TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti, CAS# 3275-24-9

Where to buy

NumberVendorRegionLink
1Pegasus Chemicals๐Ÿ‡ฌ๐Ÿ‡งTetrakis(dimethylamido)titanium(IV)
2Gelest๐Ÿ‡บ๐Ÿ‡ธTitanium Tetrakis(Dimethylamide), 99+%
3DOCK/CHEMICALS๐Ÿ‡ฉ๐Ÿ‡ชTetrakisdimethylamidotitanium
4Ereztech๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV) (99.9%-Ti)
5Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT
6Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT (99.99%-Ti) PURATREM
7Entegris๐Ÿ‡บ๐Ÿ‡ธTDMAT
8Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder for CVD/ALD
9Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder with high temperature valve for CVD/ALD

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 149 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposition of titanium nitride from TDMAT precursor
2Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
3Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
4Texture of atomic layer deposited ruthenium
5Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
6Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
7Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
8Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
9Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
10Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
11Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
12Obtaining low resistivity (~100 ยตฮฉ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
13Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
14Plasma-enhanced atomic layer deposition of titanium vanadium nitride
15Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
16Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
17Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
18Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
19Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
20Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
21Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
22Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
23Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
24Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
25Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
26Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
27Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
28In-gap states in titanium dioxide and oxynitride atomic layer deposited films
29ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
30Atomic layer deposition of titanium nitride for quantum circuits
31Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
32Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
33Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
34Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
35Low-temperature (โ‰ค200ยฐC) plasma enhanced atomic layer deposition of dense titanium nitride thin films
36Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
37High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
38Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
39Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
40Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
41Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
42On the determination of ฯ‡(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
43Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
44Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
45Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
46Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
47Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
48Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
49Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
50Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
51Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
52Impact of interface materials on side permeation in indirect encapsulation of organic electronics
53Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
54Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
55Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
56Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
57Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
58The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
59Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
60Fully CMOS-compatible titanium nitride nanoantennas
61Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
62Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
63Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
64Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
65Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
66Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
67Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
68Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
69Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
70Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
71Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
72Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
73Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
74Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
75Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
76Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
77Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
78A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
79Lithium-Iron (III) Fluoride Battery with Double Surface Protection
80Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
81ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
82Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
83Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
84Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
85Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
86Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
87Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
88Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200ยฐC
89Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
90Nonvolatile Capacitive Crossbar Array for In-Memory Computing
91Biofilm prevention on cochlear implants
92Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
93Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
94X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
95Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
96Transient characterization of the electroforming process in TiO2 based resistive switching devices
97Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100ยฐC through Control of Plasma Chemistry
98Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
99Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
100Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
101Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
102Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
103Analysis of nitrogen species in titanium oxynitride ALD films
104The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
105In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
106Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
107Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
108Plasma-enhanced atomic layer deposition of titanium vanadium nitride
109RF Characterization of Novel Superconducting Materials and Multilayers
110Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
111Sub-10-nm ferroelectric Gd-doped HfO2 layers
112Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
113Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
114Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
115Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
116Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
117Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
118Thermal stability of antiferroelectric-like Al:HfO2 thin films with TiN or Pt electrodes
119The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
120Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
121Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
122Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
123Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
124Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
125Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
126Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
127Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
128Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
129Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
130Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
131Annealing behavior of ferroelectric Si-doped HfO2 thin films
132Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
133Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
134Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
135Room temperature atomic layer deposition of TiO2 on gold nanoparticles
136Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
137Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
138Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
139Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
140Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
141Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
142Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
143Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
144ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
145Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
146Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
147Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
148Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
149The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain