TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti, CAS# 3275-24-9

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder with high temperature valve for CVD/ALD
2Entegris๐Ÿ‡บ๐Ÿ‡ธTDMAT
3Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT (99.99%-Ti) PURATREM
4Gelest๐Ÿ‡บ๐Ÿ‡ธTitanium Tetrakis(Dimethylamide), 99+%
5Ereztech๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV) (99.9%-Ti)
6DOCK/CHEMICALS๐Ÿ‡ฉ๐Ÿ‡ชTetrakisdimethylamidotitanium
7Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT
8Pegasus Chemicals๐Ÿ‡ฌ๐Ÿ‡งTetrakis(dimethylamido)titanium(IV)
9Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTetrakis(dimethylamino)titanium(IV), 99% TDMAT, contained in 50 ml cylinder for CVD/ALD
10EpiValence๐Ÿ‡ฌ๐Ÿ‡งTitanium dimethylamide

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 142 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma-enhanced atomic layer deposition of titanium vanadium nitride
2Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
3Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
4Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
5Atomic layer deposition of titanium nitride from TDMAT precursor
6Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
7X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
8ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
9Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
10Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
11Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
12Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
13Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
14Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
15Obtaining low resistivity (~100 ยตฮฉ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
16Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
17Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
18Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
19Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
20Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
21Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
22Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
23Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
24Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
25Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
26Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
27Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
28Biofilm prevention on cochlear implants
29Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
30Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
31Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
32Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
33Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
34In-gap states in titanium dioxide and oxynitride atomic layer deposited films
35Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
36Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
37Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
38Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
39Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
40Plasma-enhanced atomic layer deposition of titanium vanadium nitride
41Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
42Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
43Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
44Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
45Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
46Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
47Fully CMOS-compatible titanium nitride nanoantennas
48Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
49The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
50Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
51Lithium-Iron (III) Fluoride Battery with Double Surface Protection
52Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
53Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
54Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
55Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
56Analysis of nitrogen species in titanium oxynitride ALD films
57Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
58Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
59Low-temperature (โ‰ค200ยฐC) plasma enhanced atomic layer deposition of dense titanium nitride thin films
60Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
61Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
62Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
63Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
64Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
65Texture of atomic layer deposited ruthenium
66On the determination of ฯ‡(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
67Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
68Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
69Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
70Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
71Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
72Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
73Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
74Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
75Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
76Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
77Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
78The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
79Annealing behavior of ferroelectric Si-doped HfO2 thin films
80In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
81ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
82Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
83Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
84Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
85Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
86Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
87Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
88Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
89Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
90Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
91Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
92Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
93Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
94Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
95Atomic layer deposition of titanium nitride for quantum circuits
96Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
97Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
98The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
99Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
100Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
101Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
102Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
103Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
104Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
105Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
106Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
107Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
108Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
109Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
110Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
111Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
112Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
113Sub-10-nm ferroelectric Gd-doped HfO2 layers
114Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
115Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
116Room temperature atomic layer deposition of TiO2 on gold nanoparticles
117Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
118Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
119High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
120Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200ยฐC
121Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
122Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
123Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
124Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
125Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
126Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
127A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
128Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
129Impact of interface materials on side permeation in indirect encapsulation of organic electronics
130Transient characterization of the electroforming process in TiO2 based resistive switching devices
131Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
132Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
133Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
134The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
135Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
136Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
137Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
138Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
139ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
140Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
141Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
142Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes