Publication Information

Title:
Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2014, 6 (10), pp 7316-7324
Date:
2014-04-29

Author Information

Name Institution
Delphine LongrieGhent University
Davy DeduytscheGhent University
Jo HaemersGhent University
Philippe F. SmetGhent University
Kris DriesenUmicore
Christophe DetavernierGhent University

Films



Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer

Characteristic: Gas Phase Species
Analysis: OES, Optical Emission Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Resistivity, Sheet Resistance
Analysis: Resistivity Meter

Characteristic: Thickness
Analysis: XRF, X-Ray Fluorescence

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Chemical Composition, Impurities
Analysis: ELS, EELS, Electron Energy Loss Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: HAADF, High-Angle Annular Dark Field

Substrates

ZnO

Keywords

Powders/Particles

Notes

Custom rotary PEALD and thermal ALD TiN on particles.
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