
91Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
92Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
93Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
94Low-temperature (โ‰ค200ยฐC) plasma enhanced atomic layer deposition of dense titanium nitride thin films
95Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
96Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
97Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
98The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
99Impact of interface materials on side permeation in indirect encapsulation of organic electronics
100Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
101Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
102Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
103In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
104Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
105Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
106Atomic layer deposition of titanium nitride for quantum circuits
107Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
108Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
109Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
110ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
111Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
112Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
113Plasma-enhanced atomic layer deposition of titanium vanadium nitride
114Atomic layer deposition of titanium nitride from TDMAT precursor
115Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
116The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
117Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
118Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100ยฐC through Control of Plasma Chemistry
119Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
120Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
121Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
122Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
123Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
124Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
125A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
126Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
127Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
128Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
129Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
130Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
131Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
132Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
133Texture of atomic layer deposited ruthenium
134Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
135Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
136Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
137High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
138Plasma-enhanced atomic layer deposition of titanium vanadium nitride
139Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
140Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
141Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
142Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
143Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
144Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
145Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
146Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
147Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
148Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
149Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies