The publication database currently has 1673 entries.
Use Advanced Search for more complex searches
Recent Database Additions
Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
Type:
Journal
Info:
Journal of The Electrochemical Society, 152 (2) C60-C64 (2005)
Date:
2004-07-12
Author Information
| Name | Institution |
|---|---|
| Christopher Jezewski | State University of New York at Albany |
| W. A. Lanford | State University of New York at Albany |
| Christopher J. Wiegand | Rensselaer Polytechnic Institute (RPI) |
| J. P. Singh | Rensselaer Polytechnic Institute (RPI) |
| Pei-I Wang | Rensselaer Polytechnic Institute (RPI) |
| Jay J. Senkevich | Rensselaer Polytechnic Institute (RPI) |
| Toh-Ming Lu | Rensselaer Polytechnic Institute (RPI) |
Films
Plasma Cu
Film/Plasma Properties
Characteristic: Density
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Thickness
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Adhesion
Analysis: Tape Test
Substrates
| Ta |
| SiO2 |
| Au |
| TaN |
Keywords
Notes
| 1170 |