Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer

Type:
Journal
Info:
Thin Solid Films 521 (2012) 146-149
Date:
2012-02-10
DOI:
https://doi.org/10.1016/j.tsf.2012.02.015

Author Information

Name Institution
Dae-Young MoonHanyang University
Dong-Suk HanHanyang University
Jae-Hyung ParkHanyang University
Sae-Young ShinHanyang University
Jong-Wan ParkHanyang University
Baek Mann KimHynix Semiconductor
Jun Yeol ChoHynix Semiconductor

Films

Plasma Cu

Hardware used: Unknown
MABOC, bis(1-dimethylamino-2-methyl-2-butoxy) copper(II), Cu(dmamb)2
CAS#: 872130-16-0
H2, Hydrogen
CAS#: 1333-74-0

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N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature Range = 100-225C

Plasma Cu-Mn

Hardware used: Unknown
MABOC, bis(1-dimethylamino-2-methyl-2-butoxy) copper(II), Cu(dmamb)2
CAS#: 872130-16-0
Mn(TMHD)3, tris(2,2,6,6-tetramethyl-3,5-heptanedionato) manganese
CAS#: 14324-99-3
Where to buy precursor
H2, Hydrogen
CAS#: 1333-74-0

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N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature = 120C

Film/Plasma Properties

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: Hitachi HD-2300A

Characteristic: Microstructure
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: Hitachi HD-2300A

Characteristic: Interfacial Layer
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: Hitachi HD-2300A

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: Hitachi HD-2300A

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Diagnostic: Hitachi HD-2300A

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo VG Sigma Probe

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Rigaku D/Max-2500

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Diagnostic: Jandel

Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy
Diagnostic: PHI 680 FEAES

Characteristic: Adhesion
Analysis: Tape Test
Diagnostic: -

Substrates

SiO2

Notes

1591