TDMATi, (Me2N)4Ti, [(CH3)2N]4Ti, Tetrakis(DiMethylAmido) Titaniium, Titanium Dimethylamide, CAS# 3275-24-9

Where to buy

NumberVendorLink
1EntegrisTDMAT
2Strem Chemicals, Inc.Tetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder with high temperature valve for CVD/ALD
3EreztechTetrakis(dimethylamino)titanium(IV) (99.9%-Ti)
4GelestTitanium Tetrakis(Dimethylamide), 99+%
5Strem Chemicals, Inc.Tetrakis(dimethylamino)titanium(IV), 99% TDMAT (99.99%-Ti) PURATREM
6Strem Chemicals, Inc.Tetrakis(dimethylamino)titanium(IV), 99% TDMAT
7Strem Chemicals, Inc.Tetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder for CVD/ALD

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 102 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
2Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
3Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
4Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
5Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
6Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
7Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
8Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
9Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
10Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
11Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
12Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
13Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
14ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
15ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
16Annealing behavior of ferroelectric Si-doped HfO2 thin films
17Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
18Atomic layer deposition of titanium nitride for quantum circuits
19Atomic layer deposition of titanium nitride from TDMAT precursor
20Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
21Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
22Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
23Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
24Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
25Fully CMOS-compatible titanium nitride nanoantennas
26High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
27Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
28In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
29Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
30Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
31Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
32Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
33Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
34Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
35Plasma-enhanced atomic layer deposition of titanium vanadium nitride
36Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
37Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
38Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
39Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
40Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
41Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
42Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
43Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
44Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
45Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
46Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
47Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
48Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
49Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
50Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
51Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
52Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
53A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
54Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
55Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
56Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
57Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
58Biofilm prevention on cochlear implants
59Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
60Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
61Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
62Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
63Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
64Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
65Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
66Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
67Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
68Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
69Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
70Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
71Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
72Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
73Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
74Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
75Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
76Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
77Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
78Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
79On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
80Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
81Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
82Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
83Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
84Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
85Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
86Room temperature atomic layer deposition of TiO2 on gold nanoparticles
87Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
88Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
89The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
90The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
91Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
92Transient characterization of the electroforming process in TiO2 based resistive switching devices
93Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
94Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
95X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
96Analysis of nitrogen species in titanium oxynitride ALD films
97Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
98In-gap states in titanium dioxide and oxynitride atomic layer deposited films
99Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
100Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
101Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
102Plasma-enhanced atomic layer deposition of titanium vanadium nitride


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