TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti, CAS# 3275-24-9

Where to buy

NumberVendorRegionLink
1Gelest๐Ÿ‡บ๐Ÿ‡ธTitanium Tetrakis(Dimethylamide), 99+%
2DOCK/CHEMICALS๐Ÿ‡ฉ๐Ÿ‡ชTetrakisdimethylamidotitanium
3Entegris๐Ÿ‡บ๐Ÿ‡ธTDMAT
4Pegasus Chemicals๐Ÿ‡ฌ๐Ÿ‡งTetrakis(dimethylamido)titanium(IV)
5Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder with high temperature valve for CVD/ALD
6Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT
7Ereztech๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV) (99.9%-Ti)
8Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder for CVD/ALD
9Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT (99.99%-Ti) PURATREM

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 149 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
2Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
3Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
4Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
5Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
6Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
7Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
8Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
9Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
10Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
11Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
12Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
13Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
14Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
15X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
16Analysis of nitrogen species in titanium oxynitride ALD films
17Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
18The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
19Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
20Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
21Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
22Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
23Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
24Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
25Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
26Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
27Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
28Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
29Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
30Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
31Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
32Atomic layer deposition of titanium nitride for quantum circuits
33Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
34Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
35Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
36Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
37Thermal stability of antiferroelectric-like Al:HfO2 thin films with TiN or Pt electrodes
38Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
39A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
40Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
41Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
42Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
43Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
44The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
45Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
46Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
47Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
48Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
49Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
50Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
51Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
52On the determination of ฯ‡(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
53In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
54RF Characterization of Novel Superconducting Materials and Multilayers
55Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
56Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
57Obtaining low resistivity (~100 ยตฮฉ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
58In-gap states in titanium dioxide and oxynitride atomic layer deposited films
59Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
60Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
61Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
62Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
63Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
64Plasma-enhanced atomic layer deposition of titanium vanadium nitride
65Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
66Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
67Texture of atomic layer deposited ruthenium
68Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200ยฐC
69Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
70Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
71Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
72Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
73Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
74Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
75Sub-10-nm ferroelectric Gd-doped HfO2 layers
76Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
77Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
78Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
79ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
80Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
81Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
82Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
83Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
84High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
85Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
86Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
87Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
88Annealing behavior of ferroelectric Si-doped HfO2 thin films
89Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
90Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
91Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
92Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
93Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
94Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
95Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
96Impact of interface materials on side permeation in indirect encapsulation of organic electronics
97Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
98Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
99Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
100Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
101Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
102Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
103Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
104Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
105Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
106Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
107Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
108Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
109Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
110Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
111Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
112Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
113Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
114Biofilm prevention on cochlear implants
115Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
116Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
117The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
118Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
119Fully CMOS-compatible titanium nitride nanoantennas
120Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
121Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
122Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
123Lithium-Iron (III) Fluoride Battery with Double Surface Protection
124The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
125Room temperature atomic layer deposition of TiO2 on gold nanoparticles
126Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
127Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
128Nonvolatile Capacitive Crossbar Array for In-Memory Computing
129Plasma-enhanced atomic layer deposition of titanium vanadium nitride
130Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
131Low-temperature (โ‰ค200ยฐC) plasma enhanced atomic layer deposition of dense titanium nitride thin films
132Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
133Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
134ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
135Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
136Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
137Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
138Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
139Transient characterization of the electroforming process in TiO2 based resistive switching devices
140Atomic layer deposition of titanium nitride from TDMAT precursor
141Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100ยฐC through Control of Plasma Chemistry
142Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
143Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
144Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
145Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
146ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
147Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
148Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
149Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2