TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti, CAS# 3275-24-9

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder for CVD/ALD
2Entegris๐Ÿ‡บ๐Ÿ‡ธTDMAT
3Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT
4Gelest๐Ÿ‡บ๐Ÿ‡ธTitanium Tetrakis(Dimethylamide), 99+%
5Ereztech๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV) (99.9%-Ti)
6EpiValence๐Ÿ‡ฌ๐Ÿ‡งTitanium dimethylamide
7DOCK/CHEMICALS๐Ÿ‡ฉ๐Ÿ‡ชTetrakisdimethylamidotitanium
8Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT (99.99%-Ti) PURATREM
9Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder with high temperature valve for CVD/ALD
10Pegasus Chemicals๐Ÿ‡ฌ๐Ÿ‡งTetrakis(dimethylamido)titanium(IV)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 142 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Biofilm prevention on cochlear implants
2Analysis of nitrogen species in titanium oxynitride ALD films
3Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
4Texture of atomic layer deposited ruthenium
5Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
6Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
7Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
8Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
9Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
10Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
11ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
12Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
13Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
14Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
15Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
16Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
17Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
18In-gap states in titanium dioxide and oxynitride atomic layer deposited films
19Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
20Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
21Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
22Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
23Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
24Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
25Low-temperature (โ‰ค200ยฐC) plasma enhanced atomic layer deposition of dense titanium nitride thin films
26Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
27The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
28Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
29Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
30Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
31ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
32Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
33Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
34Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
35The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
36Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
37Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
38Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
39Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
40Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
41Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
42Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
43Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
44Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
45Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
46Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
47Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
48Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
49Sub-10-nm ferroelectric Gd-doped HfO2 layers
50Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
51Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
52In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
53Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
54Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
55Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
56Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
57Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
58Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
59A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
60Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
61Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
62Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
63Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
64Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
65Lithium-Iron (III) Fluoride Battery with Double Surface Protection
66Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
67Annealing behavior of ferroelectric Si-doped HfO2 thin films
68Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
69Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
70Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
71Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
72Plasma-enhanced atomic layer deposition of titanium vanadium nitride
73Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
74Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
75Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
76Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
77Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
78Impact of interface materials on side permeation in indirect encapsulation of organic electronics
79Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
80The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
81Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200ยฐC
82Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
83Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
84ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
85Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
86Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
87High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
88Room temperature atomic layer deposition of TiO2 on gold nanoparticles
89Fully CMOS-compatible titanium nitride nanoantennas
90On the determination of ฯ‡(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
91Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
92Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
93Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
94Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
95Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
96Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
97Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
98Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
99Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
100Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
101Atomic layer deposition of titanium nitride from TDMAT precursor
102Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
103Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
104Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
105Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
106Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
107Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
108Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
109Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
110Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
111Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
112Transient characterization of the electroforming process in TiO2 based resistive switching devices
113Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
114Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
115Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
116Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
117Atomic layer deposition of titanium nitride for quantum circuits
118Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
119The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
120Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
121Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
122Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
123Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
124Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
125Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
126Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
127Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
128Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
129Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
130X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
131Plasma-enhanced atomic layer deposition of titanium vanadium nitride
132Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
133Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
134Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
135Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
136Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
137Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
138Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
139Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
140Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
141Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
142Obtaining low resistivity (~100 ยตฮฉ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor