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Publication Information

Title: Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing

Type: Journal

Info: RSC Adv., 2016, 6, 98337-98343

Date: 2016-10-09

DOI: http://dx.doi.org/10.1039/C6RA19188F

Author Information

Name

Institution

Ghent University

KU Leuven

KU Leuven

KU Leuven

Ghent University

Ghent University

Films

Thermal MnOx using Custom

Deposition Temperature = 180C

14324-99-3

10028-15-6

Plasma MnOx using Custom

Deposition Temperature = 180C

14324-99-3

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Bruker Dimension Edge

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

FEI Quanta 200 FEG

Transmittance

UV-VIS Spectroscopy

Tecan Infinite M200 Pro

Photoelectrochemical (PEC) Activity

Linear Sweep Voltammetry

Unknown

Substrates

Silicon

SiO2

Keywords

Photoelectrochemical (PEC) water splitting

Notes

948

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I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. If you know of publications I have missed or a database entry is wrong, send me an email at: marksowa@plasma-ald.com

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