Mn(TMHD)3, tris(2,2,6,6-tetramethyl-3,5-heptanedionato) manganese, CAS# 14324-99-3

Where to buy

NumberVendorRegionLink
1Gelest๐Ÿ‡บ๐Ÿ‡ธManganese(III) 2,2,6,6-Tetramethyl-3,5-Heptanedionate
2Ereztech๐Ÿ‡บ๐Ÿ‡ธTris(2,2,6,6-tetramethyl-3,5-heptanedionato) manganese(III)
3Pegasus Chemicals๐Ÿ‡ฌ๐Ÿ‡งTris(2,2,6,6-tetramethyl-3,5-heptanedionato)manganese
4Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTris(2,2,6,6-tetramethyl-3,5-heptanedionato)manganese(III), 99% [Mn(TMHD)3]

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
2Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
3Atomic layer deposition of YMnO3 thin films
4Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
5Plasma-enhanced atomic layer deposition of Cuรขโ‚ฌโ€œMn films with formation of a MnSixOy barrier layer
6Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
7Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries