Mn(TMHD)3, tris(2,2,6,6-tetramethyl-3,5-heptanedionato) manganese, CAS# 14324-99-3

Where to buy

NumberVendorLink
1GelestManganese(III) 2,2,6,6-Tetramethyl-3,5-Heptanedionate
2Strem Chemicals, Inc.Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)manganese(III), 99% [Mn(TMHD)3]
3EreztechTris(2,2,6,6-tetramethyl-3,5-heptanedionato) manganese(III)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
2Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
3Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
4Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
5Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
6Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
7Atomic layer deposition of YMnO3 thin films