Mn(TMHD)3, tris(2,2,6,6-tetramethyl-3,5-heptanedionato) manganese, CAS# 14324-99-3

Where to buy

NumberVendorRegionLink
1Ereztech๐Ÿ‡บ๐Ÿ‡ธTris(2,2,6,6-tetramethyl-3,5-heptanedionato) manganese(III)
2Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTris(2,2,6,6-tetramethyl-3,5-heptanedionato)manganese(III), 99% [Mn(TMHD)3]
3Gelest๐Ÿ‡บ๐Ÿ‡ธManganese(III) 2,2,6,6-Tetramethyl-3,5-Heptanedionate
4Pegasus Chemicals๐Ÿ‡ฌ๐Ÿ‡งTris(2,2,6,6-tetramethyl-3,5-heptanedionato)manganese

www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.

If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.


Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
2Plasma-enhanced atomic layer deposition of Cuรขโ‚ฌโ€œMn films with formation of a MnSixOy barrier layer
3Atomic layer deposition of YMnO3 thin films
4Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
5Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
6Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
7Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing