Cu Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing Cu films returned 17 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1PEALD of Copper using New Precursors for Next Generation of Interconnections
2Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
3Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
4Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
5Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
6Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
7Hydrogen plasma-enhanced atomic layer deposition of copper thin films
8Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
9Copper-ALD Seed Layer as an Enabler for Device Scaling
10Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
11Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
12Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
13Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
14Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
15Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
16Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
17Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy