Cu(TMHD)2, Cu(THD)2, bis(2,2,6,6-tetramethyl-3,5-heptanedionate) copper, Copper(II) dipivaloylmethanate, CAS# 14040-05-2
Where to buy
|2||Strem Chemicals, Inc.||🇺🇸||Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)copper(II), 99% [Cu(TMHD)2]|
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Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Radical Enhanced Atomic Layer Deposition of Metals and Oxides|
|2||Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces|