Publication Information

Title:
Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
Type:
Journal
Info:
RSC Adv., 2016, 6, 98337-98343
Date:
2016-10-09

Author Information

Name Institution
Felix MattelaerGhent University
Tom BosserezKU Leuven
Jan RongéKU Leuven
Johan A. MartensKU Leuven
Jolien DendoovenGhent University
Christophe DetavernierGhent University

Films

Thermal MnOx


Plasma MnOx


Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Transmittance
Analysis: UV-VIS Spectroscopy

Characteristic: Photoelectrochemical (PEC) Activity
Analysis: Linear Sweep Voltammetry

Substrates

Silicon
SiO2

Keywords

Photoelectrochemical (PEC) water splitting

Notes

In on-line thesis.
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