TDMATi, (Me₂N)₄Ti, [(CH₃)₂N]₄Ti, Tetrakis (DiMethylAmido) Titanium, Titanium Dimethylamide, CAS# 3275-24-9

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Number	Vendor	Link
1	Ereztech	Tetrakis(dimethylamino)titanium(IV) (99.9%-Ti)

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 112 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
2	Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
3	Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
4	Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
5	Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
6	Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
7	Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
8	Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
9	Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
10	Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
11	Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
12	Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
13	Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
14	ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
15	ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
16	ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
17	Annealing behavior of ferroelectric Si-doped HfO2 thin films
18	Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
19	Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
20	Atomic layer deposition of titanium nitride for quantum circuits
21	Atomic layer deposition of titanium nitride from TDMAT precursor
22	Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
23	Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
24	Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
25	Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
26	Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
27	Fully CMOS-compatible titanium nitride nanoantennas
28	High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
29	Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
30	In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
31	Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
32	Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
33	Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
34	Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
35	Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
36	Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
37	Plasma-enhanced atomic layer deposition of titanium vanadium nitride
38	Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
39	Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
40	Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
41	Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
42	Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
43	Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
44	Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
45	Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
46	Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
47	Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
48	Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
49	Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
50	Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
51	Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
52	Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
53	Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
54	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
55	A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
56	Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
57	Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
58	Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
59	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
60	Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
61	Biofilm prevention on cochlear implants
62	Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
63	Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
64	Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
65	Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
66	Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
67	Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
68	Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
69	Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
70	Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
71	Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
72	Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
73	Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
74	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
75	Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
76	Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
77	Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
78	Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
79	Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
80	Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
81	Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
82	Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
83	Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
84	Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
85	Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
86	Lithium-Iron (III) Fluoride Battery with Double Surface Protection
87	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
88	Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
89	On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
90	Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
91	Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
92	Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
93	Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
94	Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
95	Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
96	Room temperature atomic layer deposition of TiO2 on gold nanoparticles
97	Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
98	Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
99	The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
100	The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
101	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
102	Transient characterization of the electroforming process in TiO2 based resistive switching devices
103	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
104	Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
105	X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
106	Analysis of nitrogen species in titanium oxynitride ALD films
107	Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
108	In-gap states in titanium dioxide and oxynitride atomic layer deposited films
109	Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
110	Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
111	Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
112	Plasma-enhanced atomic layer deposition of titanium vanadium nitride

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