TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti, CAS# 3275-24-9

Where to buy

NumberVendorRegionLink
1DOCK/CHEMICALS๐Ÿ‡ฉ๐Ÿ‡ชTetrakisdimethylamidotitanium
2Pegasus Chemicals๐Ÿ‡ฌ๐Ÿ‡งTetrakis(dimethylamido)titanium(IV)
3EpiValence๐Ÿ‡ฌ๐Ÿ‡งTitanium dimethylamide
4Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT
5Entegris๐Ÿ‡บ๐Ÿ‡ธTDMAT
6Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT (99.99%-Ti) PURATREM
7Gelest๐Ÿ‡บ๐Ÿ‡ธTitanium Tetrakis(Dimethylamide), 99+%
8Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder for CVD/ALD
9Ereztech๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV) (99.9%-Ti)
10Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder with high temperature valve for CVD/ALD

www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.

If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.


Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 142 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
2Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
3Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
4Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
5Plasma-enhanced atomic layer deposition of titanium vanadium nitride
6Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
7Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
8Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
9Plasma-enhanced atomic layer deposition of titanium vanadium nitride
10Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
11Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
12Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200ยฐC
13On the determination of ฯ‡(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
14Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
15Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
16Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
17Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
18Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
19Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
20Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
21Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
22Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
23Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
24Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
25Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
26Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
27Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
28ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
29Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
30Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
31Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
32Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
33Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
34Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
35Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
36Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
37The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
38Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
39Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
40Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
41Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
42Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
43Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
44Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
45The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
46Obtaining low resistivity (~100 ยตฮฉ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
47Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
48Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
49Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
50Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
51Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
52Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
53Annealing behavior of ferroelectric Si-doped HfO2 thin films
54Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
55Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
56Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
57Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
58Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
59Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
60In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
61Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
62Fully CMOS-compatible titanium nitride nanoantennas
63Atomic layer deposition of titanium nitride for quantum circuits
64Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
65Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
66Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
67The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
68Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
69Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
70In-gap states in titanium dioxide and oxynitride atomic layer deposited films
71The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
72Analysis of nitrogen species in titanium oxynitride ALD films
73Impact of interface materials on side permeation in indirect encapsulation of organic electronics
74Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
75Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
76Atomic layer deposition of titanium nitride from TDMAT precursor
77Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
78Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
79Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
80Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
81Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
82High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
83Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
84Texture of atomic layer deposited ruthenium
85Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
86Low-temperature (โ‰ค200ยฐC) plasma enhanced atomic layer deposition of dense titanium nitride thin films
87Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
88Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
89Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
90Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
91Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
92Room temperature atomic layer deposition of TiO2 on gold nanoparticles
93Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
94A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
95Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
96Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
97Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
98Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
99Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
100Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
101Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
102Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
103Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
104Transient characterization of the electroforming process in TiO2 based resistive switching devices
105Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
106ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
107Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
108ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
109X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
110Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
111Lithium-Iron (III) Fluoride Battery with Double Surface Protection
112Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
113Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
114Biofilm prevention on cochlear implants
115Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
116Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
117Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
118Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
119Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
120Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
121Sub-10-nm ferroelectric Gd-doped HfO2 layers
122Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
123Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
124Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
125Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
126Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
127Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
128Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
129Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
130Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
131Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
132Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
133Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
134Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
135Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
136Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
137Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
138Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
139Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
140Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
141Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
142Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition