Christophe Detavernier Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Christophe Detavernier returned 40 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
2Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
3Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
4Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
5Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
6Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
7Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
8Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
9Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
10Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
11TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
12Plasma-enhanced atomic layer deposition of zinc phosphate
13Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
14Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
15Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
16Plasma enhanced atomic layer deposition of zinc sulfide thin films
17Tuning size and coverage of Pd nanoparticles using atomic layer deposition
18Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
19Plasma enhanced atomic layer deposition of gallium sulfide thin films
20Plasma enhanced atomic layer deposition of aluminum sulfide thin films
21Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
22Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
23Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
24Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
25Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
26Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
27Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
28Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
29Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
30Texture of atomic layer deposited ruthenium
31Plasma enhanced atomic layer deposition of Ga2O3 thin films
32Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
33Ru thin film grown on TaN by plasma enhanced atomic layer deposition
34Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
35Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
36Atomic layer deposition of titanium nitride from TDMAT precursor
37Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
38Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
39A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
40A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects