Mn(TMHD)3, tris(2,2,6,6-tetramethyl-3,5-heptanedionato) manganese, CAS# 14324-99-3

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.๐Ÿ‡บ๐Ÿ‡ธTris(2,2,6,6-tetramethyl-3,5-heptanedionato)manganese(III), 99% [Mn(TMHD)3]
2Gelest๐Ÿ‡บ๐Ÿ‡ธManganese(III) 2,2,6,6-Tetramethyl-3,5-Heptanedionate
3Ereztech๐Ÿ‡บ๐Ÿ‡ธTris(2,2,6,6-tetramethyl-3,5-heptanedionato) manganese(III)
4Pegasus Chemicals๐Ÿ‡ฌ๐Ÿ‡งTris(2,2,6,6-tetramethyl-3,5-heptanedionato)manganese

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
2Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
3Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
4Atomic layer deposition of YMnO3 thin films
5Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
6Plasma-enhanced atomic layer deposition of Cuรขโ‚ฌโ€œMn films with formation of a MnSixOy barrier layer
7Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing