TDMAT, Tetrakis[(DiMethyl)Amido]Titanium, [Me2N]4Ti, CAS# 3275-24-9

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NumberVendorLink
1EreztechTetrakis(dimethylamino)titanium(IV) (99.9%-Ti)
2EntegrisTDMAT

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 90 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
2Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
3Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
4Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
5Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
6Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
7Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
8Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
9Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
10Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
11Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
12Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
13ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
14ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
15Annealing behavior of ferroelectric Si-doped HfO2 thin films
16Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
17Atomic layer deposition of titanium nitride for quantum circuits
18Atomic layer deposition of titanium nitride from TDMAT precursor
19Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
20Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
21Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
22Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
23Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
24Fully CMOS-compatible titanium nitride nanoantennas
25High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
26Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
27Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
28Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
29Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
30Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
31Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
32Plasma-enhanced atomic layer deposition of titanium vanadium nitride
33Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
34Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
35Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
36Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
37Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
38Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
39Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
40Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
41Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
42Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
43Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
44Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
45Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
46Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
47A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
48Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
49Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
50Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
51Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
52Biofilm prevention on cochlear implants
53Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
54Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
55Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
56Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
57Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
58Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
59Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
60Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
61Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
62Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
63Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
64Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
65Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
66Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
67On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
68Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
69Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
70Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
71Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
72Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
73Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
74Room temperature atomic layer deposition of TiO2 on gold nanoparticles
75Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
76Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
77The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
78The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
79Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
80Transient characterization of the electroforming process in TiO2 based resistive switching devices
81Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
82Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
83X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
84Analysis of nitrogen species in titanium oxynitride ALD films
85Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
86In-gap states in titanium dioxide and oxynitride atomic layer deposited films
87Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
88Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
89Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
90Plasma-enhanced atomic layer deposition of titanium vanadium nitride


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