Cu Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing Cu films returned 17 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
2Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
3Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
4Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
5Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
6PEALD of Copper using New Precursors for Next Generation of Interconnections
7Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
8Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
9Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
10Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
11Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
12Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
13Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
14Copper-ALD Seed Layer as an Enabler for Device Scaling
15Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
16Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
17Hydrogen plasma-enhanced atomic layer deposition of copper thin films